公开(公告)号：US12094697B2

公开(公告)日：2024-09-17

申请号：US18232834

申请日：2023-08-11

Applicant: Tokyo Electron Limited

Inventor： Toshimasa Kobayashi ,  Kazuki Takahashi

IPC: H01J37/32 ,  B01D53/04

CPC classification number: H01J37/32844 ,  B01D53/0407 ,  H01J37/32229 ,  H01J37/3244 ,  H01J37/32871 ,  B01D2253/34 ,  H01J37/32311

Abstract: A plasma processing apparatus includes: a processing container in which a mounting stage mounted with a substrate is provided and a plasma process is performed on the substrate; an exhaust passage which is provided around the mounting stage and through which a gas containing a by-product released by the plasma process flows; and a first adsorption member which is arranged along an inner wall surface of the exhaust passage and of which a surface is roughened to adsorb the by-product.

公开(公告)号：US12094687B2

公开(公告)日：2024-09-17

申请号：US17464816

申请日：2021-09-02

Applicant: HITACHI HIGH-TECH CORPORATION

Inventor： Masayuki Shiina ,  Naoki Yasui ,  Tetsuo Ono

IPC: H01J37/32 ,  H01L21/263 ,  H01L21/3115 ,  H01L21/3213 ,  H01L21/67 ,  H01L29/66

CPC classification number: H01J37/32165 ,  H01J37/32082 ,  H01J37/32091 ,  H01J37/32137 ,  H01J37/32146 ,  H01J37/32174 ,  H01J37/32192 ,  H01J37/32311 ,  H01J37/3244 ,  H01L21/2633 ,  H01L21/31155 ,  H01L21/32136 ,  H01L21/32137 ,  H01L21/67069 ,  H01L29/66795

Abstract: The plasma processing apparatus has a plasma processing chamber where plasma processing of the sample is performed, and plasma power supply that supplies radio frequency electric power for generating plasma. The radio frequency electric power is time modulated by a pulse wave having a first period and a second period that are repeated periodically. The pulse wave of the first period has first amplitude and the pulse wave of the second period has second amplitude which is a limited value smaller than the first amplitude. The extinction of the plasma, which is generated during the first period having the first amplitude, is maintained during the second period having the second amplitude with a predetermined dissociation.

公开(公告)号：US20240222085A1

公开(公告)日：2024-07-04

申请号：US18605902

申请日：2024-03-15

Applicant: Tokyo Electron Limited

Inventor： Koichiro NAKAMURA ,  Norihisa KIYOFUJI

IPC: H01J37/32

CPC classification number: H01J37/32311 ,  H01J37/32201 ,  H01J37/3222 ,  H01J37/32449 ,  H01J37/32715 ,  H01J37/32174 ,  H01J37/32238 ,  H01J2237/327 ,  H01J2237/335

Abstract: A plasma processing method is implementable with a plasma processing apparatus. The plasma processing method includes applying a voltage to a lower electrode in a substrate support with a gas being supplied into a chamber in the plasma processing apparatus. The substrate support is located in the chamber. The plasma processing method further includes generating plasma by providing a radio-frequency wave after application of the voltage to the lower electrode is started. In the method, the applying of the voltage and the generating of the plasma are performed without an object on a substrate support surface of the substrate support.

公开(公告)号：US11961713B2

公开(公告)日：2024-04-16

申请号：US17055680

申请日：2019-05-22

Applicant: SAIREM SOCIETE POUR L'APPLICATION INDUSTRIELLE DE LA RECHERCHE EN ELECTRONIQUE ET MICRO ONDES

Inventor： Louis Latrasse ,  Thibault Gadeyne

IPC: H01P5/103 ,  H01J37/32 ,  H01P5/12

CPC classification number: H01J37/32229 ,  H01J37/32201 ,  H01J37/32311 ,  H01P5/103 ,  H01P5/12

Abstract: A microwave coupling/combining device for coupling and combining at least two microwave sources includes a waveguide provided with a sleeve extending longitudinally along a main axis and having two opposing ends having a first end provided with an element forming a short-circuit and a second open end. The device further includes at least one transverse bar extending inside the sleeve along a transverse axis orthogonal to the main axis; and at least two coaxial connectors provided for being connected respectively to microwave sources. Each coaxial connector is mounted externally on the sleeve and has a central conductive core connected to and extended by a conductive antenna extending in a direction orthogonal to the transverse axis and to the main axis inside the sleeve and ending by an end attached to a transverse bar.

公开(公告)号：US11862432B2

公开(公告)日：2024-01-02

申请号：US17251449

申请日：2018-07-02

Applicant: MITSUBISHI ELECTRIC CORPORATION

Inventor： Hiroshi Suenobu ,  Shingo Yamaura ,  Tai Tanaka ,  Michio Takikawa

IPC: H05B6/70 ,  H05B6/80 ,  H01J37/32

CPC classification number: H01J37/32201 ,  H01J37/32311 ,  H01J37/32926 ,  H05B6/70 ,  H05B6/806

Abstract: A radiation element for radiating a microwave into the heating chamber at least one hollow dielectric member in which a gas is sealed, the hollow dielectric member having electrodes and a control unit having a plasma control unit for controlling the state of the hollow dielectric member and a current adjustment unit for adjusting a current to be applied to the electrodes of the hollow dielectric member under the control of the plasma control unit, the current adjustment unit being connected to the electrodes; and wherein the plasma control unit controls the state of the hollow dielectric member to put into one of states of: a plasma state in which the microwave is reflected by the gas; a plasma state in which the microwave is absorbed by the gas; and a gas state in which the microwave is allowed to be transmitted through the gas.

