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    Gas discharge laser output light beam parameter control
    1.
    发明申请
    Gas discharge laser output light beam parameter control 有权
    气体放电激光输出光束参数控制

    公开(公告)号：US20060227839A1

    公开(公告)日：2006-10-12

    申请号：US11095293

    申请日：2005-03-31

    Applicant: Herve Besaucele ,  Igor Fomenkov ,  William Partlo ,  Fedor Trintchouk ,  Hao Ton That

    Inventor： Herve Besaucele ,  Igor Fomenkov ,  William Partlo ,  Fedor Trintchouk ,  Hao Ton That

    IPC: H01S3/22

    CPC classification number: H01S3/036 ,  H01S3/038 ,  H01S3/097 ,  H01S3/09702 ,  H01S3/134

    Abstract: A line narrowed gas discharge laser system and method of operation are disclosed which may comprise: an oscillator cavity; a laser chamber comprising a chamber housing containing a lasing medium gas; at least one peaking capacitor electrically connected to the chamber housing and to a first one of a pair of electrodes; a second one of the pair of electrodes connected to an opposite terminal of the at least one peaking capacitor; a current return path connected to the chamber housing; the one terminal, the first one of the electrodes, the lasing medium gas, the second one of the electrodes, the current return path and the second terminal forming a head current inductive loop having an inductance unique to the particular head current inductive loo; a spectral quality tuning mechanism comprising a mechanism for changing the particular head current inductive loop inductance value for the particular head current inductance loop.

    Abstract translation: 公开了一种窄气体放电激光系统和操作方法，其可以包括：振荡器腔; 激光室，包括容纳激光介质气体的腔室; 至少一个峰值电容器电连接到所述腔室壳体和一对电极中的第一电极; 所述一对电极中的第二个连接到所述至少一个峰值电容器的相对端子; 连接到所述腔室壳体的电流返回路径; 一个端子，第一个电极，激光介质气体，第二个电极，电流返回路径和第二个端子，形成具有特定头电流电感槽独有的电感的头电流感应回路; 光谱质量调谐机构包括用于改变特定头电流电感回路的特定头电流感应环电感值的机构。

    Collector for EUV light source
    2.
    发明申请
    Collector for EUV light source 有权
    EUV光源收集器

    公开(公告)号：US20060131515A1

    公开(公告)日：2006-06-22

    申请号：US10798740

    申请日：2004-03-10

    Applicant: William Partlo ,  John Algots ,  Gerry Blumenstock ,  Norbert Bowering ,  Alexander Ershov ,  Igor Fomenkov ,  Xiaojiang Pan

    Inventor： William Partlo ,  John Algots ,  Gerry Blumenstock ,  Norbert Bowering ,  Alexander Ershov ,  Igor Fomenkov ,  Xiaojiang Pan

    IPC: G01J1/00

    CPC classification number: H05G2/001 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/70916 ,  G21K1/062

    Abstract: A method and apparatus for debris removal from a reflecting surface of an EUV collector in an EUV light source is disclosed which may comprise the reflecting surface comprises a first material and the debris comprises a second material and/or compounds of the second material, the system and method may comprise a controlled sputtering ion source which may comprise a gas comprising the atoms of the sputtering ion material; and a stimulating mechanism exciting the atoms of the sputtering ion material into an ionized state, the ionized state being selected to have a distribution around a selected energy peak that has a high probability of sputtering the second material and a very low probability of sputtering the first material. The stimulating mechanism may comprise an RF or microwave induction mechanism.

    Abstract translation: 公开了一种用于从EUV光源中的EUV收集器的反射表面去除碎屑的方法和装置，其可以包括反射表面，其包括第一材料，并且所述碎屑包括第二材料和/或第二材料的化合物，所述系统 并且方法可以包括受控的溅射离子源，其可以包括包含溅射离子材料的原子的气体; 以及将溅射离子材料的原子激发成离子化状态的刺激机构，所选择的离子化状态具有围绕选择的能量峰的分布，其具有溅射第二材料的可能性很高，并且溅射的可能性非常低 材料。 刺激机构可以包括RF或微波感应机构。

    Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source
    3.
    发明申请
    Systems and methods for reducing the influence of plasma-generated debris on the internal components of an EUV light source 有权
    用于减少等离子体产生的碎片对EUV光源的内部部件的影响的系统和方法

