公开(公告)号：US20110094996A1

公开(公告)日：2011-04-28

申请号：US12913162

申请日：2010-10-27

Applicant: Yohei YAMAZAWA ,  Chishio KOSHIMIZU ,  Masashi SAITO ,  Kazuki DENPOH ,  Jun YAMAWAKU

Inventor： Yohei YAMAZAWA ,  Chishio KOSHIMIZU ,  Masashi SAITO ,  Kazuki DENPOH ,  Jun YAMAWAKU

IPC: C23F1/08 ,  C23C16/52 ,  C23C16/455 ,  C23C16/458 ,  C23C16/505 ,  C23F1/00

CPC classification number: H01J37/3211 ,  H01J37/321 ,  H01J37/32146 ,  H01L21/67109 ,  H01L21/6831

Abstract: A plasma processing apparatus includes a processing chamber including a dielectric window; a coil-shaped RF antenna, provided outside the dielectric window; a substrate supporting unit provided in the processing chamber; a processing gas supply unit; an RF power supply unit for supplying an RF power to the RF antenna to generate a plasma of the processing gas by an inductive coupling in the processing chamber, the RF power having an appropriate frequency for RF discharge of the processing gas; a correction coil, provided at a position outside the processing chamber where the correction coil is to be coupled with the RF antenna by an electromagnetic induction, for controlling a plasma density distribution on the substrate in the processing chamber; a switching device provided in a loop of the correction coil; and a switching control unit for on-off controlling the switching device at a desired duty ratio by pulse width modulation.

Abstract translation: 一种等离子体处理装置，包括：具有电介质窗的处理室; 设置在电介质窗外部的线圈状RF天线; 设置在所述处理室中的基板支撑单元; 处理气体供应单元; RF电源单元，用于向RF天线提供RF功率以通过处理室中的感应耦合产生处理气体的等离子体，所述RF功率具有用于处理气体的RF放电的适当频率; 校正线圈，设置在所述处理室外侧的位置处，所述校正线圈将通过电磁感应与所述RF天线耦合，用于控制所述处理室中的所述衬底上的等离子体密度分布; 设置在所述校正线圈的环路中的开关装置; 以及用于通过脉冲宽度调制以期望的占空比开关控制开关装置的开关控制单元。

公开(公告)号：US20090057578A1

公开(公告)日：2009-03-05

申请号：US12198420

申请日：2008-08-26

Applicant: Kazuki DENPOH

Inventor： Kazuki DENPOH

IPC: G21G4/00

CPC classification number: H05H1/46 ,  H01J37/32871 ,  H01J37/32935

Abstract: A method of plasma particle simulation capable of preventing solution divergence. A space within a housing chamber of a plasma processing apparatus is divided into a plurality of cells. A weighting factor corresponding to the number of plasma particles represented by a superparticle is set in each of the divided cells. Superparticles are set in each of the divided cells using plasma particles contained in the divided cell and the set weighting factor. The behavior of the superparticles in each of the divided cells is calculated. The weighting factor becomes smaller as the divided cell is located closer to a solid wall surface of the housing chamber.

Abstract translation: 一种能够防止溶液发散的等离子体粒子模拟方法。 等离子体处理装置的容纳室内的空间被分成多个单元。 对应于由超粒子表示的等离子体粒子的数量的加权系数设置在每个分割的单元中。 使用包含在分割单元格中的等离子体粒子和设定的加权因子，将每个分割细胞中的超粒子设定。 计算每个分割细胞中超颗粒的行为。 随着分隔的细胞位于更靠近壳体室的实心壁表面，加权因子变小。