公开(公告)号：US10923381B2

公开(公告)日：2021-02-16

申请号：US16070478

申请日：2017-01-18

Applicant: SUMITOMO OSAKA CEMENT CO., LTD.

Inventor： Mamoru Kosakai ,  Yukio Miura ,  Kazunori Ishimura ,  Keisuke Maeda ,  Hitoshi Kouno ,  Yuuki Kinpara ,  Shinichi Maeta ,  Tomomi Ito

IPC: H01L21/683 ,  H01L21/687 ,  H01L21/67 ,  H02N13/00

Abstract: An electrostatic chuck device includes: an electrostatic chuck part which incorporates an internal electrode for electrostatic attraction and has a placing surface on which a plate-like sample is placed; a base part which cools the electrostatic chuck part; and an adhesion layer which bonds the electrostatic chuck part and the base part to integrate the parts together, in which a first through-hole is provided in the electrostatic chuck part, a second through-hole that communicates with the first through-hole is provided in the base part, a tubular insulator is fixed in the second through-hole, an annular sealing member is sandwiched between the electrostatic chuck part and a distal end surface of the insulator, wherein the distal end surface is located on the electrostatic chuck part side of the insulator, and a tubular insulating wall member is located at the inner side of the sealing member in the radial direction.

公开(公告)号：US10153192B2

公开(公告)日：2018-12-11

申请号：US15762056

申请日：2016-09-13

Applicant: SUMITOMO OSAKA CEMENT CO., LTD.

Inventor： Shinichi Maeta ,  Yukio Miura ,  Mamoru Kosakai ,  Hitoshi Kouno

IPC: H01L21/683 ,  H01J37/32 ,  H01L21/67

Abstract: An electrostatic chuck device according to the present invention includes: an electrostatic chuck portion having a placement surface on which a plate-like sample is placed; a base portion for temperature adjustment disposed in opposition to the side of the electrostatic chuck portion on the opposite side from the placement surface; a bonding portion for bonding the electrostatic chuck portion and the base portion for temperature adjustment together; and an annular focus ring surrounding the periphery of the placement surface, in which the volume of a space surrounded by the electrostatic chuck portion, the focus ring, the bonding portion, and a dam portion of the base portion for temperature adjustment is greater than the amount of volume expansion of the bonding portion at the working temperature.

公开(公告)号：US09466518B2

公开(公告)日：2016-10-11

申请号：US14286898

申请日：2014-05-23

Applicant: Sumitomo Osaka Cement Co., Ltd.

Inventor： Shinichi Maeta ,  Mamoru Kosakai ,  Yukio Miura ,  Takeshi Otsuka

IPC: H05F3/00 ,  H01L21/683 ,  H01L21/67 ,  H01L21/687 ,  G03F7/20 ,  H01J37/32

CPC classification number: H01L21/6831 ,  G03F7/707 ,  G03F7/70708 ,  H01J37/32715 ,  H01L21/67109 ,  H01L21/68735 ,  H01L21/6875

Abstract: An electrostatic chuck device is provided in which there is no concern that a plate-shaped sample may be deformed when adsorbing the plate-shaped sample or when detaching the plate-shaped sample, the temperature of the plate-shaped sample is uniformized, and particles are not easily produced.In an electrostatic chuck device 1 provided with an electrostatic chuck section 2 which has a placement plate 11, an upper surface 11a of which is a placement surface on which a plate-shaped sample W such as a semiconductor wafer is placed, a support plate 12 integrated with the placement plate 11, and an internal electrode for electrostatic adsorption 13 and an insulating material layer 14 which are provided between the placement plate 11 and the support plate 12, an annular projection portion 21 is provided at a peripheral border portion on the upper surface 11a, a plurality of projection portions 22 having the same height as the height of the annular projection portion 21 are provided in an area surrounded by the annular projection portion 21 of the upper surface 11a, and an upper end portion of the annular projection portion 21 and an upper end portion of each of the plurality of projection portions 22 are located on a concave surface 23 with a central portion of the upper surface 11a as a basal plane.

Abstract translation: 在设置有具有放置板11的静电卡盘部2的静电卡盘装置1中，其上表面11a是放置有诸如半导体晶片的板状样品W的放置表面，支撑板12 与放置板11和设置在放置板11和支撑板12之间的静电吸附用内部电极13和绝缘材料层14一体化的环状突起部21设置在上部的周边边界部 表面11a，在由上表面11a的环形突出部分21围绕的区域中设置有与环形突出部分21的高度相同高度的多个突出部分22，并且环形突起部分的上端部分 21，并且多个突出部22中的每一个的上端部位于凹面23上，上表面的中心部分 11a作为基础飞机。

公开(公告)号：US09412635B2

公开(公告)日：2016-08-09

申请号：US14374536

申请日：2013-02-06

Applicant: Tokyo Electron Limited ,  Sumitomo Osaka Cement Co., Ltd.

