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    ADVANCED LIGHT EXTRACTION STRUCTURE
    1.
    发明申请
    ADVANCED LIGHT EXTRACTION STRUCTURE 审中-公开

    公开(公告)号：US20190006630A1

    公开(公告)日：2019-01-03

    申请号：US16019300

    申请日：2018-06-26

    Applicant: PIXELLIGENT TECHNOLOGIES, LLC

    Inventor： Zhiyun CHEN ,  Gregory D. COOPER

    IPC: H01L51/52 ,  H01L27/32

    CPC classification number: H01L51/5275 ,  G02B3/0056 ,  G02B3/0087 ,  H01L27/3211 ,  H01L27/3244 ,  H01L51/5253

    Abstract: Light-emitting devices and methods of making the same are described whereby lenses of any array include a material with a higher refractive index than an encapsulation layer of a substrate layer, the refractive index of the material being in a range of greater than 1.7 to 1.9 at 400 nm. The material forming the lenses includes nanocomposite comprised of inorganic nanocrystals and a polymeric matrix, wherein the nanocrystals are selected from the group consisting of ZrO2, ZnO, MgO, HfO2, NbO5, Ta2O5 and Y2O3. A 3-4 micron thick sample of the nanocomposite has an optical transmittance of at least 80% over a range of 440 nm to 800 nm.

    RESISTS FOR LITHOGRAPHY
    4.
    发明申请
    RESISTS FOR LITHOGRAPHY 审中-公开
    电影的电阻

    公开(公告)号：US20150185616A1

    公开(公告)日：2015-07-02

    申请号：US14591336

    申请日：2015-01-07

    Applicant: Pixelligent Technologies, LLC

    Inventor： Gregory D. COOPER ,  Zhiyun CHEN ,  Z. Serpil GONEN WILLIAMS ,  Larry F. THOMPSON

    IPC: G03F7/20

    CPC classification number: G03F7/20 ,  G03F7/0043 ,  G03F7/0047 ,  G03F7/2002 ,  G03F7/2022 ,  G03F7/2041 ,  G03F7/2053 ,  Y10T428/24479 ,  Y10T428/31504

    Abstract: New routes involving multi-step reversible photo-chemical reactions using two-step techniques to provide non-linear resist for lithography are described in this disclosure. They may provide exposure quadratically dependant on the intensity of the light. Several specific examples, including but not limited to using nanocrystals, are also described. Combined with double patterning, these approaches may create sub-diffraction limit feature density.

    Abstract translation: 本公开描述了涉及使用两步技术提供用于光刻的非线性抗蚀剂的多步可逆光化学反应的新途径。 它们可以根据光的强度二次提供曝光。 还描述了几个具体实例，包括但不限于使用纳米晶体。 结合双重图案化，这些方法可能产生亚衍射极限特征密度。

    ADVANCED LIGHT EXTRACTION STRUCTURE
    9.
    发明申请
    ADVANCED LIGHT EXTRACTION STRUCTURE 审中-公开

    公开(公告)号：US20200083485A1

    公开(公告)日：2020-03-12

    申请号：US16685862

    申请日：2019-11-15

    Applicant: PIXELLIGENT TECHNOLOGIES, LLC

    Inventor： Zhiyun CHEN ,  Gregory D. COOPER

    IPC: H01L51/52 ,  G02B3/00 ,  H01L27/32

    Abstract: Light-emitting devices and methods of making the same are described whereby lenses of any array include a material with a higher refractive index than an encapsulation layer of a substrate layer, the refractive index of the material being in a range of greater than 1.7 to 1.9 at 400 nm. The material forming the lenses includes nanocomposite comprised of inorganic nanocrystals and a polymeric matrix, wherein the nanocrystals are selected from the group consisting of ZrO2, ZnO, MgO, HfO2, NbO5, Ta2O5 and Y2O3. A 3-4 micron thick sample of the nanocomposite has an optical transmittance of at least 80% over a range of 440 nm to 800 nm.

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