    公开(公告)号：US20070187627A1

    公开(公告)日：2007-08-16

    申请号：US11705954

    申请日：2007-02-13

    Applicant: Alexander Ershov ,  William Marx ,  Norbert Bowering ,  Bjorn Hansson ,  Oleh Khodykin ,  Igor Fomenkov

    Inventor： Alexander Ershov ,  William Marx ,  Norbert Bowering ,  Bjorn Hansson ,  Oleh Khodykin ,  Igor Fomenkov

    IPC: G01J3/10

    CPC classification number: B82Y10/00 ,  G03F7/70033 ,  G03F7/70175 ,  G03F7/7085 ,  G03F7/70916 ,  G21K1/06 ,  G21K2201/06 ,  H05G2/001

    Abstract: Systems and methods are disclosed for reducing the influence of plasma generated debris on internal components of an EUV light source. In one aspect, an EUV metrology monitor is provided which may have a heater to heat an internal multi-layer filtering mirror to a temperature sufficient to remove deposited debris from the mirror. In another aspect, a device is disclosed for removing plasma generated debris from an EUV light source collector mirror having a different debris deposition rate at different zones on the collector mirror. In a particular aspect, an EUV collector mirror system may comprise a source of hydrogen to combine with Li debris to create LiH on a collector surface; and a sputtering system to sputter LiH from the collector surface. In another aspect, an apparatus for etching debris from a surface of a EUV light source collector mirror with a controlled plasma etch rate is disclosed.

    Abstract translation: 公开了用于减少等离子体产生的碎片对EUV光源的内部部件的影响的系统和方法。 在一个方面，提供了一种EUV计量监测器，其可以具有加热器以将内部多层过滤镜加热到足以从反射镜去除沉积的碎屑的温度。 在另一方面，公开了一种用于从收集器反射镜上的不同区域处具有不同碎屑沉积速率的EUV光源收集镜去除等离子体产生的碎屑的装置。 在特定方面，EUV收集器镜系统可以包括氢源以与Li碎片结合以在收集器表面上产生LiH; 以及从收集器表面溅射LiH的溅射系统。 在另一方面，公开了一种用于从具有受控等离子体蚀刻速率的EUV光源收集镜的表面蚀刻碎片的装置。

    EUV light source
    4.
    发明申请
    EUV light source 有权

    公开(公告)号：US20070158597A1

    公开(公告)日：2007-07-12

    申请号：US11647016

    申请日：2006-12-27

    Applicant: Igor Fomenkov ,  Alexander Ershov

    Inventor： Igor Fomenkov ,  Alexander Ershov

    IPC: G01J3/10

    CPC classification number: G03F7/70033 ,  B82Y10/00 ,  G03F7/70175 ,  G03F7/70916 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/065 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

    Abstract: An apparatus and method for EUV light production is disclosed which may comprise a laser produced plasma (“LPP”) extreme ultraviolet (“EUV”) light source control system comprising a target delivery system adapted to deliver moving plasma initiation targets and an EUV light collection optic having a focus defining a desired plasma initiation site, comprising: a target tracking and feedback system comprising: at least one imaging device providing as an output an image of a target stream track, wherein the target stream track results from the imaging speed of the camera being too slow to image individual plasma formation targets forming the target stream imaged as the target stream track; a stream track error detector detecting an error in the position of the target stream track in at least one axis generally perpendicular to the target stream track from a desired stream track intersecting the desired plasma initiation site. At least one target crossing detector may be aimed at the target track and detecting the passage of a plasma formation target through a selected point in the target track. A drive laser triggering mechanism utilizing an output of the target crossing detector to determine the timing of a drive laser trigger in order for a drive laser output pulse to intersect the plasma initiation target at a selected plasma initiation site along the target track at generally its closest approach to the desired plasma initiation site. A plasma initiation detector may be aimed at the target track and detecting the location along the target track of a plasma initiation site for a respective target. An intermediate focus illuminator may illuminate an aperture formed at the intermediate focus to image the aperture in the at least one imaging device. The at least one imaging device may be at least two imaging devices each providing an error signal related to the separation of the target track from the vertical centerline axis. of the image of the intermediate focus based upon an analysis of the image in the respective one of the at least two imaging devices. A target delivery feedback and control system may comprise a target delivery unit; a target delivery displacement control mechanism displacing the target delivery mechanism at least in an axis corresponding to a first displacement error signal derived from the analysis of the image in the first imaging device and at least in an axis corresponding to a second displacement error signal derived from the analysis of the image in the second imaging device.

