Blade for Substrate Edge Protection During Photolithography
    1.
    发明申请
    Blade for Substrate Edge Protection During Photolithography 审中-公开
    用于光刻底片边缘保护的刀片

    公开(公告)号:US20150234281A1

    公开(公告)日:2015-08-20

    申请号:US14433194

    申请日:2013-10-02

    Abstract: An apparatus protects a portion of a peripheral region (310) of a photoresist-coated surface of a substrate (308) from light exposure. The apparatus includes a blade (502, 512, 522, 532) that can move, or that can move and rotate, and a drive assembly (504, 514, 524, 534) operably coupled to the blade. In response to at least one first drive force generated by the drive assembly, the blade translates, rotates, or translates and rotates, such that the blade is disposed above a portion of the peripheral region. In response to at least one second drive force generated by the drive assembly, the blade translates, rotates, or rotates and translates, such that the blade is not disposed above a portion of the peripheral region. In a step-and-repeat lithographic system, the blade covers a portion of the peripheral region, and the adjacent portion of the substrate is exposed to light.

    Abstract translation: 一种装置保护基底(308)的光致抗蚀剂涂覆的表面的周边区域(310)的一部分免受光照射。 该装置包括可移动或可以移动和旋转的叶片(502,512,522,532)以及可操作地联接到叶片的驱动组件(504,514,524,534)。 响应于由驱动组件产生的至少一个第一驱动力,叶片平移,旋转或平移和旋转,使得叶片设置在周边区域的一部分上方。 响应于由驱动组件产生的至少一个第二驱动力,叶片平移,旋转或旋转和平移,使得叶片不设置在周边区域的一部分上方。 在步进重复平版印刷系统中,刀片覆盖周边区域的一部分,并且衬底的相邻部分暴露于光。

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