APPARATUS FOR TREATING SURFACES OF WAFER-SHAPED ARTICLES
    1.
    发明申请
    APPARATUS FOR TREATING SURFACES OF WAFER-SHAPED ARTICLES 有权
    用于处理波浪形文章表面的装置

    公开(公告)号:US20150187629A1

    公开(公告)日:2015-07-02

    申请号:US14145241

    申请日:2013-12-31

    Abstract: An apparatus for processing wafer-shaped articles comprises a closed process chamber providing a gas-tight enclosure. A rotary chuck is located within the closed process chamber, and is adapted to hold a wafer shaped article thereon. A lid is secured to an upper part of the closed process chamber. The lid comprises an annular chamber, gas inlets communicating with the annular chamber and opening on a surface of the lid facing outwardly of the closed process chamber, and gas outlets communicating with the annular chamber and opening on a surface of the lid facing inwardly of the closed process chamber.

    Abstract translation: 一种用于处理晶片状物品的装置包括一个封闭的处理室,它提供一个气密的外壳。 旋转卡盘位于封闭的处理室内,并且适于在其上保持晶片成形制品。 盖子被固定到封闭处理室的上部。 所述盖包括环形室,与所述环形室连通的气体入口和所述盖的面向所述封闭处理室向外的表面上的开口,以及与所述环形室连通的气体出口和所述盖的面向内的开口 封闭加工室。

    DEVICE FOR MEASURING THE DISTRIBUTION OR IMPULSE OF A SERIES OF DROPLETS
    2.
    发明申请
    DEVICE FOR MEASURING THE DISTRIBUTION OR IMPULSE OF A SERIES OF DROPLETS 有权
    用于测量一系列喷雾器的分布或脉冲的装置

    公开(公告)号:US20160181129A1

    公开(公告)日:2016-06-23

    申请号:US14575692

    申请日:2014-12-18

    Abstract: A device for measuring the distribution and/or impulse of a series of droplets comprises a piezoelectric sensor positioned relative to a source of droplets such that each of a plurality of droplets contacts the piezoelectric sensor in succession, thereby to generate an electrical signal. Logic circuitry is configured to calculate one or more frequencies from the electrical signal.

    Abstract translation: 用于测量一系列液滴的分布和/或脉冲的装置包括相对于液滴源定位的压电传感器,使得多个液滴中的每一个液滴连续地接触压电传感器,从而产生电信号。 逻辑电路被配置为从电信号计算一个或多个频率。

    APPARATUS FOR LIQUID TREATMENT OF DISC-SHAPED ARTICLES AND HEATING SYSTEM FOR USE IN SUCH APPARATUS
    4.
    发明申请
    APPARATUS FOR LIQUID TREATMENT OF DISC-SHAPED ARTICLES AND HEATING SYSTEM FOR USE IN SUCH APPARATUS 有权
    用于液体处理盘形物品的装置和用于这种装置的加热系统

    公开(公告)号:US20150001202A1

    公开(公告)日:2015-01-01

    申请号:US13932926

    申请日:2013-07-01

    Abstract: An apparatus for treating a disc-shaped article comprises a spin chuck and at least three individually controllable infrared heating elements. The infrared heating elements are mounted in a stationary manner with respect to rotation of said spin chuck. The infrared heating elements are arranged in a nested configuration so as to define individually controllable inner, middle and outer heating zones adjacent a disc-shaped article when positioned on the spin chuck.

    Abstract translation: 一种用于处理盘状物品的设备包括旋转卡盘和至少三个独立可控的红外加热元件。 相对于所述旋转卡盘的旋转,红外加热元件以固定的方式安装。 红外加热元件布置成嵌套构型,以便当定位在旋转卡盘上时,限定与盘形物品相邻的独立可控的内部,中间和外部加热区域。

    PROCESS AND APPARATUS FOR TREATING SURFACES OF WAFER-SHAPED ARTICLES
    5.
    发明申请
    PROCESS AND APPARATUS FOR TREATING SURFACES OF WAFER-SHAPED ARTICLES 有权
    用于处理波浪形文字表面的方法和装置

    公开(公告)号:US20140227884A1

    公开(公告)日:2014-08-14

    申请号:US13762681

    申请日:2013-02-08

    Abstract: An apparatus and method for processing wafer-shaped articles utilizes at least first and second liquid-dispensing nozzles, wherein a first liquid-dispensing nozzle is positioned closer to an axis of rotation than the second liquid-dispensing nozzle. A liquid supply system supplies heated process liquid to the nozzles such that process liquid dispensed from the first nozzle has a temperature that differs by an amount within a predetermined range from a temperature of process liquid dispensed from the second liquid-dispensing nozzle.

    Abstract translation: 用于处理晶片状制品的装置和方法至少使用第一和第二液体分配喷嘴,其中第一液体分配喷嘴位于比第二液体分配喷嘴更靠近转动轴线的位置。 液体供应系统向喷嘴提供加热的处理液体,使得从第一喷嘴分配的处理液体具有与从第二液体分配喷嘴分配的处理液体的温度预定范围内的量的温度不同的温度。

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