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Patent Agency Ranking
公开(公告)号：US20220154328A1
公开(公告)日：2022-05-19
申请号：US17530083
申请日：2021-11-18
Inventor： Yuuji Ishida
Abstract: There is provided an insulating structure including a first end portion, a second end portion, a shaft portion connecting the first end portion and the second end portion to each other, and a surrounding portion including an inner surface facing an outer surface of the shaft portion and extending toward the second end portion from the first end portion. A gap between the outer surface of the shaft portion and the inner surface of the surrounding portion is configured to communicate with an outside. The first end portion, the second end portion, the shaft portion, and the surrounding portion are formed of electrical insulating material.
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公开(公告)号：US12221689B2
公开(公告)日：2025-02-11
申请号：US17530083
申请日：2021-11-18
Inventor： Yuuji Ishida
Abstract: There is provided an insulating structure including a first end portion, a second end portion, a shaft portion connecting the first end portion and the second end portion to each other, and a surrounding portion including an inner surface facing an outer surface of the shaft portion and extending toward the second end portion from the first end portion. A gap between the outer surface of the shaft portion and the inner surface of the surrounding portion is configured to communicate with an outside. The first end portion, the second end portion, the shaft portion, and the surrounding portion are formed of electrical insulating material.
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公开(公告)号：US11978608B2
公开(公告)日：2024-05-07
申请号：US17201436
申请日：2021-03-15
Inventor： Yuuji Ishida
IPC: H01J37/08 , H01J37/18 , H01J37/317 , H01J37/32
CPC classification number: H01J37/08 , H01J37/18 , H01J37/3171 , H01J37/32064 , H01J37/32614 , H01J37/32954
Abstract: There is provided an ion generation device including a plasma generation chamber that generates a plasma for extracting an ion, and a heating device configured to heat the plasma generation chamber by irradiating a member that defines the plasma generation chamber or a member that is to be exposed to the plasma generated inside the plasma generation chamber with a laser beam.
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公开(公告)号：US20210296078A1
公开(公告)日：2021-09-23
申请号：US17201436
申请日：2021-03-15
Inventor： Yuuji Ishida
IPC: H01J37/08 , H01J37/317 , H01J37/18 , H01J37/32
Abstract: There is provided an ion generation device including a plasma generation chamber that generates a plasma for extracting an ion, and a heating device configured to heat the plasma generation chamber by irradiating a member that defines the plasma generation chamber or a member that is to be exposed to the plasma generated inside the plasma generation chamber with a laser beam.
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公开(公告)号：US20180261434A1
公开(公告)日：2018-09-13
申请号：US15918656
申请日：2018-03-12
Inventor： Hiroshi Kawaguchi , Yuuji Ishida
IPC: H01J37/32 , C23C14/48 , H01J37/317
CPC classification number: H01J37/32559 , C23C14/48 , H01J37/08 , H01J37/3171 , H01J37/32366 , H01J2237/038 , H01J2237/061
Abstract: In an insulating structure which insulates an electrode provided inside a vacuum region of an ion implanter from another member and supports the electrode, a first insulating member supports the electrode. A second insulating member is fitted to the first insulating member to suppress deposition of contamination particles to the first insulating member. The second insulating member is formed of a material having a hardness lower than that of the first insulating member. A Vickers hardness of an outer surface of the second insulating member is 5 GPa or less. Bending strength of the second insulating member is 100 MPa or less. The second insulating member is formed of a material including at least one of boron nitride, a porous ceramic, and a resin.
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