Electron Microscope and Specimen Contamination Prevention Method

    公开(公告)号:US20220328280A1

    公开(公告)日:2022-10-13

    申请号:US17718976

    申请日:2022-04-12

    Applicant: JEOL Ltd.

    Abstract: A contamination prevention irradiation device includes a generation unit and a mirror unit. The generation unit generates a laser beam. The mirror unit has a mirror surface for reflecting a laser beam. The laser beam reflected on the mirror surface is applied to a specimen disposed inside an objective lens. The laser beam is composed of a pulse train. Once a laser beam is applied to the specimen before observation of the specimen, deposition of contaminants on the specimen can be prevented for a predetermined subsequent period.

Patent Agency Ranking