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公开(公告)号：US09719932B1
公开(公告)日：2017-08-01
申请号：US14532971
申请日：2014-11-04
Applicant: KLA-Tencor Corporation
Inventor： Derrick Shaughnessy , Michael S. Bakeman , Guorong V. Zhuang , Andrei V. Shchegrov , Leonid Poslavsky
IPC: G01N21/00 , G01N21/67 , G01N21/95 , H01S3/0915
CPC classification number: G01N21/9501 , G01N2201/061 , G03F7/70616 , H01L22/12
Abstract: Methods and systems are described herein for producing high radiance illumination light for use in semiconductor metrology based on a confined, sustained plasma. One or more plasma confining circuits introduce an electric field, a magnetic field, or a combination thereof to spatially confine a sustained plasma. The confinement of the sustained plasma decreases the size of the induced plasma resulting in increased radiance. In addition, plasma confinement may be utilized to shape the plasma to improve light collection and imaging onto the specimen. The induced fields may be static or dynamic. In some embodiments, additional energy is coupled into the confined, sustained plasma to further increase radiance. In some embodiments, the pump energy source employed to sustained the plasma is modulated in combination with the plasma confining circuit to reduce plasma emission noise.
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公开(公告)号：US09512985B2
公开(公告)日：2016-12-06
申请号：US13774025
申请日：2013-02-22
Applicant: KLA-Tencor Corporation
Inventor： Gregory R. Brady , Andrei V. Shchegrov , Lawrence D. Rotter , Derrick Shaughnessy , Anatoly Shchemelinin , Ilya Bezel , Muzammil A. Arain , Anatoly A. Vasiliev , James Andrew Allen , Oleg Shulepov , Andrew V. Hill , Ohad Bachar , Moshe Markowitz , Yaron Ish-Shalom , Ilan Sela , Amnon Manassen , Alexander Svizher , Maxim Khokhlov , Avi Abramov , Oleg Tsibulevsky , Daniel Kandel , Mark Ghinovker
CPC classification number: G01J3/10 , F21V13/00 , F21V13/08 , F21V13/12 , G01J3/0218 , G01J3/12 , G02B6/29332 , G02B6/29362 , G02B6/29388 , G02B6/29395 , G02B6/3508 , G02B6/353 , H01J65/04
Abstract: The disclosure is directed to systems for providing illumination to a measurement head for optical metrology. In some embodiments of the disclosure, illumination beams from a plurality of illumination sources are combined to deliver illumination at one or more selected wavelengths to the measurement head. In some embodiments of the disclosure, intensity and/or spatial coherence of illumination delivered to the measurement head is controlled. In some embodiments of the disclosure, illumination at one or more selected wavelengths is delivered from a broadband illumination source configured for providing illumination at a continuous range of wavelengths.
Abstract translation: 本公开涉及用于向用于光学测量的测量头提供照明的系统。 在本公开的一些实施例中，来自多个照明源的照明光束被组合以将一个或多个所选波长的照明传送到测量头。 在本公开的一些实施例中，控制传送到测量头的照明的强度和/或空间相干性。 在本公开的一些实施例中，一个或多个所选波长的照明从配置成在连续波长范围内提供照明的宽带照明源传送。
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公开(公告)号：US09400246B2
公开(公告)日：2016-07-26
申请号：US13648768
申请日：2012-10-10
Applicant: KLA-Tencor Corporation
Inventor： Andrei V. Shchegrov , Lawrence D. Rotter , David Y. Wang , Andrei Veldman , Kevin Peterlinz , Gregory Brady , Derrick Shaughnessy
CPC classification number: G01N21/211 , G01B11/0616 , G01N21/4738 , G01N21/55 , G01N2021/213 , G03F7/70608 , G03F7/70625 , G03F7/70633
Abstract: The present invention may include a modulatable illumination source configured to illuminate a surface of a sample disposed on a sample stage, a detector configured to detect illumination emanating from a surface of the sample, illumination optics configured to direct illumination from the modulatable illumination source to the surface of the sample, collection optics configured to direct illumination from the surface of the sample to the detector, and a modulation control system communicatively coupled to the modulatable illumination source, wherein the modulation control system is configured to modulate a drive current of the modulatable illumination source at a selected modulation frequency suitable for generating illumination having a selected coherence feature length. In addition, the present invention includes the time-sequential interleaving of outputs of multiple light sources to generate periodic pulses trains for use in multi-wavelength time-sequential optical metrology.
