公开(公告)号：US11702732B2

公开(公告)日：2023-07-18

申请号：US17668591

申请日：2022-02-10

Applicant: Raytheon Technologies Corporation

Inventor： Eric Jorzik

IPC: C23C14/04 ,  B05C21/00 ,  C23C14/50 ,  B05C13/02 ,  C23C14/56 ,  H01J37/20 ,  C23C14/24 ,  F01D5/00 ,  C23C10/04 ,  B05B13/02 ,  B05C1/00 ,  B05C17/00 ,  B05C15/00 ,  H01J37/32

CPC classification number: C23C14/505 ,  B05C13/02 ,  B05C21/005 ,  C23C10/04 ,  C23C14/042 ,  C23C14/246 ,  C23C14/56 ,  F01D5/005 ,  H01J37/20 ,  B05B13/0228 ,  B05C1/003 ,  B05C15/00 ,  B05C17/002 ,  F05D2230/313 ,  H01J37/32779 ,  H01J2237/202

Abstract: An embodiment of a line-of-sight coating fixture includes a support structure, a spindle, and a shadow structure. The support structure includes a plurality of compartments disposed below a platter, each compartment having an opening on a periphery of the support structure. Each compartment is adapted to receive and secure a base of a workpiece such that a body of each workpiece to be coated is disposed about a periphery of the support structure and extends above the platter. The spindle is disposed through a center of the platter or support structure for rotating the workpieces thereabout. The shadow structure is disposed about the spindle, inside of the periphery, the shadow structure sized and adapted to shield a portion of each workpiece from line-of-sight coating material.

公开(公告)号：US20220162745A1

公开(公告)日：2022-05-26

申请号：US17668591

申请日：2022-02-10

Applicant: Raytheon Technologies Corporation

Inventor： Eric Jorzik

IPC: C23C14/50 ,  B05C13/02 ,  C23C14/56 ,  H01J37/20 ,  C23C14/24 ,  C23C14/04 ,  F01D5/00 ,  C23C10/04 ,  B05C21/00

Abstract: An embodiment of a line-of-sight coating fixture includes a support structure, a spindle, and a shadow structure. The support structure includes a plurality of compartments disposed below a platter, each compartment having an opening on a periphery of the support structure. Each compartment is adapted to receive and secure a base of a workpiece such that a body of each workpiece to be coated is disposed about a periphery of the support structure and extends above the platter. The spindle is disposed through a center of the platter or support structure for rotating the workpieces thereabout. The shadow structure is disposed about the spindle, inside of the periphery, the shadow structure sized and adapted to shield a portion of each workpiece from line-of-sight coating material.

公开(公告)号：US11542593B2

公开(公告)日：2023-01-03

申请号：US16919569

申请日：2020-07-02

Applicant: Raytheon Technologies Corporation

Inventor： James W. Neal ,  Brian T. Hazel ,  David A. Litton ,  Eric Jorzik

IPC: C23C14/30 ,  C23C14/56 ,  C23C14/54

Abstract: A system for depositing coating on a workpiece includes a deposition chamber within which is formed a vortex to at least partially surround a workpiece therein.

公开(公告)号：US20200332409A1

公开(公告)日：2020-10-22

申请号：US16919569

申请日：2020-07-02

Applicant: Raytheon Technologies Corporation

Inventor： James W. Neal ,  Brian T. Hazel ,  David A. Litton ,  Eric Jorzik

IPC: C23C14/30 ,  C23C14/56 ,  C23C14/54

Abstract: A system for depositing coating on a workpiece includes a deposition chamber within which is formed a vortex to at least partially surround a workpiece therein.