公开(公告)号：US20210181643A1

公开(公告)日：2021-06-17

申请号：US17160094

申请日：2021-01-27

Applicant: NIKON CORPORATION

Inventor： Zhiqiang Liu ,  Eric Goodwin ,  Goldie Goldstein

IPC: G03F7/20 ,  G01B11/00 ,  G01D5/38

Abstract: A position encoder for monitoring relative movement between a first object and a second object includes a grating that is coupled to the first object, and an image sensor assembly that is coupled to the second object. The image sensor includes a first image sensor; a second image sensor that is spaced apart from the first image sensor; an optical element that includes a first optical surface and a second optical surface that is spaced apart from the first optical surface; and an illumination system. The illumination system directs an illumination beam at the optical element to create (i) a first reference beam that is reflected by the first optical surface and directed at the first image sensor, (ii) a second reference beam that is reflected by the second optical surface and directed at the second image sensor, and (iii) a transmitted beam that is transmitted through the optical element and is directed at and impinges on the grating to create a first measurement beam that is diffracted by the grating and directed at the first image sensor, and a second measurement beam that is diffracted by the grating and directed at the second image sensor.

公开(公告)号：US10921718B2

公开(公告)日：2021-02-16

申请号：US16220624

申请日：2018-12-14

Applicant: NIKON CORPORATION

Inventor： Zhiqiang Liu ,  Eric Goodwin ,  Goldie Goldstein

IPC: G01B11/02 ,  G03F7/20 ,  G01B11/00 ,  G01D5/38

Abstract: A position encoder for monitoring relative movement between a first object and a second object includes a grating that is coupled to the first object, and an image sensor assembly that is coupled to the second object. The image sensor includes a first image sensor; a second image sensor that is spaced apart from the first image sensor; an optical element that includes a first optical surface and a second optical surface that is spaced apart from the first optical surface; and an illumination system. The illumination system directs an illumination beam at the optical element to create (i) a first reference beam that is reflected by the first optical surface and directed at the first image sensor, (ii) a second reference beam that is reflected by the second optical surface and directed at the second image sensor, and (iii) a transmitted beam that is transmitted through the optical element and is directed at and impinges on the grating to create a first measurement beam that is diffracted by the grating and directed at the first image sensor, and a second measurement beam that is diffracted by the grating and directed at the second image sensor.

公开(公告)号：US20150276385A1

公开(公告)日：2015-10-01

申请号：US14736118

申请日：2015-06-10

Applicant: NIKON CORPORATION

Inventor： Eric Peter Goodwin ,  Zhiqiang Liu

IPC: G01B11/14 ,  G01D5/34

CPC classification number: G01B11/14 ,  G01D5/34 ,  G03F7/70775

Abstract: Methodology of measuring a position of a wafer with an encoder directing measurement beam(s) of light towards a wafer area that is being contemporaneously patterned in an exposure apparatus. The Abbe error of such measurement is minimized or even negated by combining the data from first and second measurement signals, one of which is defined as complementary, Abbe-error correcting measurement signal for which the induced Abbe error is either opposite to or at least different from the Abbe error corresponding to another, main measurement signal. The combination of the main and Abbe-error correcting signals is performed with a heterodyne interferometer employing a two-dimensional diffraction grating diffracting each of the measurement beams twice.

Abstract translation: 用编码器测量晶片的位置的方法，所述编码器将测量光束朝向在曝光装置中同时构图的晶片区域。 通过组合来自第一和第二测量信号的数据，这种测量的阿贝误差被最小化或甚至否定，其中一个被定义为互补的阿贝误差校正测量信号，其诱发的阿贝误差与之相反或至少不同 从阿贝错误对应另一个，主要测量信号。 通过使用将每个测量光束衍射两次的二维衍射光栅的外差干涉仪来执行主和误差校正信号的组合。

公开(公告)号：US11467506B2

公开(公告)日：2022-10-11

申请号：US17160094

申请日：2021-01-27

Applicant: NIKON CORPORATION

Inventor： Zhiqiang Liu ,  Eric Goodwin ,  Goldie Goldstein

IPC: G01B11/02 ,  G03F7/20 ,  G01B11/00 ,  G01D5/38

Abstract: A position encoder for monitoring relative movement between a first object and a second object includes a grating that is coupled to the first object, and an image sensor assembly that is coupled to the second object. The image sensor includes a first image sensor; a second image sensor that is spaced apart from the first image sensor; an optical element that includes a first optical surface and a second optical surface that is spaced apart from the first optical surface; and an illumination system. The illumination system directs an illumination beam at the optical element to create (i) a first reference beam that is reflected by the first optical surface and directed at the first image sensor, (ii) a second reference beam that is reflected by the second optical surface and directed at the second image sensor, and (iii) a transmitted beam that is transmitted through the optical element and is directed at and impinges on the grating to create a first measurement beam that is diffracted by the grating and directed at the first image sensor, and a second measurement beam that is diffracted by the grating and directed at the second image sensor.

公开(公告)号：US09605948B2

公开(公告)日：2017-03-28

申请号：US14736118

申请日：2015-06-10

Applicant: NIKON CORPORATION

Inventor： Eric Peter Goodwin ,  Zhiqiang Liu

IPC: G03B27/68 ,  G01B11/14 ,  G01D5/34 ,  G03F7/20

CPC classification number: G01B11/14 ,  G01D5/34 ,  G03F7/70775

Abstract: Methodology of measuring a position of a wafer with an encoder directing measurement beam(s) of light towards a wafer area that is being contemporaneously patterned in an exposure apparatus. The Abbe error of such measurement is minimized or even negated by combining the data from first and second measurement signals, one of which is defined as complementary, Abbe-error correcting measurement signal for which the induced Abbe error is either opposite to or at least different from the Abbe error corresponding to another, main measurement signal. The combination of the main and Abbe-error correcting signals is performed with a heterodyne interferometer employing a two-dimensional diffraction grating diffracting each of the measurement beams twice.

公开(公告)号：US20190187572A1

公开(公告)日：2019-06-20

申请号：US16220624

申请日：2018-12-14

Applicant: NIKON CORPORATION

Inventor： Zhiqiang Liu ,  Eric Goodwin ,  Goldie Goldstein

IPC: G03F7/20 ,  G01B11/00

CPC classification number: G03F7/70775 ,  G01B11/002 ,  G03F7/70516

Abstract: A position encoder for monitoring relative movement between a first object and a second object includes a grating that is coupled to the first object, and an image sensor assembly that is coupled to the second object. The image sensor includes a first image sensor; a second image sensor that is spaced apart from the first image sensor; an optical element that includes a first optical surface and a second optical surface that is spaced apart from the first optical surface; and an illumination system. The illumination system directs an illumination beam at the optical element to create (i) a first reference beam that is reflected by the first optical surface and directed at the first image sensor, (ii) a second reference beam that is reflected by the second optical surface and directed at the second image sensor, and (iii) a transmitted beam that is transmitted through the optical element and is directed at and impinges on the grating to create a first measurement beam that is diffracted by the grating and directed at the first image sensor, and a second measurement beam that is diffracted by the grating and directed at the second image sensor.