公开(公告)号：US20210249259A1

公开(公告)日：2021-08-12

申请号：US17241522

申请日：2021-04-27

Applicant: ORGANO CORPORATION

Inventor： Daisaku YANO ,  Yukinari YAMASHITA ,  Masami MURAYAMA ,  Koji YAMANAKA

IPC: H01L21/02 ,  H01L21/67 ,  C23G5/00 ,  C23G1/24 ,  C02F9/00

Abstract: Provided are a substrate treatment method and a substrate treatment equipment enabling greater suppression of corrosion or oxidation of metal wiring exposed on a substrate surface. The present invention relates to a substrate treatment equipment having a treatment chamber wherein a substrate is disposed, and whereto a substrate treatment solution for treating the substrate is supplied. This equipment is provided with an inert gas filling mechanism for filling with an inert gas the interior of the treatment chamber wherein the substrate is disposed, and, near or inside the treatment chamber, a catalytic unit filled with a platinum-group metal catalyst wherethrough a hydrogen-dissolved water including hydrogen added to ultra-pure water is passed. Obtained by passing the hydrogen-dissolved water through the platinum-group metal catalyst, a hydrogen-dissolved treatment solution is supplied as the substrate treatment solution into the treatment chamber by the equipment.

公开(公告)号：US20200284742A1

公开(公告)日：2020-09-10

申请号：US16648869

申请日：2018-08-02

Applicant: ORGANO CORPORATION

Inventor： Chika KEMMOCHI ,  Koji YAMANAKA

IPC: G01N27/10 ,  C02F1/469 ,  G01N33/18

Abstract: Time until a conductivity meter is ready to measure a conductivity after an electric decationizing apparatus starts is shortened.Water to be treated that contains cations and anions is supplied to the electric decationizing apparatus while applying a first voltage to the electric decationizing apparatus, and decationized water is generated. Next, the decationized water that is generated by the electric decationizing apparatus is supplied to the conductivity meter in order to measure conductivity of the decationized water. Before the first voltage is applied to the electric decationizing apparatus and before the conductivity meter begins measuring the conductivity of the decationized water, a second voltage that is lower than the first voltage is applied to the electric decationizing apparatus in a state in which the electric decationizing apparatus is charged with water to be treated.

公开(公告)号：US20190381539A1

公开(公告)日：2019-12-19

申请号：US16556633

申请日：2019-08-30

Applicant: ORGANO CORPORATION

Inventor： Daisaku YANO ,  Masami MURAYAMA ,  Yukinari YAMASHITA ,  Koji YAMANAKA

IPC: B08B3/08 ,  C02F1/32 ,  H01L21/02 ,  C11D7/02 ,  H01L21/67

Abstract: The water outlet of a subsystem that includes an ultraviolet oxidation device and the water inlet of each substrate treatment device are connected to each other via a main pipe. A hydrogen peroxide removal device is installed between the ultraviolet oxidation device of the subsystem and a non-regenerative ion-exchange device. In addition, a carbon dioxide supply device is installed at the middle of a pipe that branches from the water outlet of the subsystem to reach the substrate treatment device. According to an aspect, the hydrogen peroxide removal device is filled with a platinum-group metal catalyst. Thus, ultrapure water passed through the ultraviolet oxidation device is used as a base to produce carbonated water in which the concentration of hydrogen peroxide dissolved therein is limited to 2 μg/L or less and to which carbon dioxide is added to adjust resistivity to be within the range of 0.03 to 5.0 MΩ·cm.

公开(公告)号：US20190300464A1

公开(公告)日：2019-10-03

申请号：US16066202

申请日：2016-10-28

Applicant: ORGANO CORPORATION

Inventor： Hitoshi TAKADA ,  Akira NAKAMURA ,  Masami IMAMURA ,  Koji YAMANAKA

IPC: C07C29/76 ,  B01J39/20 ,  B01J39/04

Abstract: A method for purifying an organic solvent, comprising contacting an organic solvent containing polyvalent metal ions with a monolithic organic porous ion exchanger.According to the present invention, a method for purifying an organic solvent can be provided, wherein a high rate of removing polyvalent metal ions in an organic solvent is achieved.