公开(公告)号：US20230386804A1

公开(公告)日：2023-11-30

申请号：US18232834

申请日：2023-08-11

Applicant: Tokyo Electron Limited

Inventor： Toshimasa KOBAYASHI ,  Kazuki TAKAHASHI

IPC: H01J37/32 ,  B01D53/04

CPC classification number: H01J37/32844 ,  H01J37/3244 ,  B01D53/0407 ,  H01J37/32229 ,  H01J37/32871 ,  B01D2253/34 ,  H01J37/32311

Abstract: A plasma processing apparatus includes: a processing container in which a mounting stage mounted with a substrate is provided and a plasma process is performed on the substrate; an exhaust passage which is provided around the mounting stage and through which a gas containing a by-product released by the plasma process flows; and a first adsorption member which is arranged along an inner wall surface of the exhaust passage and of which a surface is roughened to adsorb the by-product.

公开(公告)号：US11721526B2

公开(公告)日：2023-08-08

申请号：US16881458

申请日：2020-05-22

Applicant: MKS Instruments, Inc.

Inventor： Francesco Braghiroli

IPC: H01J37/32 ,  H05H1/46 ,  H03L7/099

CPC classification number: H01J37/32311 ,  H01J37/32201 ,  H01J37/32293 ,  H01J37/32798 ,  H03L7/099 ,  H05H1/46 ,  H01J2237/24564 ,  H01J2237/24592

Abstract: A method of generating power with a power generation system. Solid state generators generate a plurality of outputs. The outputs of the solid state generator modules are combined from a plurality of channels, in a combiner, using a phase optimization technique to generate an in phase combined output power.

公开(公告)号：US11646178B2

公开(公告)日：2023-05-09

申请号：US17241755

申请日：2021-04-27

Applicant: Tokyo Electron Limited

Inventor： Yuji Onuma ,  Hideo Kato

IPC: H01J37/32

CPC classification number: H01J37/32311 ,  H01J37/3299 ,  H01J37/32201 ,  H01J37/32266 ,  H01J37/32926 ,  H01J37/32972 ,  H01J37/3222 ,  H01J37/32229 ,  H01J37/32275 ,  H01J37/32935

Abstract: A controller of a plasma processing apparatus stores a frequency spectrum related to a first timing into a storage unit, controls a microwave generator to generate a microwave in correspondence to a setting frequency, setting power, and a setting bandwidth at a second timing, controls a demodulator to measure travelling wave power and reflected wave power of the microwave for each frequency, calculates the frequency spectrum related to the second timing on the basis of a measurement result from the demodulator, calculates a correction value for correcting a waveform of the travelling wave power for each frequency such that a difference for each frequency between the frequency spectrum related to the second timing and the frequency spectrum related to the first timing, stored in the storage unit, is small, and controls the microwave generator on the basis of the calculated correction value for each frequency.

公开(公告)号：US20190244789A1

公开(公告)日：2019-08-08

申请号：US16341932

申请日：2017-10-04

Applicant: Tokyo Electron Limited

Inventor： Kazushi KANEKO ,  Yuki KAWADA

IPC: H01J37/32 ,  H01L21/67 ,  G01R23/16

CPC classification number: H01J37/32201 ,  G01R23/16 ,  H01J37/32266 ,  H01J37/32311 ,  H01J2237/327 ,  H01L21/67017 ,  H05H1/46

Abstract: In a microwave output device of an embodiment, a part of a travelling wave propagating from a microwave generation unit to an output are output from a directional coupler. A first measurement unit generates an analog signal corresponding to a power of the part of the travelling wave by using diode detection, and converts the analog signal into a digital value. One or more correction coefficients associated with a set frequency, a set power, a set bandwidth of a microwave designated for the microwave output device are selected. The selected one or more correction coefficients are multiplied by the digital value, and thus a measured value is determined.

公开(公告)号：US20190080886A1

公开(公告)日：2019-03-14

申请号：US16129299

申请日：2018-09-12

Applicant: Cellencor, Inc.

Inventor： Kenneth Kaplan

IPC: H01J37/32 ,  H03F3/19 ,  H03F3/21 ,  H01J37/244

CPC classification number: H01J37/32201 ,  H01J37/244 ,  H01J37/32311 ,  H03F3/19 ,  H03F3/21 ,  H05B6/686 ,  H05B6/705

Abstract: A microwave generating system includes a modular architecture which is configurable to provide power output from under 1-kilowatt to over 100-kilowatts. The various power levels are achieved by combining the RF outputs of multiple RF power amplifiers in a corporate structure. The system can be used on any ISM band. Each system component incorporates a dedicated embedded microcontroller for high performance real-time control response. The components are connected to a high speed digital data bus, and are commanded and supervised by a control program running on a host computer.