Abstract translation: 本发明可以包括被配置为照亮设置在样品台上的样品的表面的可调节照明源，被配置为检测从样品的表面发出的照明的检测器，被配置为将来自可调节照明源的照明引导到 样品的表面，被配置为将样品的表面的照射引导到检测器的收集光学器件，以及通信地耦合到可调节照明源的调制控制系统，其中调制控制系统被配置为调制可调节照明的驱动电流 源，其以适于产生具有选定的相干特征长度的照明的选定调制频率。 此外，本发明包括多个光源的输出的时间顺序交错以产生用于多波长时间顺序光学测量的周期性脉冲串。
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公开(公告)号：US20130169966A1
公开(公告)日：2013-07-04
申请号：US13648768
申请日：2012-10-10
Applicant: KLA-Tencor Corporation
Inventor： Andrei V. Shchegrov , Lawrence D. Rotter , David Y. Wang , Andrei Veldman , Kevin Peterlinz , Gregory Brady , Derrick Shaughnessy
CPC classification number: G01N21/211 , G01B11/0616 , G01N21/4738 , G01N21/55 , G01N2021/213 , G03F7/70608 , G03F7/70625 , G03F7/70633
Abstract: The present invention may include a modulatable illumination source configured to illuminate a surface of a sample disposed on a sample stage, a detector configured to detect illumination emanating from a surface of the sample, illumination optics configured to direct illumination from the modulatable illumination source to the surface of the sample, collection optics configured to direct illumination from the surface of the sample to the detector, and a modulation control system communicatively coupled to the modulatable illumination source, wherein the modulation control system is configured to modulate a drive current of the modulatable illumination source at a selected modulation frequency suitable for generating illumination having a selected coherence feature length. In addition, the present invention includes the time-sequential interleaving of outputs of multiple light sources to generate periodic pulses trains for use in multi-wavelength time-sequential optical metrology.
Abstract translation: 本发明可以包括被配置为照亮设置在样品台上的样品的表面的可调节照明源，被配置为检测从样品的表面发出的照明的检测器，被配置为将来自可调节照明源的照明引导到 样品的表面，被配置为将样品的表面的照射引导到检测器的收集光学器件，以及通信地耦合到可调节照明源的调制控制系统，其中调制控制系统被配置为调制可调节照明的驱动电流 源，其以适于产生具有选定的相干特征长度的照明的选定调制频率。 此外，本发明包括多个光源的输出的时间顺序交错以产生用于多波长时间顺序光学测量的周期性脉冲串。
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Patent Agency Ranking
公开(公告)号：US10804167B2
公开(公告)日：2020-10-13
申请号：US16257066
申请日：2019-01-24
Applicant: KLA-Tencor Corporation
Inventor： David Y. Wang , Esen Salcin , Michael Friedmann , Derrick Shaughnessy , Andrei V. Shchegrov , Jonathan M. Madsen , Alexander Kuznetsov
Abstract: Methods and systems for performing co-located measurements of semiconductor structures with two or more measurement subsystems are presented herein. To achieve a sufficiently small measurement box size, the metrology system monitors and corrects the alignment of the measurement spot of each metrology subsystem with a metrology target to achieve maximum co-location of the measurement spots of each metrology subsystem with the metrology target. In another aspect, measurements are performed simultaneously by two or more metrology subsystems at high throughput at the same wafer location. Furthermore, the metrology system effectively decouples simultaneously acquired measurement signals associated with each measurement subsystem. This maximizes signal information associated with simultaneous measurements of the same metrology by two or more metrology subsystems.
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公开(公告)号：US20140240951A1
公开(公告)日：2014-08-28
申请号：US13774025
申请日：2013-02-22
Applicant: KLA-Tencor Corporation
Inventor： Gregory R. Brady , Andrei V. Shchegrov , Lawrence D. Rotter , Derrick Shaughnessy , Anatoly Shchemelinin , Ilya Bezel , Muzammil A. Arain , Anatoly A. Vasiliev , James Andrew Allen , Oleg Shulepov , Andrew V. Hill , Ohad Bachar , Moshe Markowitz , Yaron Ish-Shalom , Ilan Sela , Amnon Manassen , Alexander Svizher , Maxim Khokhlov , Avi Abramov , Oleg Tsibulevsky , Daniel Kandel , Mark Ghinovker
CPC classification number: G01J3/10 , F21V13/00 , F21V13/08 , F21V13/12 , G01J3/0218 , G01J3/12 , G02B6/29332 , G02B6/29362 , G02B6/29388 , G02B6/29395 , G02B6/3508 , G02B6/353 , H01J65/04
Abstract: The disclosure is directed to systems for providing illumination to a measurement head for optical metrology. In some embodiments of the disclosure, illumination beams from a plurality of illumination sources are combined to deliver illumination at one or more selected wavelengths to the measurement head. In some embodiments of the disclosure, intensity and/or spatial coherence of illumination delivered to the measurement head is controlled. In some embodiments of the disclosure, illumination at one or more selected wavelengths is delivered from a broadband illumination source configured for providing illumination at a continuous range of wavelengths.
