公开(公告)号：US09625832B2

公开(公告)日：2017-04-18

申请号：US14432912

申请日：2013-09-27

Applicant: Rudolph Technologies, Inc.

Inventor： J. Casey Donaher ,  Craig Simpson ,  Peter John Gerard Dufault

IPC: H02K41/02 ,  G03F7/20 ,  H02K41/03

CPC classification number: G03F7/70716 ,  G03F7/70758 ,  H02K41/02 ,  H02K41/031 ,  H02K2201/18

Abstract: A planar motor system comprises a platen with a first planar motor component and a stage with a second planar motor component. The stage can move along a first cardinal axis or a second cardinal axis. The planar motor system further comprises a drive system. When the drive system is energized in a first drive configuration, it applies a first force and a second force. The first force and the second force are not parallel to any cardinal axis. A vector sum of the first force and the second force is parallel to the first cardinal axis. When the drive system is energized in a second drive configuration, it applies a third force and a fourth force. The third force and the fourth force are not parallel to any cardinal axis. A vector sum of the third force and the fourth force is parallel to the second cardinal axis.

公开(公告)号：US20150277239A1

公开(公告)日：2015-10-01

申请号：US14433233

申请日：2013-10-02

Applicant: RUDOLPH TECHNOLOGIES, INC.

Inventor： James H. Greer ,  Michael H. Valois ,  J. Casey Donaher

IPC: G03F7/20

CPC classification number: G03F7/2026 ,  G03F7/2022 ,  G03F7/70066 ,  G03F7/70216 ,  G03F7/707 ,  G03F7/70733

Abstract: An apparatus (1100) for protecting at least a portion of a peripheral region of a photoresist-coated surface of a substrate from light exposure. The apparatus includes two or more movable blades (1102) and a drive assembly (1112, 1114) operably coupled to the movable blades. In response to at least one first drive force generated by the drive assembly, the movable blades translate such that the movable blades are disposed above at least a portion of the peripheral region. In response to at least one second drive force generated by the drive assembly, the movable blades translate such that the movable blades are not disposed above a portion of the peripheral region.

Abstract translation: 一种用于保护基材的光致抗蚀剂涂覆表面的外围区域的至少一部分的光暴露的装置（1100）。 该装置包括可操作地联接到可动叶片的两个或更多个可动刀片（1102）和驱动组件（1112,1114）。 响应于由驱动组件产生的至少一个第一驱动力，可移动刀片平移，使得可动刀片设置在周边区域的至少一部分上方。 响应于由驱动组件产生的至少一个第二驱动力，可移动刀片平移，使得可动刀片不设置在周边区域的一部分上方。

公开(公告)号：US20150309425A1

公开(公告)日：2015-10-29

申请号：US14432912

申请日：2013-09-27

Applicant: RUDOLPH TECHNOLOGIES, INC.

Inventor： J. Casey Donaher ,  Craig Simpson ,  Peter John Gerard Dufault

IPC: G03F7/20 ,  H02K41/02

CPC classification number: G03F7/70716 ,  G03F7/70758 ,  H02K41/02 ,  H02K41/031 ,  H02K2201/18

Abstract: A planar motor system comprises a platen with a first planar motor component and a stage with a second planar motor component. The stage can move along a first cardinal axis or a second cardinal axis. The planar motor system further comprises a drive system. When the drive system is energized in a first drive configuration, it applies a first force and a second force. The first force and the second force are not parallel to any cardinal axis. A vector sum of the first force and the second force is parallel to the first cardinal axis. When the drive system is energized in a second drive configuration, it applies a third force and a fourth force. The third force and the fourth force are not parallel to any cardinal axis. A vector sum of the third force and the fourth force is parallel to the second cardinal axis.

Abstract translation: 平面电动机系统包括具有第一平面电动机部件的台板和具有第二平面电动机部件的台架。 舞台可以沿第一个主轴或第二个主轴移动。 平面马达系统还包括驱动系统。 当驱动系统在第一驱动配置中通电时，它施加第一力和第二力。 第一力和第二力不平行于任何主轴。 第一力和第二力的矢量和平行于第一个主轴。 当驱动系统在第二驱动配置中通电时，它施加第三力和第四力。 第三力和第四力不平行于任何基数轴。 第三力和第四力的矢量和平行于第二主轴。

公开(公告)号：US20150234281A1

公开(公告)日：2015-08-20

申请号：US14433194

申请日：2013-10-02

Applicant: RUDOLPH TECHNOLOGIES, INC.

Inventor： Steven D. Gardner ,  J. Casey Donaher

IPC: G03F7/20

CPC classification number: G03F7/2026 ,  G03F7/2022 ,  G03F7/70066 ,  G03F7/70216 ,  G03F7/707 ,  G03F7/70733

Abstract: An apparatus protects a portion of a peripheral region (310) of a photoresist-coated surface of a substrate (308) from light exposure. The apparatus includes a blade (502, 512, 522, 532) that can move, or that can move and rotate, and a drive assembly (504, 514, 524, 534) operably coupled to the blade. In response to at least one first drive force generated by the drive assembly, the blade translates, rotates, or translates and rotates, such that the blade is disposed above a portion of the peripheral region. In response to at least one second drive force generated by the drive assembly, the blade translates, rotates, or rotates and translates, such that the blade is not disposed above a portion of the peripheral region. In a step-and-repeat lithographic system, the blade covers a portion of the peripheral region, and the adjacent portion of the substrate is exposed to light.

Abstract translation: 一种装置保护基底（308）的光致抗蚀剂涂覆的表面的周边区域（310）的一部分免受光照射。 该装置包括可移动或可以移动和旋转的叶片（502,512,522,532）以及可操作地联接到叶片的驱动组件（504,514,524,534）。 响应于由驱动组件产生的至少一个第一驱动力，叶片平移，旋转或平移和旋转，使得叶片设置在周边区域的一部分上方。 响应于由驱动组件产生的至少一个第二驱动力，叶片平移，旋转或旋转和平移，使得叶片不设置在周边区域的一部分上方。 在步进重复平版印刷系统中，刀片覆盖周边区域的一部分，并且衬底的相邻部分暴露于光。