公开(公告)号：US10167552B2

公开(公告)日：2019-01-01

申请号：US14615099

申请日：2015-02-05

Applicant: LAM RESEARCH AG

Inventor： Andreas Gleissner ,  Markus Junk ,  Bhaskar Bandarapu

IPC: C23C16/455 ,  C23C16/458 ,  H01L21/67

Abstract: An apparatus for processing wafer-shaped articles comprises a spin chuck for holding a wafer-shaped article in a predetermined orientation, and a rotating shower head for supplying process gas to a surface of a wafer-shaped article when held by the spin chuck. The rotating shower head comprises an outlet plate having plural openings formed in each of a central and a peripheral region thereof. A process gas feed is provided so as to supply process gas to a gas distribution chamber. The gas distribution chamber is in fluid communication with a plurality of openings formed in the shower head.