公开(公告)号：US10389278B2

公开(公告)日：2019-08-20

申请号：US14776787

申请日：2014-03-11

Applicant: SUMITOMO OSAKA CEMENT CO., LTD.

Inventor： Yoshiaki Moriya ,  Kazuto Ando

IPC: H02N13/00 ,  H01L21/683 ,  H01L21/687

Abstract: Provided is an electrostatic chuck device in which the attachment of particles to the rear surface of a plate-like specimen can be further suppressed by suppressing the generation source of the particles and, furthermore, an effect of cooling the plate-like specimen using a cooling gas can be improved. The electrostatic chuck device is formed by including an electrostatic chuck portion in which an upper surface (2a) of a ceramic plate-like body (2) is used as a placement surface on which a wafer is placed and an electrostatic adsorption electrode is provided inside the ceramic plate-like body (2) or on the rear surface thereof, multiple protrusions (11) are formed on the upper surface (2a), and multiple fine protrusions (13) are formed in regions (12) excluding the multiple protrusions (11) in the upper surface (2a).

公开(公告)号：US09837296B2

公开(公告)日：2017-12-05

申请号：US13718071

申请日：2012-12-18

Applicant: Sumitomo Osaka Cement Co., Ltd.

Inventor： Shinichi Maeta ,  Yoshiaki Moriya ,  Kei Furuuchi

IPC: H01L21/683 ,  H01L21/67

CPC classification number: H01L21/6831 ,  H01L21/67248

Abstract: An electrostatic chuck apparatus is disclosed which can be prevented from being damaged or fractured when the temperature abruptly increases or decreases when plasma is irradiated on a plate-like specimen, the heater is heated, or the like, and can also prevent corrosion when a corrosive gas or plasma is provided. The electrostatic chuck apparatus has an electrostatic chuck portion 2 having a mounting plate 11 made of a corrosion-resistant ceramic, a supporting plate 12 which is integrated with the mounting plate 11 so as to support the mounting plate 11 and is made of an insulating ceramic having a larger thermal conductivity than the thermal conductivity of the corrosion-resistant ceramic, and an internal electrode for electrostatic adsorption 13 provided between the mounting plate 11 and the supporting plate 12; and a temperature-controlling base portion 3 which adjusts the electrostatic chuck portion 2 to a desired temperature.

公开(公告)号：US20140204501A1

公开(公告)日：2014-07-24

申请号：US14155591

申请日：2014-01-15

Applicant: Sumitomo Osaka Cement Co., Ltd.

Inventor： Yoshiaki Moriya ,  Yukio Miura ,  Shinichi Maeta

IPC: H01L21/683

CPC classification number: H01L21/6833 ,  H01L21/67103

Abstract: The electrostatic chucking device 1 of the invention includes an electrostatic chucking portion 2 which includes a plate-like body 11, a top surface 11a of which is used as a mounting surface that mounts a plate-like specimen W, an electrostatic adsorption electrode 12 provided in the plate-like body 11 and a power-feeding terminal 13 that applies a direct-current voltage to the electrostatic adsorption electrode 12; and a base portion 31 that supports the electrostatic chucking portion 2, in which the plate-like body 11 is a corrosion-resistant ceramic, a circular insulation member 21 is provided in a circumferential edge portion between the electrostatic chucking portion 2 and the base portion 31, and a heat radiation plate 34 is provided on the top surface 31a of the base portion 31.

Abstract translation: 本发明的静电吸附装置1包括静电吸附部分2，其包括板状体11，其顶表面11a用作安装板状样本W的安装表面，设置有静电吸附电极12 在板状体11和向静电吸附电极12施加直流电压的供电端子13; 以及支撑静电吸附部2的基部31，其中板状体11是耐腐蚀陶瓷，在静电吸附部2和基部之间的周缘部设置有圆形绝缘部件21 31，在基部31的顶面31a上设有散热板34。

公开(公告)号：US10189745B2

公开(公告)日：2019-01-29

申请号：US15027339

申请日：2014-10-15

Applicant: Sumitomo Osaka Cement Co., Ltd.

Inventor： Kentaro Takahashi ,  Yoshiaki Moriya ,  Megumi Ootomo

IPC: C04B35/44 ,  H01L21/683 ,  C04B35/645 ,  H02N13/00 ,  H05K7/20 ,  H01L21/687 ,  C04B35/626

Abstract: Provided are a corrosion-resistant member and an electrostatic chuck device using the same, in which corrosion resistance to halogen corrosive gas such as fluorine corrosive gas or chlorine corrosive gas and plasma thereof is high, dielectric constant and volume resistivity are high, and dielectric loss is low. The corrosion-resistant member is formed of a composite oxide sintered compact containing aluminum, samarium, and a rare earth metal element other than samarium, in which the rare earth metal element other than samarium has an ionic radius of 0.88×10−10 m or more.

公开(公告)号：US09287156B2

公开(公告)日：2016-03-15

申请号：US14155591

申请日：2014-01-15

Applicant: Sumitomo Osaka Cement Co., Ltd.

Inventor： Yoshiaki Moriya ,  Yukio Miura ,  Shinichi Maeta

IPC: H01L21/683 ,  H01L21/67

CPC classification number: H01L21/6833 ,  H01L21/67103

Abstract: The electrostatic chucking device 1 of the invention includes an electrostatic chucking portion 2 which includes a plate-like body 11, a top surface 11a of which is used as a mounting surface that mounts a plate-like specimen W, an electrostatic adsorption electrode 12 provided in the plate-like body 11 and a power-feeding terminal 13 that applies a direct-current voltage to the electrostatic adsorption electrode 12; and a base portion 31 that supports the electrostatic chucking portion 2, in which the plate-like body 11 is a corrosion-resistant ceramic, a circular insulation member 21 is provided in a circumferential edge portion between the electrostatic chucking portion 2 and the base portion 31, and a heat radiation plate 34 is provided on the top surface 31a of the base portion 31.

