公开(公告)号：US12125665B2

公开(公告)日：2024-10-22

申请号：US17742608

申请日：2022-05-12

Applicant: TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY LIMITED

Inventor： Kai-Yun Yang ,  Chen Chi Wu ,  Ching I Li ,  Min-Chang Ching ,  Hung-Ta Huang

IPC: H01J37/08 ,  H01J37/317 ,  H01J37/32 ,  H01L21/265

CPC classification number: H01J37/08 ,  H01J37/3171 ,  H01J37/32064 ,  H01L21/26513

Abstract: A plasma flood gun includes a filament to emit first electrons based on a first filament current induced in the filament to heat the filament to a first temperature at a first time. The first electrons interact with an inert gas in an arc plasma chamber to generate a first plasma. A filament resistance meter measures a first filament resistance of the filament, in-situ, during generation of the first plasma. A filament current source adjusts, based on the first filament resistance, the first filament current induced in the filament at the first time to a second filament current induced in the filament at a second time to generate a second plasma in the arc plasma chamber at the second time.

公开(公告)号：US09558917B2

公开(公告)日：2017-01-31

申请号：US15222597

申请日：2016-07-28

Applicant: Advanced Energy Industries, Inc.

Inventor： Kenneth W. Finley ,  Hendrik Walde

IPC: H01J37/32 ,  H01J37/34

CPC classification number: H01J37/32064 ,  H01J37/32027 ,  H01J37/32055 ,  H01J37/34 ,  H05H1/46 ,  H05H1/48 ,  H05H2001/4682

Abstract: This disclosure describes a non-dissipative snubber circuit configured to boost a voltage applied to a load after the load's impedance rises rapidly. The voltage boost can thereby cause more rapid current ramping after a decrease in power delivery to the load which results from the load impedance rise. In particular, the snubber can comprise a combination of a unidirectional switch, a voltage multiplier, and a current limiter. In some cases, these components can be a diode, voltage doubler, and an inductor, respectively.

Abstract translation: 本公开描述了一种非耗散缓冲电路，其被配置为在负载的阻抗快速上升之后升高施加到负载的电压。 因此，由于负载阻抗上升而导致负载的功率递减降低后，电压提升可以引起更快速的电流斜坡。 特别地，缓冲器可以包括单向开关，电压倍增器和限流器的组合。 在某些情况下，这些组件可分别是二极管，倍压器和电感。

公开(公告)号：US09263241B2

公开(公告)日：2016-02-16

申请号：US13104762

申请日：2011-05-10

Applicant: Skip B. Larson ,  Kenneth E. Nauman

Inventor： Skip B. Larson ,  Kenneth E. Nauman

IPC: C23C16/00 ,  H01J37/32

CPC classification number: H01J37/32944 ,  H01J37/32064 ,  H01J37/3299

Abstract: This disclosure describes systems, methods, and apparatuses for extinguishing electrical arcs in a plasma processing chamber. Once an arc is detected, the steady state voltage provided to the plasma processing chamber can be reduced, and the current being provided to the chamber decays below a steady state value as the arc is extinguished. When the current falls to or below a current threshold, the voltage can be ramped back up bringing the voltage and current back to steady state values. This technique enables power to return to a steady state level faster than traditional arc mitigation techniques.

Abstract translation: 本公开描述了用于在等离子体处理室中熄灭电弧的系统，方法和装置。 一旦检测到电弧，可以减小提供给等离子体处理室的稳态电压，并且当电弧熄灭时，提供给室的电流衰减到低于稳态值。 当电流下降到或低于电流阈值时，可以将电压反斜坡，使电压和电流恢复到稳定状态值。 这种技术使电源能够比传统的电弧缓解技术更快地恢复到稳定状态。

公开(公告)号：US20140224768A1

公开(公告)日：2014-08-14

申请号：US14124394

申请日：2012-05-31

Applicant: Jürgen Ramm ,  Beno Widrig

Inventor： Jürgen Ramm ,  Beno Widrig

IPC: H01J37/32

CPC classification number: H01J37/32064 ,  C23C16/0245 ,  H01J2237/3341 ,  H01L21/02376 ,  H01L21/31116 ,  H01L21/31122 ,  H01L29/66015

Abstract: The invention relates to a method for removing carbon layers, in particular ta-C layers, from substrate surfaces of tools and components. The substrate to be de-coated is accordingly arranged on a substrate support in a vacuum chamber, the vacuum chamber is charged with at least one reactive gas assisting the evacuation of carbon in gaseous form and a low-voltage plasma discharge is created in the vacuum chamber to activate the reactive gas and hence assist the required chemical reaction or reactions to de-coat the coated substrate. The low-voltage plasma discharge is a dc low-volt arc discharge, the substrate surfaces to be de-coated are bombarded substantially exclusively with electrons and oxygen, nitrogen and hydrogen are used as reactive gas.

