公开(公告)号：US20210401687A1

公开(公告)日：2021-12-30

申请号：US17294566

申请日：2019-11-19

Applicant: SOULBRAIN CO., LTD.

Inventor： Seok Joo KIM ,  Hae Chun KIM ,  Jeong Ho LEE

IPC: A61K8/19 ,  A61K8/92 ,  A61Q17/04

Abstract: Disclosed are a sunscreen composition containing surface-defected cerium oxide particles and a method for preparing the sunscreen composition. The sunscreen composition containing surface-defected cerium oxide particles has excellent ability to kill bacteria, may have a high sun protection factor (SPF) and a high PA index, and may exhibit excellent dispersion stability since the layer separation thereof does not occur even after a long period of time elapses.

公开(公告)号：US20230348753A1

公开(公告)日：2023-11-02

申请号：US18022929

申请日：2021-08-30

Applicant: SOULBRAIN CO., LTD.

Inventor： Jeong Ho LEE ,  Seok Joo KIM

IPC: C09G1/02 ,  C01F17/235 ,  C09K3/14 ,  H01L21/306

CPC classification number: C09G1/02 ,  C01F17/235 ,  C09K3/1409 ,  H01L21/30625 ,  C01P2006/60 ,  C01P2006/22 ,  C01P2004/64 ,  C01P2002/90 ,  C01P2002/85 ,  C01P2004/04 ,  C01P2004/03 ,  C01P2002/72 ,  C01P2002/82 ,  C01P2002/84 ,  C01P2002/74

Abstract: Proposed are cerium oxide particles for chemical mechanical polishing and a slurry composition for chemical mechanical polishing comprising the same. The surfaces of the cerium oxide particles comprise Ce3+ and Ce4+. When the cerium oxide particles are used, they may exhibit a high oxide removal rate and high oxide selectivity in a low particle content range despite their fine particle size as a result of increasing the proportion of Ce3+ on the cerium oxide surface.

公开(公告)号：US20210401688A1

公开(公告)日：2021-12-30

申请号：US17294599

申请日：2019-11-19

Applicant: SOULBRAIN CO., LTD.

Inventor： Jeong Ho LEE ,  Seok Joo KIM

IPC: A61K8/19 ,  A61Q17/04 ,  A61Q19/08

Abstract: Disclosed are a sunscreen composition that absorbs light in the UVA region and a method for preparing the sunscreen composition. Light in the UVA region is light in the wavelength band that affects skin aging and penetrates to the dermis inside the skin. Hence, when the sunscreen composition is used, the sunscreen composition absorbs the light and an effect of preventing skin aging is thus obtained.

公开(公告)号：US20190161644A1

公开(公告)日：2019-05-30

申请号：US16191471

申请日：2018-11-15

Applicant: SOULBRAIN CO., LTD.

Inventor： Jeong Ho LEE ,  Seok Joo KIM

IPC: C09G1/02 ,  H01L21/306

Abstract: The present invention relates to a slurry composition for polishing and a method for polishing a semiconductor thin film with steps of a high aspect ratio, and more particularly, by comprising polishing particles, a compound represented by Chemical Formula 1 below, and a compound represented by Chemical Formula 2 below, to make a slurry composition for polishing that has a high polishing speed in high stepped regions while simultaneously protecting low stepped regions to obtain a high degree of flatness without leaving remaining steps after the completion of polishing, and a method for polishing a semiconductor thin film with steps of a high aspect ratio. in Chemical Formula 1, n is an integer of 1 to 10, in Chemical Formula 2, R1 to R4 are independently C1-C10 alkyl groups, and m is an integer of 1 to 10.

公开(公告)号：US20220008300A1

公开(公告)日：2022-01-13

申请号：US17294613

申请日：2019-11-19

Applicant: SOULBRAIN CO., LTD.

Inventor： Jeong Ho LEE ,  Seok Joo KIM

IPC: A61K8/19 ,  A61K8/365 ,  A61K8/29 ,  A61K8/27 ,  A61Q17/04

Abstract: Disclosed are a sunscreen composition containing cerium oxide (CeO2) particles having surfaces modified with polyhydroxystearic acid and a method for preparing the sunscreen composition. The sunscreen composition containing cerium oxide (CeO2) particles having surfaces modified with polyhydroxystearic acid exhibits excellent dispersion stability even after a long period of time elapses.