    Alternative fuels for EUV light source
    5.
    发明申请
    Alternative fuels for EUV light source 失效
    EUV光源的替代燃料

    公开(公告)号：US20060249699A1

    公开(公告)日：2006-11-09

    申请号：US11406216

    申请日：2006-04-17

    Applicant: Norbert Bowering ,  Oleh Khodykin ,  Alexander Bykanov ,  Igor Fomenkov

    Inventor： Norbert Bowering ,  Oleh Khodykin ,  Alexander Bykanov ,  Igor Fomenkov

    IPC: G01J3/10

    CPC classification number: H05G2/006 ,  B82Y10/00 ,  G21K2201/061 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

    Abstract: An EUV light source is disclosed which may comprise at least one optical element having a surface, such as a multi-layer collector mirror; a laser source generating a laser beam; and a source material irradiated by the laser beam to form a plasma and emit EUV light. In one aspect, the source material may consist essentially of a tin compound and may generate tin debris by plasma formation which deposits on the optical element and, in addition, the tin compound may include an element that is effective in etching deposited tin from the optical element surface. Tin compounds may include SnBr4, SnBr2 and SnH4. In another aspect, an EUV light source may comprise a molten source material irradiated by a laser beam to form a plasma and emit EUV light, the source material comprising tin and at least one other metal, for example tin with Gallium and/or Indium.

    Abstract translation: 公开了一种EUV光源，其可以包括具有表面的至少一个光学元件，例如多层收集镜; 产生激光束的激光源; 以及由激光束照射以形成等离子体并发射EUV光的源材料。 在一个方面，源材料可以基本上由锡化合物组成，并且可以通过沉积在光学元件上的等离子体形成而产生锡屑，此外，锡化合物可以包括有效地从光学蚀刻沉积的锡的元素 元素表面。 锡化合物可以包括SnBr 4，SnBr 2和SnH 4。 另一方面，EUV光源可以包括由激光束照射以形成等离子体并发射EUV光的熔融源材料，源材料包含锡和至少一种其它金属，例如锡与镓和/或铟。

    LLP EUV drive laser
    6.
    发明申请
    LLP EUV drive laser 审中-公开
    LLP EUV驱动激光

    公开(公告)号：US20060146906A1

    公开(公告)日：2006-07-06

    申请号：US11324104

    申请日：2005-12-29

    Applicant: Daniel Brown ,  Alexander Ershov ,  Vladimir Fleurov ,  Igor Fomenkov ,  William Partlo

    Inventor： Daniel Brown ,  Alexander Ershov ,  Vladimir Fleurov ,  Igor Fomenkov ,  William Partlo

    IPC: H01S3/22 ,  H01S3/223

    CPC classification number: H01S3/225 ,  H01S3/094 ,  H01S3/10015 ,  H01S3/10023 ,  H01S3/109 ,  H01S3/1611 ,  H01S3/1653 ,  H01S3/2255 ,  H01S3/2308 ,  H01S3/2333 ,  H01S3/2366 ,  H01S3/2375 ,  H01S3/2383 ,  H05G2/003 ,  H05G2/005 ,  H05G2/008

    Abstract: An apparatus and method is disclosed which may comprise an EUV drive laser system comprising: a solid state seed laser master oscillator laser; a gas discharge excimer laser gain generator producing a drive laser output light beam. The solid state seed laser may comprise a third harmonic Nd:YLF laser, which may be tunable. The gas discharge excimer gain generator laser may comprise a XeF excimer laser power amplifier or power oscillator. The solid state laser may comprise a tunable laser tuned by changing the temperature of a laser crystal comprising the solid state laser, or by utilizing a wavelength selection element, e.g., a Lyot filter or an etalon.

