ADAPTABLE ILLUMINATING APPARATUS, SYSTEM, AND METHOD FOR EXTREME ULTRA-VIOLET LIGHT
    1.
    发明申请
    ADAPTABLE ILLUMINATING APPARATUS, SYSTEM, AND METHOD FOR EXTREME ULTRA-VIOLET LIGHT 有权
    适用于超紫外灯的适应性照明设备,系统和方法

    公开(公告)号:US20140175308A1

    公开(公告)日:2014-06-26

    申请号:US14109457

    申请日:2013-12-17

    Abstract: An apparatus for focusing light in a semi-conductor inspection system, including: a first mirror arranged to reflect extreme ultra-violet (EUV) generated by a plasma source; and a second mirror arranged to focus the EUV light, reflected from the first mirror, onto a first intermediate focus plane. A homogenizing tunnel, including: a first aperture having a first shape and a first size and arranged to receive extreme ultra-violet (EUV) light; a second aperture having a second shape and a second size; and a passageway connecting the first and second apertures and arranged to homogenize the EUV light received by the first aperture. The first shape is different from the second shape or the first size is different from the second size.

    Abstract translation: 一种用于将光聚焦在半导体检查系统中的装置,包括:第一反射镜,被布置成反射由等离子​​体源产生的极紫外(EUV); 以及布置成将从第一反射镜反射的EUV光聚焦到第一中间焦平面上的第二反射镜。 一种均质隧道,包括:具有第一形状和第一尺寸的第一孔,并且布置成接收极紫外(EUV)光; 具有第二形状和第二尺寸的第二孔; 以及连接第一孔和第二孔并设置成使由第一孔接收的EUV光均匀化的通道。 第一形状与第二形状不同,或者第一尺寸与第二尺寸不同。

    Adaptable illuminating apparatus, system, and method for extreme ultra-violet light
    3.
    发明授权
    Adaptable illuminating apparatus, system, and method for extreme ultra-violet light 有权
    适用于极紫外光的照明装置,系统和方法

    公开(公告)号:US09046500B2

    公开(公告)日:2015-06-02

    申请号:US14109457

    申请日:2013-12-17

    Abstract: An apparatus for focusing light in a semi-conductor inspection system, including: a first mirror arranged to reflect extreme ultra-violet (EUV) generated by a plasma source; and a second mirror arranged to focus the EUV light, reflected from the first mirror, onto a first intermediate focus plane. A homogenizing tunnel, including: a first aperture having a first shape and a first size and arranged to receive extreme ultra-violet (EUV) light; a second aperture having a second shape and a second size; and a passageway connecting the first and second apertures and arranged to homogenize the EUV light received by the first aperture. The first shape is different from the second shape or the first size is different from the second size.

    Abstract translation: 一种用于将光聚焦在半导体检查系统中的装置,包括:第一反射镜,被布置成反射由等离子​​体源产生的极紫外(EUV); 以及布置成将从第一反射镜反射的EUV光聚焦到第一中间焦平面上的第二反射镜。 一种均质隧道,包括:具有第一形状和第一尺寸的第一孔,并且布置成接收极紫外(EUV)光; 具有第二形状和第二尺寸的第二孔; 以及连接第一孔和第二孔并设置成使由第一孔接收的EUV光均匀化的通道。 第一形状与第二形状不同,或者第一尺寸与第二尺寸不同。

Patent Agency Ranking