Abstract translation: 本公开涉及用于向用于光学测量的测量头提供照明的系统。 在本公开的一些实施例中，来自多个照明源的照明光束被组合以将一个或多个所选波长的照明传送到测量头。 在本公开的一些实施例中，控制传送到测量头的照明的强度和/或空间相干性。 在本公开的一些实施例中，一个或多个所选波长的照明从配置成在连续波长范围内提供照明的宽带照明源传送。
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公开(公告)号：US20200243400A1
公开(公告)日：2020-07-30
申请号：US16257066
申请日：2019-01-24
Applicant: KLA-Tencor Corporation
Inventor： David Y. Wang , Esen Salcin , Michael Friedmann , Derrick Shaughnessy , Andrei V. Shchegrov , Jonathan M. Madsen , Alexander Kuznetsov
Abstract: Methods and systems for performing co-located measurements of semiconductor structures with two or more measurement subsystems are presented herein. To achieve a sufficiently small measurement box size, the metrology system monitors and corrects the alignment of the measurement spot of each metrology subsystem with a metrology target to achieve maximum co-location of the measurement spots of each metrology subsystem with the metrology target. In another aspect, measurements are performed simultaneously by two or more metrology subsystems at high throughput at the same wafer location. Furthermore, the metrology system effectively decouples simultaneously acquired measurement signals associated with each measurement subsystem. This maximizes signal information associated with simultaneous measurements of the same metrology by two or more metrology subsystems.
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公开(公告)号：US10006865B1
公开(公告)日：2018-06-26
申请号：US15640961
申请日：2017-07-03
Applicant: KLA-Tencor Corporation
Inventor： Derrick Shaughnessy , Michael S. Bakeman , Guorong V. Zhuang , Andrei V. Shchegrov , Leonid Poslavsky
IPC: G01N21/55 , G01N21/67 , H01S3/0915 , G01N21/95
CPC classification number: G01N21/9501 , G01N2201/061 , G03F7/70616 , H01L22/12
Abstract: Methods and systems are described herein for producing high radiance illumination light for use in semiconductor metrology based on a confined, sustained plasma. One or more plasma confining circuits introduce an electric field, a magnetic field, or a combination thereof to spatially confine a sustained plasma. The confinement of the sustained plasma decreases the size of the induced plasma resulting in increased radiance. In addition, plasma confinement may be utilized to shape the plasma to improve light collection and imaging onto the specimen. The induced fields may be static or dynamic. In some embodiments, additional energy is coupled into the confined, sustained plasma to further increase radiance. In some embodiments, the pump energy source employed to sustained the plasma is modulated in combination with the plasma confining circuit to reduce plasma emission noise.
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9.发明授权Metrology systems and methods for high aspect ratio and large lateral dimension structures 有权高纵横比和大横向尺寸结构的计量系统和方法公开(公告)号：US08860937B1
公开(公告)日：2014-10-14
申请号：US13743304
申请日：2013-01-16
Applicant: KLA-Tencor Corporation
Inventor： Thaddeus Gerard Dziura , Xuefeng Liu , David Y. Wang , Jonathan Madsen , Alexander Kuznetsov , Johannes D. de Veer , Shankar Krishnan , Derrick Shaughnessy , Andrei Shchegrov
CPC classification number: G01N21/47 , G01B2210/56 , H01L22/12 , H01L2924/0002 , H01L2924/00
Abstract: Various metrology systems and methods for high aspect ratio and large lateral dimension structures are provided. One method includes directing light to one or more structures formed on a wafer. The light includes ultraviolet light, visible light, and infrared light. The one or more structures include at least one high aspect ratio structure or at least one large lateral dimension structure. The method also includes generating output responsive to light from the one or more structures due to the light directed to the one or more structures. In addition, the method includes determining one or more characteristics of the one or more structures using the output.
Abstract translation: 提供了用于高纵横比和大横向尺寸结构的各种计量系统和方法。 一种方法包括将光引导到在晶片上形成的一个或多个结构。 该光包括紫外光，可见光和红外光。 一个或多个结构包括至少一个高纵横比结构或至少一个大的横向尺寸结构。 该方法还包括响应于来自一个或多个结构的光而产生输出，这是由于指向一个或多个结构的光。 另外，该方法包括使用该输出确定一个或多个结构的一个或多个特性。
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