公开(公告)号：US20230369033A1

公开(公告)日：2023-11-16

申请号：US17983934

申请日：2022-11-09

Applicant: MKS Instruments, Inc.

Inventor： Keith K. Koai ,  Chenglong Yang ,  Guy Rosenzweig ,  Jimmy Liu ,  Michael Harris ,  James Blessing

IPC: H01J37/32 ,  G01N33/00

CPC classification number: H01J37/3299 ,  G01N33/0027 ,  H01J37/32449 ,  H01J2237/24585 ,  H01J37/32357

Abstract: An apparatus for feedback control in plasma processing systems using radical sensing, and a method for feedback control in plasma processing systems using radical sensing, the apparatus comprising at least one process gas supply system configured to output at least one process gas, at least one plasma source configured to receive the at least one process gas and generate at least one radical flow, at least one process chamber in communication with the at least one plasma source, wherein the process chamber receives the at least one radical flow and directs at least a portion of the at least one radical flow to one or more devices, the process chamber configured to output at least one process chamber output, at least one gas analyzer in communication with and configured to sample at least one of the at least one process gas, at least one radical flow, at least one radical flow within the at least one process chamber, and the at least one process chamber output, and at least one controller in communication with at least one of the process gas supply system, at least one plasma source, and at least one process chamber, the controller configured to generate at least one control signal based on data from the at least one gas analyzer and selectively control at least one of the process gas supply system, at least one plasma source, and at least one process chamber.

公开(公告)号：US20220196597A1

公开(公告)日：2022-06-23

申请号：US17644704

申请日：2021-12-16

Applicant: MKS Instruments, Inc.

Inventor： Chenglong Yang ,  Jimmy Liu ,  James Edward Blessing

IPC: G01N27/623 ,  H01J49/28

Abstract: A monitoring system detects and measures a quantity of radical particles within a gas. A test chamber is coupled to a flow channel that transmits a gas. The test chamber defines an aperture connecting the test chamber and the flow channel, and the aperture permits a subset of the gas to enter the test chamber from the flow channel. An ionizer is positioned within the test chamber and generates radical ions from radical particles of the subset of the gas. A mass spectrometer measures a quantity of the radical ions, thereby providing a measurement of the radical particles in the gas.

公开(公告)号：US20240264116A1

公开(公告)日：2024-08-08

申请号：US18621600

申请日：2024-03-29

Applicant: MKS Instruments, Inc.

Inventor： Chenglong Yang ,  Jimmy Liu ,  James Edward Blessing

IPC: G01N27/623 ,  H01J49/28

CPC classification number: G01N27/623 ,  H01J49/282

Abstract: A monitoring system detects and measures a quantity of radical particles within a gas. A test chamber is coupled to a flow channel that transmits a gas. The test chamber defines an aperture connecting the test chamber and the flow channel, and the aperture permits a subset of the gas to enter the test chamber from the flow channel. An ionizer is positioned within the test chamber and generates radical ions from radical particles of the subset of the gas. A mass spectrometer measures a quantity of the radical ions, thereby providing a measurement of the radical particles in the gas.

公开(公告)号：US11971386B2

公开(公告)日：2024-04-30

申请号：US17644704

申请日：2021-12-16

Applicant: MKS Instruments, Inc.

Inventor： Chenglong Yang ,  Jimmy Liu ,  James Edward Blessing

IPC: H01J49/28 ,  G01N27/623

CPC classification number: G01N27/623 ,  H01J49/282

Abstract: A monitoring system detects and measures a quantity of radical particles within a gas. A test chamber is coupled to a flow channel that transmits a gas. The test chamber defines an aperture connecting the test chamber and the flow channel, and the aperture permits a subset of the gas to enter the test chamber from the flow channel. An ionizer is positioned within the test chamber and generates radical ions from radical particles of the subset of the gas. A mass spectrometer measures a quantity of the radical ions, thereby providing a measurement of the radical particles in the gas.

公开(公告)号：US12265057B2

公开(公告)日：2025-04-01

申请号：US18621600

申请日：2024-03-29

Applicant: MKS Instruments, Inc.

Inventor： Chenglong Yang ,  Jimmy Liu ,  James Edward Blessing

IPC: G01N27/623 ,  H01J49/28

Abstract: A monitoring system detects and measures a quantity of radical particles within a gas. A test chamber is coupled to a flow channel that transmits a gas. The test chamber defines an aperture connecting the test chamber and the flow channel, and the aperture permits a subset of the gas to enter the test chamber from the flow channel. An ionizer is positioned within the test chamber and generates radical ions from radical particles of the subset of the gas. A mass spectrometer measures a quantity of the radical ions, thereby providing a measurement of the radical particles in the gas.