公开(公告)号：US20170259234A1

公开(公告)日：2017-09-14

申请号：US15509047

申请日：2015-08-04

Applicant: ORGANO CORPORATION

Inventor： Yoshifumi HAYASHI ,  Yukinari YAMASHITA ,  Koji YAMANAKA ,  Daisaku YANO

IPC: B01F15/04 ,  H01L21/02 ,  B01F5/04 ,  C11D7/04 ,  B01F15/00 ,  B01F3/08

CPC classification number: B01F15/0408 ,  B01F3/0865 ,  B01F3/088 ,  B01F5/0403 ,  B01F15/00149 ,  B01F15/0022 ,  B01F15/00227 ,  B01F15/00285 ,  B01F15/00344 ,  B01F15/00357 ,  B01F15/0238 ,  B01F15/0416 ,  B01F2003/0896 ,  B01F2005/0028 ,  B01F2215/004 ,  B01F2215/0096 ,  B01F2215/0431 ,  C11D7/04 ,  G05D11/131 ,  H01L21/02052

Abstract: A diluted solution production method of the present invention is a diluted solution production method of producing a diluted solution of a second liquid by adding the second liquid to a first liquid, the method including feeding the first liquid to a first pipe; and controlling pressure in a tank that stores the second liquid to add, through the second pipe that connects the tank to the first pipe, the second liquid to the first liquid in the first pipe. Adding the second liquid includes measuring a flow rate of the first liquid or the diluted solution that flows through the first pipe; measuring a component concentration of the diluted solution; and controlling the pressure in the tank, based on the measured values of the flow rate and the component concentration, so as to adjust the component concentration of the diluted solution to a specified value.

公开(公告)号：US20160233082A1

公开(公告)日：2016-08-11

申请号：US15023161

申请日：2014-09-17

Applicant: ORGANO CORPORATION

Inventor： Daisaku YANO ,  Yukinari YAMASHITA ,  Masami MURAYAMA ,  Koji YAMANAKA

IPC: H01L21/02 ,  B08B3/08 ,  C02F9/00 ,  C02F1/68 ,  C23F1/16 ,  C02F1/20 ,  C02F1/70 ,  B01J19/24 ,  C11D7/08 ,  H01L21/67 ,  C02F1/44

CPC classification number: H01L21/02068 ,  C02F1/20 ,  C02F9/00 ,  C23G1/24 ,  C23G5/00 ,  H01L21/02071 ,  H01L21/67017 ,  H01L21/67051 ,  H01L21/6708 ,  H01L21/67086

Abstract: Provided are a substrate treatment method and a substrate treatment equipment enabling greater suppression of corrosion or oxidation of metal wiring exposed on a substrate surface. The present invention relates to a substrate treatment equipment having a treatment chamber wherein a substrate is disposed, and whereto a substrate treatment solution for treating the substrate is supplied. This equipment is provided with an inert gas filling mechanism for filling with an inert gas the interior of the treatment chamber wherein the substrate is disposed, and, near or inside the treatment chamber, a catalytic unit filled with a platinum-group metal catalyst wherethrough a hydrogen-dissolved water including hydrogen added to ultra-pure water is passed. Obtained by passing the hydrogen-dissolved water through the platinum-group metal catalyst, a hydrogen-dissolved treatment solution is supplied as the substrate treatment solution into the treatment chamber by the equipment.

Abstract translation: 提供了能够更好地抑制暴露在基板表面上的金属配线的腐蚀或氧化的基板处理方法和基板处理设备。 本发明涉及具有处理室的基板处理设备，其中设置有基板，并且提供用于处理基板的基板处理溶液。 该设备设置有惰性气体填充机构，用于在其中设置基板的处理室的内部填充惰性气体，并且在处理室的附近或内部，填充有铂族金属催化剂的催化单元，其中通过 包含加入超纯水中的氢的氢溶解水通过。 通过使氢溶解的水通过铂族金属催化剂而获得，通过设备将作为基板处理溶液的氢溶解处理液供给到处理室。

公开(公告)号：US20160059273A1

公开(公告)日：2016-03-03

申请号：US14783253

申请日：2014-04-17

Applicant: ORGANO CORPORATION

Inventor： Daisaku YANO ,  Masami MURAYAMA ,  Yukinari YAMASHITA ,  Koji YAMANAKA

IPC: B08B3/08 ,  H01L21/67 ,  H01L21/02 ,  C11D7/02 ,  C02F1/32

CPC classification number: B08B3/08 ,  C02F1/20 ,  C02F1/32 ,  C02F1/42 ,  C02F1/44 ,  C02F1/68 ,  C02F9/00 ,  C02F2103/04 ,  C11D7/02 ,  C23G1/103 ,  C23G1/20 ,  H01L21/02068 ,  H01L21/6704

Abstract: The water outlet of a subsystem that includes an ultraviolet oxidation device and the water inlet of each substrate treatment device are connected to each other via a main pipe. A hydrogen peroxide removal device is installed between the ultraviolet oxidation device of the subsystem and a non-regenerative ion-exchange device. In addition, a carbon dioxide supply device is installed at the middle of a pipe that branches from the water outlet of the subsystem to reach the substrate treatment device. According to an aspect, the hydrogen peroxide removal device is filled with a platinum-group metal catalyst. Thus, ultrapure water passed through the ultraviolet oxidation device is used as a base to produce carbonated water in which the concentration of hydrogen peroxide dissolved therein is limited to 2 μg/L or less and to which carbon dioxide is added to adjust resistivity to be within the range of 0.03 to 5.0 MΩ·cm.