    Abstract translation: 公开了一种可以包括EUV驱动激光系统的装置和方法，该系统包括：固态种子激光主振荡器激光器; 产生驱动激光输出光束的气体放电准分子激光增益发生器。 固态种子激光器可以包括可调谐的三次谐波Nd：YLF激光器。 气体放电准分子增益发生器激光器可以包括XeF准分子激光功率放大器或功率振荡器。 固体激光器可以包括通过改变包括固态激光器的激光晶体的温度或通过利用波长选择元件例如Lyot滤光器或标准具来调节的可调谐激光器。

    EUV light source
    8.
    发明申请
    EUV light source 有权

    公开(公告)号：US20050199829A1

    公开(公告)日：2005-09-15

    申请号：US10900839

    申请日：2004-07-27

    Applicant: William Partlo ,  Norbert Bowering ,  Alexander Ershov ,  Igor Fomenkov ,  David Myers ,  Ian Oliver ,  John Viatella ,  Robert Jacques

    Inventor： William Partlo ,  Norbert Bowering ,  Alexander Ershov ,  Igor Fomenkov ,  David Myers ,  Ian Oliver ,  John Viatella ,  Robert Jacques

    IPC: G03F7/20 ,  G21K1/06 ,  H01J35/20 ,  H05G2/00 ,  H01J65/04

    CPC classification number: G03F7/70033 ,  B82Y10/00 ,  G03F7/70175 ,  G03F7/70916 ,  G21K1/062 ,  G21K2201/061 ,  G21K2201/065 ,  G21K2201/067 ,  H05G2/003 ,  H05G2/005 ,  H05G2/006 ,  H05G2/008

    Abstract: An apparatus and method for EUV light production is disclosed which may comprise a laser produced plasma (“LPP”) extreme ultraviolet (“EUV”) light source control system comprising a target delivery system adapted to deliver moving plasma initiation targets and an EUV light collection optic having a focus defining a desired plasma initiation site, comprising: a target tracking and feedback system comprising: at least one imaging device providing as an output an image of a target stream track, wherein the target stream track results from the imaging speed of the camera being too slow to image individual plasma formation targets forming the target stream imaged as the target stream track; a stream track error detector detecting an error in the position of the target stream track in at least one axis generally perpendicular to the target stream track from a desired stream track intersecting the desired plasma initiation site. At least one target crossing detector may be aimed at the target track and detecting the passage of a plasma formation target through a selected point in the target track. A drive laser triggering mechanism utilizing an output of the target crossing detector to determine the timing of a drive laser trigger in order for a drive laser output pulse to intersect the plasma initiation target at a selected plasma initiation site along the target track at generally its closest approach to the desired plasma initiation site. A plasma initiation detector may be aimed at the target track and detecting the location along the target track of a plasma initiation site for a respective target. An intermediate focus illuminator may illuminate an aperture formed at the intermediate focus to image the aperture in the at least one imaging device. The at least one imaging device may be at least two imaging devices each providing an error signal related to the separation of the target track from the vertical centerline axis of the image of the intermediate focus based upon an analysis of the image in the respective one of the at least two imaging devices. A target delivery feedback and control system may comprise a target delivery unit; a target delivery displacement control mechanism displacing the target delivery mechanism at least in an axis corresponding to a first displacement error signal derived from the analysis of the image in the first imaging device and at least in an axis corresponding to a second displacement error signal derived from the analysis of the image in the second imaging device.

    Wavelength reference for excimer laser
    9.
    发明授权
    Wavelength reference for excimer laser 失效
    准分子激光器的波长参考

    公开(公告)号：US5978391A

    公开(公告)日：1999-11-02

    申请号：US896384

    申请日：1997-07-18

    Applicant: Palash P. Das ,  Richard L. Sandstrom ,  Igor Fomenkov

    Inventor： Palash P. Das ,  Richard L. Sandstrom ,  Igor Fomenkov

    IPC: G01M11/00 ,  G01J3/02 ,  G01J3/06 ,  G01J9/00 ,  G03F7/20 ,  H01S3/00 ,  H01S3/03 ,  H01S3/034 ,  H01S3/13 ,  H01S3/134 ,  H01S3/137 ,  H01S3/139 ,  H01S3/225

    CPC classification number: H01S3/1303 ,  G01J9/00 ,  G03F7/70025 ,  G03F7/70041 ,  G03F7/70558 ,  G03F7/70575 ,  H01S3/03 ,  H01S3/134 ,  H01S3/225 ,  H01S3/1392

