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公开(公告)号：US20220008300A1
公开(公告)日：2022-01-13
申请号：US17294613
申请日：2019-11-19
Applicant: SOULBRAIN CO., LTD.
Inventor： Jeong Ho LEE , Seok Joo KIM
Abstract: Disclosed are a sunscreen composition containing cerium oxide (CeO2) particles having surfaces modified with polyhydroxystearic acid and a method for preparing the sunscreen composition. The sunscreen composition containing cerium oxide (CeO2) particles having surfaces modified with polyhydroxystearic acid exhibits excellent dispersion stability even after a long period of time elapses.
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公开(公告)号：US20210401687A1
公开(公告)日：2021-12-30
申请号：US17294566
申请日：2019-11-19
Applicant: SOULBRAIN CO., LTD.
Inventor： Seok Joo KIM , Hae Chun KIM , Jeong Ho LEE
Abstract: Disclosed are a sunscreen composition containing surface-defected cerium oxide particles and a method for preparing the sunscreen composition. The sunscreen composition containing surface-defected cerium oxide particles has excellent ability to kill bacteria, may have a high sun protection factor (SPF) and a high PA index, and may exhibit excellent dispersion stability since the layer separation thereof does not occur even after a long period of time elapses.
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公开(公告)号：US20230348753A1
公开(公告)日：2023-11-02
申请号：US18022929
申请日：2021-08-30
Applicant: SOULBRAIN CO., LTD.
Inventor： Jeong Ho LEE , Seok Joo KIM
IPC: C09G1/02 , C01F17/235 , C09K3/14 , H01L21/306
CPC classification number: C09G1/02 , C01F17/235 , C09K3/1409 , H01L21/30625 , C01P2006/60 , C01P2006/22 , C01P2004/64 , C01P2002/90 , C01P2002/85 , C01P2004/04 , C01P2004/03 , C01P2002/72 , C01P2002/82 , C01P2002/84 , C01P2002/74
Abstract: Proposed are cerium oxide particles for chemical mechanical polishing and a slurry composition for chemical mechanical polishing comprising the same. The surfaces of the cerium oxide particles comprise Ce3+ and Ce4+. When the cerium oxide particles are used, they may exhibit a high oxide removal rate and high oxide selectivity in a low particle content range despite their fine particle size as a result of increasing the proportion of Ce3+ on the cerium oxide surface.
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公开(公告)号：US20240279495A1
公开(公告)日：2024-08-22
申请号：US18565932
申请日：2022-05-30
Applicant: SOULBRAIN CO., LTD.
Inventor： Seok Joo KIM , Myeong Jin KIM
IPC: C09D11/037 , C09D11/52
CPC classification number: C09D11/037 , C09D11/52
Abstract: A transparent nickel complex ink composition and a method for preparing the same are described. Specifically, the transparent nickel complex ink composition comprises: a polar portion comprising nickel and a compound coordinated to the nickel; a solvent; and other additives. The nickel complex compound ink composition is transparent and particle-free, and has an absorbance (ABS) value of 1.0 or higher in a wavelength range of 600 nm to 650 nm.
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5.发明申请公开(公告)号：US20190159977A1
公开(公告)日：2019-05-30
申请号：US16172873
申请日：2018-10-29
Applicant: SOULBRAIN CO., LTD.
Inventor： SeungHyun LEE , Seok Joo KIM
Abstract: The present invention discloses an ultraviolet (UV) block cosmetic composition in the form of a water-in-oil (W/O) emulsion in which a discontinuous water phase is uniformly distributed in a continuous oil phase, or in the form of an oil-in-water (O/W) emulsion in which a discontinuous oil phase is uniformly distributed in a continuous water phase, the UV block cosmetic composition comprising a water phase, an oil phase, and an emulsifier, wherein the water phase includes a water phase medium and cerium oxide particles, and the oil phase includes any one or more selected from a group consisting of an oil phase medium, a hydrophobic UV blocking agent, and an oil UV blocking agent. A UV block cosmetic composition according to the present invention has a superior UVA and UVB blocking effect and a good feeling of use.
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Patent Agency Ranking
公开(公告)号：US20190125639A1
公开(公告)日：2019-05-02
申请号：US16172862
申请日：2018-10-29
Applicant: SOULBRAIN CO., LTD.