Abstract translation: 本发明的静电吸附装置1包括静电吸附部分2，其包括板状体11，其顶表面11a用作安装板状样本W的安装表面，设置有静电吸附电极12 在板状体11和向静电吸附电极12施加直流电压的供电端子13; 以及支撑静电吸附部2的基部31，其中板状体11是耐腐蚀陶瓷，在静电吸附部2和基部之间的周缘部设置有圆形绝缘部件21 31，在基部31的顶面31a上设有散热板34。

公开(公告)号：US20160251265A1

公开(公告)日：2016-09-01

申请号：US15027339

申请日：2014-10-15

Applicant: SUMITOMO OSAKA CEMENT CO., LTD.

Inventor： Kentaro Takahashi ,  Yoshiaki Moriya ,  Megumi Ootomo

IPC: C04B35/44 ,  H05K7/20 ,  H01L21/683 ,  C04B35/645 ,  H02N13/00

CPC classification number: C04B35/44 ,  C04B35/6261 ,  C04B35/6262 ,  C04B35/62655 ,  C04B35/62675 ,  C04B35/645 ,  C04B2235/3217 ,  C04B2235/3222 ,  C04B2235/3224 ,  C04B2235/3225 ,  C04B2235/3227 ,  C04B2235/5436 ,  C04B2235/5445 ,  C04B2235/761 ,  C04B2235/764 ,  C04B2235/768 ,  C04B2235/77 ,  C04B2235/9669 ,  C04B2235/9684 ,  C04B2235/9692 ,  H01L21/6831 ,  H01L21/6833 ,  H01L21/68757 ,  H02N13/00 ,  H05K7/2039

Abstract: Provided are a corrosion-resistant member and an electrostatic chuck device using the same, in which corrosion resistance to halogen corrosive gas such as fluorine corrosive gas or chlorine corrosive gas and plasma thereof is high, dielectric constant and volume resistivity are high, and dielectric loss is low. The corrosion-resistant member is formed of a composite oxide sintered compact containing aluminum, samarium, and a rare earth metal element other than samarium, in which the rare earth metal element other than samarium has an ionic radius of 0.88×10−10 m or more.

Abstract translation: 提供一种耐蚀性构件和使用其的静电吸盘装置，其中对氟腐蚀性气体或氯气腐蚀性气体及其等离子体的卤素腐蚀性气体的耐腐蚀性高，介电常数和体积电阻率高，并且介电损耗 低。 耐腐蚀部件由含有钐，钐以外的稀土元素的复合氧化物烧结体形成，其中钐以外的稀土金属元素的离子半径为0.88×10 -10 m，或 更多。

公开(公告)号：US11024528B2

公开(公告)日：2021-06-01

申请号：US15769672

申请日：2016-10-21

Applicant: SUMITOMO OSAKA CEMENT CO., LTD.

Inventor： Yoshiaki Moriya ,  Keigo Maki ,  Hitoshi Kouno ,  Kazuto Ando ,  Yuuki Kinpara

IPC: H01L21/683 ,  H01L21/687 ,  H01L21/67

Abstract: An electrostatic chuck device comprising: a placing table having a placing surface on which a plate-shaped sample is placed, an electrostatic attraction electrode, which is located on a lower side of the placing table in such a manner that the electrode is located on a surface side opposite to the placing surface of the placing table, a base part on which at least the placing table and the electrostatic attraction electrode are mounted, a focus ring which surrounds the placing table wherein the focus ring is a continuous ring or is divided into two or more portions, and a lift pin which is movable in an up-down direction and raises the entirety of or at least a part of the focus ring from the base part.

公开(公告)号：US20130265690A1

公开(公告)日：2013-10-10

申请号：US13718071

申请日：2012-12-18

Applicant: SUMITOMO OSAKA CEMENT CO., LTD.

Inventor： Shinichi Maeta ,  Yoshiaki Moriya ,  Kei Furuuchi

IPC: H01L21/683

CPC classification number: H01L21/6831 ,  H01L21/67248

Abstract: An electrostatic chuck apparatus is disclosed which can be prevented from being damaged or fractured when the temperature abruptly increases or decreases when plasma is irradiated on a plate-like specimen, the heater is heated, or the like, and can also prevent corrosion when a corrosive gas or plasma is provided. The electrostatic chuck apparatus has an electrostatic chuck portion 2 having a mounting plate 11 made of a corrosion-resistant ceramic, a supporting plate 12 which is integrated with the mounting plate 11 so as to support the mounting plate 11 and is made of an insulating ceramic having a larger thermal conductivity than the thermal conductivity of the corrosion-resistant ceramic, and an internal electrode for electrostatic adsorption 13 provided between the mounting plate 11 and the supporting plate 12; and a temperature-controlling base portion 3 which adjusts the electrostatic chuck portion 2 to a desired temperature.

Abstract translation: 公开了一种静电吸盘装置，当等离子体照射在板状样品，加热器等上时，当温度突然增加或降低时，可以防止其损坏或断裂，并且还可以防止腐蚀时的腐蚀 提供气体或等离子体。 静电吸盘装置具有静电吸盘部2，该静电卡盘部2具有由耐腐蚀陶瓷构成的安装板11，与安装板11一体形成的支撑板12，以支撑安装板11，并由绝缘陶瓷 具有比耐腐蚀陶瓷的热导率大的热导率和设置在安装板11和支撑板12之间的用于静电吸附的内部电极13; 以及将静电吸盘部2调整到期望温度的温度控制基部3。