Abstract:
A method for producing a p-type ZnO based compound semiconductor layer is provided. The method comprises the steps of (a) preparing an n-type single crystal ZnO based compound semiconductor structure containing a Group 11 element which is Cu and/or Ag and at least one Group 13 element selected from the group consisting of B, Ga, Al, and In, and (b) annealing the n-type single crystal ZnO based compound semiconductor structure to form the p-type ZnO based compound semiconductor layer co-doped with the Group 11 element and the Group 13 element.
Abstract:
A fluid processing apparatus includes: a casing partitioned by a fluid processing region, a fluid inlet region on an upstream side of the fluid processing region and having a fluid inlet, and a fluid outlet region on a downstream side of the fluid processing region and having a fluid outlet; a hollow fluid passage pipe provided in the fluid processing region of the casing; an ultraviolet ray emitting unit provided in the fluid outlet region of the casing; a fluid branching and joining member provided over the fluid inlet region and the fluid processing region of the casing and fixed by ribs to the casing.
Abstract:
A fluid sterilization device includes a cylindrical body of a housing having a flow passage through which fluid flows in an axial direction, an inflow port through which the fluid flows into the cylindrical body, an outflow port on the outer circumference of the cylindrical body, a light source provided on an end section on an opposite side to the inflow port, and a quartz cap including a cylindrical section and a leading end section. The quartz cap transmits, collects, or scatters ultraviolet light. The cylindrical section of the quartz cap is fitted to an inner wall of the cylindrical body, and a boundary section of the quartz cap is disposed a position coinciding with an end surface of the outflow port on a side close to the first light source or at a position where the boundary section protrudes beyond the end surface.
Abstract:
A fluid sterilizing apparatus includes: a cylindrical inner pipe which has cutouts penetrating in a radial direction and an outlet pipe projecting in the radial direction; an outer pipe which has, between itself and the inner pipe, an annular space in communication with the cutouts and which houses the inner pipe; an inflow pipe which allows a fluid to flow into the outer pipe; an outflow pipe which is provided coaxially with the inflow pipe and which is connected with the outlet pipe to allow the fluid having passed through the annular space to flow out; and a light source which irradiates the fluid passing through the interior of the inner pipe with ultraviolet light via an ultraviolet light transmitting window.
Abstract:
A method for producing a p-type ZnO based compound semiconductor layer including the steps of (a) supplying (i) Zn, (ii) O, (iii) optional Mg, and (iv) a Group 11 element which is Cu and/or Ag to form a MgxZn1-xO (0≦x≦0.6) single crystal film doped with the Group 11 element; (b) supplying at least one Group 13 element selected from the group consisting of B, Ga, Al, and In on the MgxZn1-xO (0≦x≦0.6) single crystal film; (c) alternately carrying out the steps (a) and (b) to form a laminate structure; and (d) annealing the laminate structure to form a p-type MgxZn1-xO (0≦x≦0.6) layer co-doped with the Group 11 element and the Group 13 element.
Abstract translation:一种制备p型ZnO基化合物半导体层的方法,包括以下步骤:(a)提供(i)Zn,(ii)O,(iii)任选的Mg,和(iv)第11族元素,其为Cu和/ 或Ag以形成掺杂有第11族元素的Mg x Zn 1-x O(0≦̸ x< lE; 0.6)单晶膜; (b)在Mg x Zn 1-x O(0≦̸ x≦̸ 0.6)单晶膜上提供从由B,Ga,Al和In组成的组中选择的至少一种13族元素; (c)交替地执行步骤(a)和(b)以形成层压结构; 和(d)层压结构退火以形成与第11族元素和第13族元素共掺杂的p型Mg x Zn 1-x O(0< n 1; x< lE; 0.6)层。
Abstract:
A method for producing a ZnO based semiconductor element comprises the steps of (a) forming an n-type ZnO based semiconductor layer, (b) forming a ZnO based semiconductor active layer above the n-type ZnO based semiconductor layer, (c) forming a first p-type ZnO based semiconductor layer above the ZnO based semiconductor active layer, and (d) forming a second p-type ZnO based semiconductor layer above the first p-type ZnO based semiconductor layer, wherein the step (d) comprises the steps of (d1) forming an n-type MgxZn1-xO film having a Group 11 element supplied on its surface and doped with a Group 13 element, and (d2) annealing the n-type MgxZn1-xO film for conversion into a p-type film doped with the 11 element, and the first p-type ZnO based semiconductor layer doped an element which reduces diffusion of the Group 11 element and the Group 13 element is formed in the step (c).
Abstract translation:一种制备ZnO基半导体元件的方法包括以下步骤:(a)形成n型ZnO基半导体层,(b)在n型ZnO基半导体层上形成ZnO基半导体活性层,(c)形成 在所述ZnO基半导体有源层上方的第一p型ZnO基半导体层,和(d)在所述第一p型ZnO基半导体层上方形成第二p型ZnO基半导体层,其中,所述工序(d) (d1)形成具有在其表面上提供的第11族元素的n型Mg x Zn n-x O膜并掺杂第13族元素的步骤,(d2)使n型Mg x Zn n-x O膜退火成p型, 并且在步骤(c)中形成掺杂有降低11族元素和13族元素扩散的元素的第一p型ZnO基半导体层。
Abstract:
A liquid sterilization device includes: an outer tube through which a fluid to be sterilized flows from one end side to the other end side in the axial direction; a flow-regulating plate that has a plurality of tapered holes having diameters thereof increasing from one end side toward the other end side in the axial direction; and a light source that applies ultraviolet light to a sterilization space on the other end side relative to the flow-regulating plate.
Abstract:
A p-type ZnO based compound semiconductor single crystal layer, wherein the layer includes a p-type ZnO based compound semiconductor single crystal layer co-doped with (i) a Group 11 element which is Cu and/or Ag and (ii) at least one Group 13 element selected from the group consisting of B, Ga, Al, and In, and a concentration of the Group 11 element [11] and a concentration of the Group 13 element [13] fulfill the relation: 0.9≦[11]/[13]