    Abstract: The preferred embodiment of the invention uses known atomic or molecular absorptions as absolute wavelength standards for calibrating wavelength measurement instruments used in tunable lasers. Examples of atomic and molecular absorptions are carbon and molecular oxygen that have absorptions including 193.0905 nm and 193.2728 nm, respectively, for use with a tunable Argon Fluoride excimer laser at approximately 193 nm. A wavelength measuring device (e.g., a wavemeter) is equipped with a gas cell containing the absorption gas. During a calibration procedure, the wavelength measured by the wavemeter is compared to the atomic or molecular absorption. The wavemeter's calibration constants are then adjusted accordingly to match the wavemeter's output to the atomic or molecular absorption wavelength. Such calibration procedures, therefore, calibrate the wavemeter to absolute standards and correct for any drift in the wavemeter that may occur between calibrations. Some gases, such as molecular oxygen, have multiple molecular absorptions within the tunable range of the laser. The use of multiple absorptions during calibration procedure enhances the precision of the procedure due to the proximity of an absorption line to the final wavelength of interest. After calibration, the laser is tuned to the final wavelength of interest using the calibrated wavemeter.

    Abstract translation: 本发明的优选实施方案使用已知的原子或分子吸收作为用于校准可调激光器中使用的波长测量仪器的绝对波长标准。 原子和分子吸收的实例是碳和分子氧，它们分别具有包括193.0905nm和193.2728nm的吸收，用于在约193nm的可调谐氩化物准分子激光器。 波长测量装置（例如波分计）装备有包含吸收气体的气室。 在校准过程中，将波分计测得的波长与原子或分子吸收进行比较。 然后相应调整波形计的校准常数，以将波长计的输出与原子或分子吸收波长相匹配。 因此，这种校准程序将波形计校准为绝对标准，并校正校准之间可能发生的波长计中的任何漂移。 一些气体，如分子氧，在激光器的可调谐范围内具有多个分子吸收。 在校准过程中使用多重吸收增加了由于吸收线与感兴趣的最终波长的接近而导致的程序精度。 校准后，使用校准波长计将激光器调谐到感兴趣的最终波长。

    Energy Sensors for Light Beam Alignment
    10.
    发明申请
    Energy Sensors for Light Beam Alignment 有权
    光束对准​​能量传感器

    公开(公告)号：US20130043401A1

    公开(公告)日：2013-02-21

    申请号：US13249504

    申请日：2011-09-30

    Applicant: Matthew Graham ,  Steven Chang ,  Jim Crouch ,  Igor Fomenkov

    Inventor： Matthew Graham ,  Steven Chang ,  Jim Crouch ,  Igor Fomenkov

    IPC: G01J1/42 ,  G01J1/16

    CPC classification number: G03F7/70033 ,  H05G2/003 ,  H05G2/008

    Abstract: An apparatus includes a drive laser system producing an amplified light beam of pulses that travels along a drive axis; a beam delivery system that directs the amplified light beam of pulses toward a target region; a target material delivery system that provides a target mixture containing a target material in the target region; two or more sensors radially separated from a main axis that crosses the target region, the two or more sensors being configured to detect energy of ultraviolet electromagnetic radiation emitted from a plasma state of the target material when the amplified light beam of pulses intersects the target mixture; and a controller that receives the output from the two or more sensors. The controller is configured to estimate a relative radial alignment between the target mixture and the drive axis within the target region based on an analysis of the detected energy.

    Abstract translation: 一种装置包括驱动激光系统，其产生沿驱动轴线行进的放大的脉冲光束; 射束传送系统，其将放大的脉冲光束朝向目标区域引导; 目标材料输送系统，其在目标区域中提供含有目标材料的目标混合物; 两个或更多个传感器与跨越目标区域的主轴径向分离，两个或更多个传感器被配置为当被放大的脉冲波束与目标混合物相交时，检测从目标材料的等离子体状态发射的紫外电磁辐射的能量 ; 以及接收来自两个或更多个传感器的输出的控制器。 控制器被配置为基于对所检测的能量的分析来估计目标混合物和目标区域内的驱动轴之间的相对径向对准。

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