公开(公告)号：US09736920B2

公开(公告)日：2017-08-15

申请号：US14616089

申请日：2015-02-06

Applicant: MKS Instruments Inc.

Inventor： Shaun T. Smith ,  Steven R. Walther ,  Chen Wu

IPC: H05H1/46 ,  H01J37/32

CPC classification number: H05H1/46 ,  H01J37/32082 ,  H01J37/32174 ,  H01J37/32192 ,  H01J37/32247 ,  H01J37/32311 ,  H05H2001/4607 ,  H05H2001/4652

Abstract: Methods and apparatus for igniting a process plasma within a plasma chamber are provided. One or more self-resonating devices are positioned within a plasma chamber relative to a plasma generation volume within the plasma chamber. The plasma generation volume is defined by the plasma chamber. Each of the self-resonating devices generates an ignition plasma. The ignition plasmas cause a partial ionization of an ignition gas. The partially ionized ignition gas allows for ignition of a process plasma by applying an electric field to the plasma generation volume.

公开(公告)号：US10076020B2

公开(公告)日：2018-09-11

申请号：US15643060

申请日：2017-07-06

Applicant: MKS Instruments Inc.

Inventor： Shaun T. Smith ,  Steven R. Walther ,  Chen Wu

IPC: H05H1/46 ,  H01J37/32

CPC classification number: H05H1/46 ,  H01J37/32082 ,  H01J37/32174 ,  H01J37/32192 ,  H01J37/32247 ,  H01J37/32311 ,  H05H2001/4607 ,  H05H2001/4652

Abstract: Methods and apparatus for igniting a process plasma within a plasma chamber are provided. One or more self-resonating devices are positioned within a plasma chamber relative to a plasma generation volume within the plasma chamber. The plasma generation volume is defined by the plasma chamber. Each of the self-resonating devices generates an ignition plasma. The ignition plasmas cause a partial ionization of an ignition gas. The partially ionized ignition gas allows for ignition of a process plasma by applying an electric field to the plasma generation volume.

公开(公告)号：US20160234924A1

公开(公告)日：2016-08-11

申请号：US14616089

申请日：2015-02-06

Applicant: MKS Instruments Inc.

Inventor： Shaun T. Smith ,  Steven R. Walther ,  Chen Wu

IPC: H05H1/46

CPC classification number: H05H1/46 ,  H01J37/32082 ,  H01J37/32174 ,  H01J37/32192 ,  H01J37/32247 ,  H01J37/32311 ,  H05H2001/4607 ,  H05H2001/4652

Abstract: Methods and apparatus for igniting a process plasma within a plasma chamber are provided. One or more self-resonating devices are positioned within a plasma chamber relative to a plasma generation volume within the plasma chamber. The plasma generation volume is defined by the plasma chamber. Each of the self-resonating devices generates an ignition plasma. The ignition plasmas cause a partial ionization of an ignition gas. The partially ionized ignition gas allows for ignition of a process plasma by applying an electric field to the plasma generation volume.

Abstract translation: 提供了用于点燃等离子体室内的处理等离子体的方法和装置。 相对于等离子体室内的等离子体产生体积，一个或多个自谐振装置位于等离子体室内。 等离子体产生体积由等离子体室限定。 每个自谐振装置产生点火等离子体。 点火等离子体引起点燃气体的部分电离。 部分电离的点火气体允许通过向等离子体产生体积施加电场来点燃过程等离子体。

公开(公告)号：US20170303382A1

公开(公告)日：2017-10-19

申请号：US15643060

申请日：2017-07-06

Applicant: MKS Instruments Inc.

Inventor： Shaun T. Smith ,  Steven R. Walther ,  Chen Wu

IPC: H05H1/46 ,  H01J37/32

CPC classification number: H05H1/46 ,  H01J37/32082 ,  H01J37/32174 ,  H01J37/32192 ,  H01J37/32247 ,  H01J37/32311 ,  H05H2001/4607 ,  H05H2001/4652

Abstract: Methods and apparatus for igniting a process plasma within a plasma chamber are provided. One or more self-resonating devices are positioned within a plasma chamber relative to a plasma generation volume within the plasma chamber. The plasma generation volume is defined by the plasma chamber. Each of the self-resonating devices generates an ignition plasma. The ignition plasmas cause a partial ionization of an ignition gas. The partially ionized ignition gas allows for ignition of a process plasma by applying an electric field to the plasma generation volume.