Inventor： SeungHyun LEE , Seok Joo KIM
Abstract: The present invention provides a sunscreen composition comprising cerium oxide (CeO2) particles surface-modified with a saturated fatty acid having 10 to 30 carbon atoms or an unsaturated fatty acid having 10 to 30 carbon atoms. Since the sunscreen composition according to an embodiment of the present invention exhibits a high kinematic viscosity in the low-frequency region and high-frequency region, the formulation has excellent emulsification/dispersion phase stability and excellent spreadability, and thus the sunscreen composition can be effectively used as a cosmetic composition for blocking ultraviolet rays.
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公开(公告)号：US20210401688A1
公开(公告)日：2021-12-30
申请号：US17294599
申请日：2019-11-19
Applicant: SOULBRAIN CO., LTD.
Inventor： Jeong Ho LEE , Seok Joo KIM
Abstract: Disclosed are a sunscreen composition that absorbs light in the UVA region and a method for preparing the sunscreen composition. Light in the UVA region is light in the wavelength band that affects skin aging and penetrates to the dermis inside the skin. Hence, when the sunscreen composition is used, the sunscreen composition absorbs the light and an effect of preventing skin aging is thus obtained.
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8.发明申请公开(公告)号：US20190161645A1
公开(公告)日：2019-05-30
申请号：US16192748
申请日：2018-11-15
Applicant: SOULBRAIN CO., LTD.
Inventor： Kyung Il PARK , Seok Joo KIM , Hyeong Ju LEE
IPC: C09G1/02
Abstract: A chemical mechanical polishing slurry composition for polishing a polycrystalline silicon film is presented, comprising: a solvent; a polishing agent; a pH adjuster; and at least one additive selected from the group consisting of a compound represented by Chemical Formula 1 below, a compound represented by Chemical Formula 2 below, and a tautomer thereof.The chemical mechanical polishing slurry composition for polishing a polycrystalline silicon film exhibits a high polishing speed and has various polishing selectivities when employed in a process for polishing a polycrystalline silicon film of a semiconductor wafer, and thus the composition may be effectively used as a composition for a process for polishing a polycrystalline silicon surface for the formation of highly integrated multilayer structured devices.
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9.发明申请公开(公告)号：US20190161644A1
公开(公告)日：2019-05-30
申请号：US16191471
申请日：2018-11-15
Applicant: SOULBRAIN CO., LTD.
Inventor： Jeong Ho LEE , Seok Joo KIM
IPC: C09G1/02 , H01L21/306
Abstract: The present invention relates to a slurry composition for polishing and a method for polishing a semiconductor thin film with steps of a high aspect ratio, and more particularly, by comprising polishing particles, a compound represented by Chemical Formula 1 below, and a compound represented by Chemical Formula 2 below, to make a slurry composition for polishing that has a high polishing speed in high stepped regions while simultaneously protecting low stepped regions to obtain a high degree of flatness without leaving remaining steps after the completion of polishing, and a method for polishing a semiconductor thin film with steps of a high aspect ratio. in Chemical Formula 1, n is an integer of 1 to 10, in Chemical Formula 2, R1 to R4 are independently C1-C10 alkyl groups, and m is an integer of 1 to 10.
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公开(公告)号：US20190117533A1
公开(公告)日：2019-04-25
申请号：US16164836
申请日：2018-10-19
Applicant: SOULBRAIN CO., LTD.
Inventor： SeungHyun LEE , Seok Joo KIM
Abstract: The present invention provides a sunscreen composition comprising cerium oxide (CeO2) particles that are surface-modified with silicone, wherein the silicone is methicone, a methicone derivative, or an alkyl silane. The sunscreen composition according to an embodiment of the present invention is easy to be prepared into a formulation applicable to cosmetics and may have a high physical ultraviolet protection effect to block ultraviolet rays in a wide range of wavelengths with an excellent sun protection factor (SPF). In addition, the sunscreen composition according to an embodiment of the present invention has a skin-like color in view of the color tone of the composition and does not cause white cast even when applied to the skin, and thus the composition can be effectively used in producing cosmetics for UV protection that aim to express natural color.
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