公开(公告)号：US20240078663A1

公开(公告)日：2024-03-07

申请号：US18462386

申请日：2023-09-06

Applicant: PSK INC.

Inventor： KWANG SUNG YOO ,  GEON JONG KIM

IPC: G06T7/00 ,  G06T7/11 ,  G06T7/174 ,  H01J37/32

CPC classification number: G06T7/001 ,  G06T7/11 ,  G06T7/174 ,  H01J37/32348 ,  H01J37/3288 ,  H01J37/32899 ,  H01J2237/221 ,  H01J2237/24592 ,  H01J2237/3341

Abstract: The inventive concept provides a substrate treating method. The substrate treating method includes treating an edge region of a substrate using a plasma; and acquiring an image to be determined by imaging a substrate on which a treatment has been completed in the treating the edge region, comparing the image to be determined with an image stored in a database, and determining whether a substrate treated in the treating the edge region is defective or not, and wherein the image stored in the database is a defective image of a substrate which has been determined as defective, which is previously stored in the database in the acquiring the image to be determined.