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公开(公告)号：US20230384251A1
公开(公告)日：2023-11-30
申请号：US18448044
申请日：2023-08-10
Applicant: Mesoline Inc.
Inventor： Marnix P. Rebergen , Michael D. Kelzenberg , Thomas C.R. Russell , Serhii Mytnyk
CPC classification number: G01N27/128 , G01N27/127 , G01N33/0027 , B22F7/08 , B22F3/004 , B41M3/006 , B41M7/0081 , B22F3/105 , B22F2304/05
Abstract: Systems of electrical devices with high-resolution components and methods of fabricating the electrical devices using micro-molding processes are described. Small foot print electrical devices can be achieved by fabricating components with highly conductive materials, and with closely spaced components.
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公开(公告)号：US20240174515A1
公开(公告)日：2024-05-30
申请号：US18318607
申请日：2023-05-16
Applicant: Mesoline Inc.
Inventor： Marnix P. Rebergen , Thomas C.R. Russell , Serhii Mytnyk
CPC classification number: B81C1/00285 , B81B7/0038 , B81B2203/0315 , B81C2201/013 , B81C2203/0145
Abstract: Systems of getters for microelectronic devices and methods for micro-molding the getters are described. The getters comprising non-evaporable getter particles can be formed with a variety of nanoparticles and absorb various gas species to keep the microelectronic devices in desired working conditions. The micro-molded getters can be incorporated into various microelectronic devices.
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公开(公告)号：US20240157446A1
公开(公告)日：2024-05-16
申请号：US18505960
申请日：2023-11-09
Applicant: Mesoline Inc.
Inventor： Marnix P. Rebergen , Serhii Mytnyk , Saleh Aghajani
CPC classification number: B22F10/66 , B22F10/28 , B33Y10/00 , B33Y40/20 , B22F2304/054 , B22F2304/056 , B22F2304/058 , B22F2304/10
Abstract: Systems and methods for selective modification of nanoparticle structures are described. The selective modification processes include applying a localized heat source to the deposited nanoparticle structures and removing the areas that are not activated by the localized heat.
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