Abstract translation: 本发明涉及从工具和部件的基板表面去除碳层，特别是ta-C层的方法。 因此，要去除涂层的基板被布置在真空室中的基板支撑件上，真空室中装有至少一个辅助气体排出碳的反应气体，并且在真空中产生低压等离子体放电 室以活化反应性气体，因此有助于所需的化学反应或反应来去除涂覆的基底。 低压等离子体放电是直流低压电弧放电，基本上仅用电子和氧气轰击要去除的基板表面，使用氮和氢作为反应气体。

公开(公告)号：US08786263B2

公开(公告)日：2014-07-22

申请号：US12617181

申请日：2009-11-12

Applicant: Pawel Ozimek ,  Rafal Bugyi ,  Robert Dziuba ,  Andrzej Klimczak ,  Marcin Zelechowski

Inventor： Pawel Ozimek ,  Rafal Bugyi ,  Robert Dziuba ,  Andrzej Klimczak ,  Marcin Zelechowski

IPC: G05F1/00 ,  H01J37/32 ,  H01M10/44 ,  H01M10/42 ,  H05H1/36

CPC classification number: H01J37/32064 ,  H01J37/32091 ,  H01J37/32174 ,  H01M10/42 ,  H01M10/425 ,  H01M10/4264 ,  H01M10/44 ,  H05H1/36 ,  Y02E60/12

Abstract: According to a first aspect of the present invention, reducing electrical energy stored in a load or in one or more leads for connecting a power supply with the load is achieved by plasma process power circuitry including a switch in operative connection with at least one of the leads for enabling/interrupting power to the load; a first electrical nonlinear device; an energy storing device arranged in series with the first electrical nonlinear device; and a pre-charging circuit in operative connection with the energy storing device, the pre-charging circuit configured to charge the energy storing device to a pre-determined energy level while power to the load is enabled.

Abstract translation: 根据本发明的第一方面，通过等离子体处理电源电路来实现减少存储在负载中的电能或用于连接电源与负载的一个或多个引线中的电能，该等离子体处理电源电路包括与至少一个 导线用于启用/中断负载电源; 第一电气非线性装置; 与第一电气非线性装置串联布置的能量存储装置; 以及与所述能量存储装置可操作地连接的预充电电路，所述预充电电路被配置为在能量到所述负载的电力的同时将所述能量存储装置充电到预定的能量水平。

公开(公告)号：US20130134890A1

公开(公告)日：2013-05-30

申请号：US13744638

申请日：2013-01-18

Applicant: HUETTINGER ELEKTRONIK GMBH + CO. KG

Inventor： Ulrich Richter

IPC: H01J37/32

CPC classification number: H01J37/32064 ,  H01J37/32018 ,  H01J37/32045 ,  H01J37/32935

Abstract: In a method for extinguishing an arc in a gas discharge chamber in which power is supplied to a gas discharge chamber and in which both with a current flow in a first direction and with a current flow in a second inverse direction there is produced a gas discharge, when an arc is identified, the power supply to the gas discharge chamber is interrupted, and residual energy which is in a supply line to the gas discharge chamber and/or in the gas discharge chamber is supplied to an energy store.

Abstract translation: 在将气体放电室供电的气体放电室中的电弧熄灭的方法中，在第一方向的电流和第二反方向的电流中，产生气体放电 当识别出电弧时，中断对气体放电室的供电，并且向气体放电室和/或气体放电室供电的剩余能量被供应到能量存储器。

公开(公告)号：US20100213903A1

公开(公告)日：2010-08-26

申请号：US12617181

申请日：2009-11-12

Applicant: Pawel Ozimek ,  Rafal Bugyi ,  Robert Dziuba ,  Andrzej Klimczak ,  Marcin Zelechowski

Inventor： Pawel Ozimek ,  Rafal Bugyi ,  Robert Dziuba ,  Andrzej Klimczak ,  Marcin Zelechowski

IPC: H02J7/00

CPC classification number: H01J37/32064 ,  H01J37/32091 ,  H01J37/32174 ,  H01M10/42 ,  H01M10/425 ,  H01M10/4264 ,  H01M10/44 ,  H05H1/36 ,  Y02E60/12

Abstract: According to a first aspect of the present invention, reducing electrical energy stored in a load or in one or more leads for connecting a power supply with the load is achieved by plasma process power circuitry including a switch in operative connection with at least one of the leads for enabling/interrupting power to the load; a first electrical nonlinear device; an energy storing device arranged in series with the first electrical nonlinear device; and a pre-charging circuit in operative connection with the energy storing device, the pre-charging circuit configured to charge the energy storing device to a pre-determined energy level while power to the load is enabled.

