公开(公告)号：US20200258733A1

公开(公告)日：2020-08-13

申请号：US16856940

申请日：2020-04-23

Applicant: NOVA MEASURING INSTRUMENTS INC.

Inventor： David A. REED ,  Bruno W. SCHUELER ,  Bruce H. NEWCOME ,  Rodney SMEDT ,  Chris BEVIS

IPC: H01J49/14 ,  H01L21/66 ,  H01J49/12 ,  G01N23/22 ,  G01Q10/04 ,  H01J49/26

Abstract: Systems and approaches for semiconductor metrology and surface analysis using Secondary Ion Mass Spectrometry (SIMS) are disclosed. In an example, a secondary ion mass spectrometry (SIMS) system includes a sample stage. A primary ion beam is directed to the sample stage. An extraction lens is directed at the sample stage. The extraction lens is configured to provide a low extraction field for secondary ions emitted from a sample on the sample stage. A magnetic sector spectrograph is coupled to the extraction lens along an optical path of the SIMS system. The magnetic sector spectrograph includes an electrostatic analyzer (ESA) coupled to a magnetic sector analyzer (MSA).

公开(公告)号：US20240087869A1

公开(公告)日：2024-03-14

申请号：US18469517

申请日：2023-09-18

Applicant: NOVA MEASURING INSTRUMENTS INC.

Inventor： David A. REED ,  Bruno W. SCHUELER ,  Bruce H. NEWCOME ,  Rodney SMEDT ,  Chris BEVIS

IPC: H01J49/14 ,  G01N23/22 ,  G01N23/2258 ,  G01Q10/04 ,  H01J49/12 ,  H01J49/26 ,  H01L21/66

CPC classification number: H01J49/142 ,  G01N23/22 ,  G01N23/2258 ,  G01Q10/04 ,  H01J49/126 ,  H01J49/26 ,  H01L22/12

Abstract: Systems and approaches for semiconductor metrology and surface analysis using Secondary Ion Mass Spectrometry (SIMS) are disclosed. In an example, a secondary ion mass spectrometry (SIMS) system includes a sample stage. A primary ion beam is directed to the sample stage. An extraction lens is directed at the sample stage. The extraction lens is configured to provide a low extraction field for secondary ions emitted from a sample on the sample stage. A magnetic sector spectrograph is coupled to the extraction lens along an optical path of the SIMS system. The magnetic sector spectrograph includes an electrostatic analyzer (ESA) coupled to a magnetic sector analyzer (MSA).

公开(公告)号：US20240345006A1

公开(公告)日：2024-10-17

申请号：US18412817

申请日：2024-01-15

Applicant: NOVA MEASURING INSTRUMENTS INC.

Inventor： Heath POIS ,  David A. REED ,  Bruno W. SCHUELER ,  Rodney SMEDT ,  Jeffrey FANTON

IPC: G01N23/201 ,  G01N23/207 ,  H01L21/66

CPC classification number: G01N23/201 ,  G01N23/207 ,  G01N2223/054 ,  H01L22/12

Abstract: A system and method for measuring a sample by X-ray reflectance scatterometry. The method may include impinging an incident X-ray beam on a sample having a periodic structure to generate a scattered X-ray beam, the incident X-ray beam simultaneously providing a plurality of incident angles and a plurality of azimuthal angles; and collecting at least a portion of the scattered X-ray beam.

公开(公告)号：US20190385831A1

公开(公告)日：2019-12-19

申请号：US16557197

申请日：2019-08-30

Applicant: NOVA MEASURING INSTRUMENTS INC.

Inventor： David A. REED ,  Bruno W. SCHUELER ,  Bruce H. NEWCOME ,  Rodney SMEDT ,  Chris BEVIS

IPC: H01J49/14 ,  H01L21/66 ,  G01N23/22 ,  G01Q10/04 ,  H01J49/26

Abstract: Systems and approaches for semiconductor metrology and surface analysis using Secondary Ion Mass Spectrometry (SIMS) are disclosed. In an example, a secondary ion mass spectrometry (SIMS) system includes a sample stage. A primary ion beam is directed to the sample stage. An extraction lens is directed at the sample stage. The extraction lens is configured to provide a low extraction field for secondary ions emitted from a sample on the sample stage. A magnetic sector spectrograph is coupled to the extraction lens along an optical path of the SIMS system. The magnetic sector spectrograph includes an electrostatic analyzer (ESA) coupled to a magnetic sector analyzer (MSA).

公开(公告)号：US20230091625A1

公开(公告)日：2023-03-23

申请号：US17821785

申请日：2022-08-23

Applicant: NOVA MEASURING INSTRUMENTS INC.

Inventor： David A. REED ,  Bruno W. SCHUELER ,  Bruce H. NEWCOME ,  Rodney SMEDT ,  Chris BEVIS

IPC: H01J49/14 ,  H01L21/66 ,  H01J49/12 ,  G01N23/2258 ,  G01N23/22 ,  G01Q10/04 ,  H01J49/26

Abstract: Systems and approaches for semiconductor metrology and surface analysis using Secondary Ion Mass Spectrometry (SIMS) are disclosed. In an example, a secondary ion mass spectrometry (SIMS) system includes a sample stage. A primary ion beam is directed to the sample stage. An extraction lens is directed at the sample stage. The extraction lens is configured to provide a low extraction field for secondary ions emitted from a sample on the sample stage. A magnetic sector spectrograph is coupled to the extraction lens along an optical path of the SIMS system. The magnetic sector spectrograph includes an electrostatic analyzer (ESA) coupled to a magnetic sector analyzer (MSA).

公开(公告)号：US20210305037A1

公开(公告)日：2021-09-30

申请号：US17164499

申请日：2021-02-01

Applicant: NOVA MEASURING INSTRUMENTS INC.

Inventor： David A. REED ,  Bruno W. SCHUELER ,  Bruce H. NEWCOME ,  Rodney SMEDT ,  Chris BEVIS

IPC: H01J49/14 ,  H01L21/66 ,  H01J49/12 ,  G01N23/22 ,  G01Q10/04 ,  H01J49/26

Abstract: Systems and approaches for semiconductor metrology and surface analysis using Secondary Ion Mass Spectrometry (SIMS) are disclosed. In an example, a secondary ion mass spectrometry (SIMS) system includes a sample stage. A primary ion beam is directed to the sample stage. An extraction lens is directed at the sample stage. The extraction lens is configured to provide a low extraction field for secondary ions emitted from a sample on the sample stage. A magnetic sector spectrograph is coupled to the extraction lens along an optical path of the SIMS system. The magnetic sector spectrograph includes an electrostatic analyzer (ESA) coupled to a magnetic sector analyzer (MSA).