Abstract translation: 包括紫外线氧化装置和每个基板处理装置的进水口的子系统的出水口通过主管相互连接。 在子系统的紫外氧化装置和非再生离子交换装置之间安装过氧化氢去除装置。 此外，二氧化碳供应装置安装在从子系统的出水口分支到达基板处理装置的管的中间。 根据一方面，用铂族金属催化剂填充过氧化氢去除装置。 因此，使用通过紫外线氧化装置的超纯水作为碱，生成其中溶解有过氧化氢的浓度限制在2μg/ L以下的碳酸水，并且添加二氧化碳以将电阻率调节在 范围为0.03至5.0 M＆OHgr;·cm。

公开(公告)号：US20190388857A1

公开(公告)日：2019-12-26

申请号：US16528993

申请日：2019-08-01

Applicant: ORGANO CORPORATION

Inventor： YOSHIFUMI HAYASHI ,  Yukinari YAMASHITA ,  Koji YAMANAKA ,  Daisaku YANO

IPC: B01F15/04 ,  G05D11/13 ,  B01F3/08 ,  B01F15/02 ,  B01F15/00 ,  C11D7/04 ,  H01L21/02 ,  B01F5/04

Abstract: A diluted solution production method of the present invention is a diluted solution production method of producing a diluted solution of a second liquid by adding the second liquid a first liquid, the method including feeding the first liquid to a first pipe; and controlling pressure in a tank that stores the second liquid to add, through the second pipe that connects the tank to the first pipe, the second liquid to the first liquid in the first pipe. Adding the second liquid includes measuring a flow rate of the first liquid or the diluted solution that flows through the first pipe; measuring a component concentration of the diluted solution; and controlling the pressure in the tank, based on the measured values of the flow rate and the component concentration, so as to adjust the component concentration of the diluted solution to a specified value.

公开(公告)号：US20160361693A1

公开(公告)日：2016-12-15

申请号：US15118992

申请日：2015-01-06

Applicant: ORGANO CORPORATION

Inventor： Yoshifumi HAYASHI ,  Yukinari YAMASHITA ,  Koji YAMANAKA

IPC: B01F3/04 ,  C01B13/11 ,  B01F5/10 ,  C02F1/78 ,  B01F15/00 ,  B01F3/20

CPC classification number: B01F3/04985 ,  B01F3/04439 ,  B01F3/2057 ,  B01F5/106 ,  B01F15/0022 ,  B01F15/00344 ,  B01F15/0408 ,  B01F2003/04886 ,  C01B13/11 ,  C01B2201/64 ,  C01B2201/90 ,  C02F1/78 ,  C02F2103/04 ,  C02F2201/782 ,  C02F2209/23

Abstract: An ozonated water supply method includes: feeding dissolving water contained in a circulation tank to an ozonation device at a given feed rate while feeding ultrapure water to the circulation tank, and returning ozonated water that has not been used at a use point to the circulation tank, dissolving ozone in the dissolving water using the ozonation device to obtain ozonated water, and feeding the ozonated water to the use point; feeding oxygen gas having a nitrogen gas content of 0.01 vol % or less to a discharge-type ozone gas-producer, and feeding the resulting ozone-containing gas to the ozonation device; adjusting the feed rate of the ultrapure water to the circulation tank; and adjusting the dissolved ozone concentration in the ozonated water. The method can reduce or suppress the accumulation of nitric acid in the recirculation system when a discharge-type ozone gas-producer is used as the ozone gas-producer.

Abstract translation: 臭氧水供给方法包括：以给定的进料速率将包含在循环罐中的溶解水加入到臭氧装置中，同时向循环罐供给超纯水，并将循环罐中未使用的臭氧水返回到循环罐 使用臭氧化装置将臭氧溶解在溶解水中，得到臭氧化水，将臭氧水供给到使用点; 向放电型臭氧气体生产器供给氮气含量为0.01体积％以下的氧气，并将得到的含臭氧气体供给到臭氧化装置中; 调节超纯水进入循环罐的进料速度; 并调节臭氧水中溶解的臭氧浓度。 当使用排放型臭氧气体生产者作为臭氧气体生产者时，该方法可以减少或抑制再循环系统中硝酸的积聚。