METAL OXIDE (MO) SEMICONDUCTOR AND THIN-FILM TRANSISTOR AND APPLICATION THEREOF

    公开(公告)号:US20210151606A1

    公开(公告)日:2021-05-20

    申请号:US17158026

    申请日:2021-01-26

    Abstract: The present invention discloses a metal oxide (MO) semiconductor, which is implemented by respectively doping at least an oxide of rare earth element R and an oxide of rare earth element R′ into an indium-containing MO semiconductor to form an InxMyRnR′mOz semiconductor. According to the present invention, the extremely high oxygen bond breaking energy in the oxide of rare earth element R is used to effectively control the carrier concentration in the semiconductor, and a charge transportation center can be formed by using the characteristic that the radius of rare earth ions is equivalent to the radius of indium ions, so that the electrical stability of the semiconductor is improved. The present invention further provides a thin-film transistor based on the MO semiconductor and application thereof.

    METAL OXIDE (MO) SEMICONDUCTOR AND THIN-FILM TRANSISTOR AND APPLICATION THEREOF

    公开(公告)号:US20210083126A1

    公开(公告)日:2021-03-18

    申请号:US17105655

    申请日:2020-11-27

    Abstract: The present invention discloses a metal oxide (MO) semiconductor, which is obtained by doping a small amount of rare-earth oxide (RO) as a photo-induced carrier transportion center into an indium-containing MO semiconductor to form a (In2O3)x(MO)y(RO)z semiconductor material. According to the present invention, a charge transportion center can be formed by utilizing the characteristics that the radius of rare-earth ions is equal to that of indium ions, and 4f orbitals in the rare-earth ions and 5s orbitals of the indium ions, so as to improve the stability under illumination. The present invention further provides a thin-film transistor based on the MO semiconductor and application thereof.

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