公开(公告)号：US20170178946A1

公开(公告)日：2017-06-22

申请号：US15124036

申请日：2015-04-05

Applicant: ORBOTECH LTD.

Inventor： Michael Zenou ,  Zvi Kotler ,  Jonathan Ankri ,  Abraham Rotnemer ,  Oleg Ermak

IPC: H01L21/70 ,  H05K3/12

CPC classification number: H01L21/705 ,  H01L21/4867 ,  H01L23/15 ,  H05K1/097 ,  H05K3/02 ,  H05K3/105 ,  H05K2203/107 ,  H05K2203/1492

Abstract: A method for manufacturing includes coating a substrate (22) with a matrix (28) containing a material to be patterned on the substrate. A pattern is fixed in the matrix by directing a pulsed energy beam to impinge on a locus of the pattern so as to cause adhesion of the material to the substrate along the pattern without fully sintering the material in the pattern. The matrix remaining on the substrate outside the fixed pattern is removed, and after removing the matrix, the material in the pattern is sintered.

公开(公告)号：US20220024223A1

公开(公告)日：2022-01-27

申请号：US17427372

申请日：2020-05-04

Applicant: Orbotech Ltd.

Inventor： Marc Altman ,  Zvi Kotler ,  Itay Peled ,  Oleg Ermak ,  Sharona Cohen

IPC: B41J2/455 ,  H05K3/12 ,  H05K3/02 ,  B41J2/47

Abstract: Printing apparatus includes a donor supply assembly, which positions a transparent donor substrate having opposing first and second surfaces and a donor film formed on the second surface so that the donor film is in proximity to a target area on an acceptor substrate. An optical assembly directs one or more beams of laser radiation to pass through the first surface of the donor substrate and impinge on the donor film so as to induce ejection of material from the donor film onto the acceptor substrate. Means are provided to mitigate or compensate for the variation in reflection of the laser radiation across an area of the donor substrate, so as to equalize a flux of the laser radiation that is absorbed in the donor film across the area of the donor substrate.

公开(公告)号：US12162294B2

公开(公告)日：2024-12-10

申请号：US17427372

申请日：2020-05-04

Applicant: Orbotech Ltd.

Inventor： Marc Altman ,  Zvi Kotler ,  Itay Peled ,  Oleg Ermak ,  Sharona Cohen

IPC: B41J2/455 ,  B41J2/435 ,  B41J2/44 ,  B41J2/47 ,  B41J33/14 ,  H05K3/12

Abstract: Printing apparatus includes a donor supply assembly, which positions a transparent donor substrate having opposing first and second surfaces and a donor film formed on the second surface so that the donor film is in proximity to a target area on an acceptor substrate. An optical assembly directs one or more beams of laser radiation to pass through the first surface of the donor substrate and impinge on the donor film so as to induce ejection of material from the donor film onto the acceptor substrate. Means are provided to mitigate or compensate for the variation in reflection of the laser radiation across an area of the donor substrate, so as to equalize a flux of the laser radiation that is absorbed in the donor film across the area of the donor substrate.