公开(公告)号：US20170076907A1

公开(公告)日：2017-03-16

申请号：US15251554

申请日：2016-08-30

Applicant: KABUSHIKI KAISHA TOSHIBA

Inventor： Kazuto MATSUKI ,  Ryoichi SUSUKI ,  Hiroyuki KASHIWAGI ,  Takashi SATO

IPC: H01J37/073 ,  H01J37/20

CPC classification number: H01J37/073 ,  G21K5/04 ,  H01J33/00 ,  H01J37/20 ,  H01J2237/202

Abstract: An electron beam irradiation device includes a stage, a main body unit, and a first mechanism. The main body unit includes a substrate, first members, and a first layer. The first members are arranged to be separated in a second direction intersecting a first direction and is provided at a first surface of the substrate opposing the stage. The first layer is provided between the stage and the first members and between the stage and the substrate. The first layer converts a light ray into an electron beam. The first mechanism is provided in the stage and moves the stage in the second direction. A distance of the movement is not less than a spacing between a center in the second direction of the first member and a center in the second direction of one other first member adjacent to the first member.

Abstract translation: 电子束照射装置包括台，主体单元和第一机构。 主体单元包括基板，第一构件和第一层。 第一构件被布置为在与第一方向相交的第二方向上分离，并且设置在与基座相对的基板的第一表面处。 第一层设置在载物台与第一构件之间以及载物台与基底之间。 第一层将光线转换成电子束。 第一机构设置在舞台中，并且在第二方向上移动舞台。 运动的距离不小于第一构件的第二方向上的中心与邻近第一构件的另一个第一构件的第二方向上的中心之间的间隔。

公开(公告)号：US20170178896A1

公开(公告)日：2017-06-22

申请号：US15208316

申请日：2016-07-12

Applicant: KABUSHIKI KAISHA TOSHIBA

Inventor： Kazuto MATSUKI ,  Ryoichi SUZUKI ,  Shinichi ITO ,  Seiji MORITA

IPC: H01L21/027 ,  H01L21/3105 ,  H01L21/02

CPC classification number: G03F7/168 ,  B81C1/00031 ,  B81C2201/0149 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/0002 ,  G03F7/002 ,  G03F7/038 ,  G03F7/2059 ,  G03F7/40 ,  H01L21/0271 ,  H01L21/3086 ,  H01L21/31058 ,  H01L21/31144

Abstract: A pattern forming method includes forming a guide pattern on a substrate including first and second regions and applying a directed self-assembly material including a first and a second polymer portion to the substrate. The first region is irradiated with an energy beam. The substrate is subjected to a heating process after irradiation and the directed self-assembly material in the second region separates into a first polymer phase and a second polymer phase. The directed self-assembly material is removed from the first region after irradiation.