Abstract translation: 根据本发明的第一方面，通过等离子体处理电源电路来实现减少存储在负载中的电能或用于连接电源与负载的一个或多个引线中的电能，该等离子体处理电源电路包括与至少一个 导线用于启用/中断负载电源; 第一电气非线性装置; 与第一电气非线性装置串联布置的能量存储装置; 以及与所述能量存储装置可操作地连接的预充电电路，所述预充电电路被配置为在能量到所述负载的电力的同时将所述能量存储装置充电到预定的能量水平。

公开(公告)号：US20100141221A1

公开(公告)日：2010-06-10

申请号：US12328831

申请日：2008-12-05

Applicant: Milan Ilic ,  Darren File

Inventor： Milan Ilic ,  Darren File

IPC: G05F1/10

CPC classification number: H01J37/3299 ,  H01J37/32064 ,  H01J37/32935 ,  H01J37/32944

Abstract: An apparatus and method for controlling an application of power to power a plasma chamber. A detector detects actual power out from the power stage to the plasma chamber during a sampling interval. A compare module compares the actual power out during the sampling interval to a present power setting during the sampling interval and generates a compensation value. An adjust module updates the present power setting for the power stage with the compensation value to provide a new power setting for the power stage to control the power out from power stage to the plasma chamber during the deposition process whereby power losses occurring during the deposition process are compensated during the deposition process. If there is a fixed time period for the deposition process, the compensation method and apparatus may be used to compensate the deposition process for energy losses without extending the duration of the deposition process.

Abstract translation: 一种用于控制对等离子体室供电的电力的应用的装置和方法。 在采样间隔期间，检测器检测从功率级到等离子体室的实际功率。 比较模块将采样间隔期间的实际功率输出与采样间隔期间的当前功率设置进行比较，并生成补偿值。 调整模块利用补偿值更新功率级的当前功率设置，以提供功率级的新功率设置，以在沉积过程中控制从功率级到等离子体室的功率，由此在沉积过程中发生功率损耗 在沉积过程中得到补偿。 如果沉积过程具有固定的时间段，则可以使用补偿方法和装置来补偿沉积过程中的能量损失，而不会延长沉积过程的持续时间。

公开(公告)号：US20080286496A1

公开(公告)日：2008-11-20

申请号：US11937071

申请日：2007-11-08

Applicant: Jurgen Ramm ,  Christian Wohlrab

Inventor： Jurgen Ramm ,  Christian Wohlrab

IPC: H01T14/00

CPC classification number: C23C14/325 ,  C23C14/0021 ,  C23C14/08 ,  C23C14/081 ,  H01J37/32055 ,  H01J37/32064

Abstract: The invention relates to a method for operating an arc source, whereby an electric spark discharge is ignited and run on the surface of a target and the spark discharge is simultaneously fed a direct current with an associated constant voltage DV as well as a pulsed current generated by a periodically applied voltage signal. The voltage at the arc source is boosted over several microseconds and the shape of the voltage signal is in essence arbitrarily selectable.

Abstract translation: 本发明涉及一种用于操作电弧源的方法，由此在目标表面上点燃和运行电火花放电并且火花放电同时馈送有相关联的恒定电压DV的直流电流以及产生的脉冲电流 通过周期性施加的电压信号。 电弧源处的电压升高几个微秒，电压信号的形状本质上可任意选择。

公开(公告)号：US20070144901A1

公开(公告)日：2007-06-28

申请号：US10598217

申请日：2005-03-15

Applicant: Terje Skotheim ,  Uladzimir Sheleh ,  Grigory Kirpilenko

Inventor： Terje Skotheim ,  Uladzimir Sheleh ,  Grigory Kirpilenko

IPC: C23C14/00

CPC classification number: C23C14/221 ,  C23C14/0605 ,  C23C14/325 ,  C23C14/358 ,  H01J37/32055 ,  H01J37/32064 ,  H01J37/32614 ,  H01J37/3266 ,  H01J37/3405 ,  H01J2237/3142

Abstract: The present invention provides a pulsed plasma arc source capable of applying diamond-like carbon coatings, other hard wear resistant coatings or metal coatings to a substrate. The pulsed plasma arc source is based on the use of a magnetron sputtering system for initiation of the pulsed arc discharge. The pulsed plasma arc source can be scale up to coat large substrates.

Abstract translation: 本发明提供一种脉冲等离子体电弧源，其能够将金刚石状碳涂层，其它硬质耐磨涂层或金属涂层施加到基底上。 脉冲等离子体电弧源基于使用磁控溅射系统来启动脉冲电弧放电。 脉冲等离子体电弧源可以放大以覆盖大的衬底。