Inventor： Yasuharu Sasaki ,  Kaoru Oohashi ,  Tomoyuki Takahashi ,  Tadashi Aoto ,  Mamoru Kosakai ,  Shinichi Maeta ,  Yukio Miura ,  Takashi Sato ,  Kei Furuuchi

IPC: H01T23/00 ,  H01L21/683 ,  B23Q3/15 ,  H01L21/67

CPC classification number: H01L21/6833 ,  B23Q3/15 ,  H01L21/67109 ,  H01L21/6831

Abstract: An electrostatic chuck device includes an electrostatic chuck part that has an upper surface as a placement surface for placing a plate-shaped sample and has an internal electrode for electrostatic attraction built therein; and a cooling base part that cools the electrostatic chuck part. The electrostatic chuck part and the cooling base part are integrally adhered to each other via an adhesive layer. An insulator having a double pipe structure including an insulator and an insulator provided coaxially with an outer peripheral portion of the insulator is provided in a cooling gas hole, formed in the electrostatic chuck part and the cooling base part, so as to cover an exposed surface of the adhesive layer on the cooling gas hole side.

Abstract translation: 静电吸盘装置包括具有作为放置板状样品的放置面的上表面并具有内置静电吸引用内部电极的静电吸盘部， 以及冷却静电卡盘部的冷却基部。 静电吸盘部和冷却基部通过粘合层一体地粘接。 具有双管结构的绝缘体包括绝缘体和与绝缘体的外周部同轴设置的绝缘体，设置在形成在静电卡盘部和冷却基部中的冷却气体孔中，以覆盖暴露表面 的冷却气体孔侧的粘合剂层。

公开(公告)号：US20140376148A1

公开(公告)日：2014-12-25

申请号：US14374536

申请日：2013-02-06

Applicant: Tokyo Electron Limited ,  Sumitomo Osaka Cement Co., Ltd.

Inventor： Yasuharu Sasaki ,  Kaoru Oohashi ,  Tomoyuki Takahashi ,  Tadashi Aoto ,  Mamoru Kosakai ,  Shinichi Maeta ,  Yukio Miura ,  Takashi Sato ,  Kei Furuuchi

IPC: H01L21/683

CPC classification number: H01L21/6833 ,  B23Q3/15 ,  H01L21/67109 ,  H01L21/6831

Abstract: An electrostatic chuck device includes an electrostatic chuck part that has an upper surface as a placement surface for placing a plate-shaped sample and has an internal electrode for electrostatic attraction built therein; and a cooling base part that cools the electrostatic chuck part. The electrostatic chuck part and the cooling base part are integrally adhered to each other via an adhesive layer. An insulator having a double pipe structure including an insulator and an insulator provided coaxially with an outer peripheral portion of the insulator is provided in a cooling gas hole, formed in the electrostatic chuck part and the cooling base part, so as to cover an exposed surface of the adhesive layer on the cooling gas hole side.

Abstract translation: 静电吸盘装置包括具有作为放置板状样品的放置面的上表面并具有内置静电吸引用内部电极的静电吸盘部， 以及冷却静电卡盘部的冷却基部。 静电吸盘部和冷却基部通过粘合层一体地粘接。 具有双管结构的绝缘体包括绝缘体和与绝缘体的外周部同轴设置的绝缘体，设置在形成在静电卡盘部和冷却基部中的冷却气体孔中，以覆盖暴露表面 的冷却气体孔侧的粘合剂层。

公开(公告)号：US20130265690A1

公开(公告)日：2013-10-10

申请号：US13718071

申请日：2012-12-18

Applicant: SUMITOMO OSAKA CEMENT CO., LTD.

Inventor： Shinichi Maeta ,  Yoshiaki Moriya ,  Kei Furuuchi

IPC: H01L21/683

CPC classification number: H01L21/6831 ,  H01L21/67248

Abstract: An electrostatic chuck apparatus is disclosed which can be prevented from being damaged or fractured when the temperature abruptly increases or decreases when plasma is irradiated on a plate-like specimen, the heater is heated, or the like, and can also prevent corrosion when a corrosive gas or plasma is provided. The electrostatic chuck apparatus has an electrostatic chuck portion 2 having a mounting plate 11 made of a corrosion-resistant ceramic, a supporting plate 12 which is integrated with the mounting plate 11 so as to support the mounting plate 11 and is made of an insulating ceramic having a larger thermal conductivity than the thermal conductivity of the corrosion-resistant ceramic, and an internal electrode for electrostatic adsorption 13 provided between the mounting plate 11 and the supporting plate 12; and a temperature-controlling base portion 3 which adjusts the electrostatic chuck portion 2 to a desired temperature.

Abstract translation: 公开了一种静电吸盘装置，当等离子体照射在板状样品，加热器等上时，当温度突然增加或降低时，可以防止其损坏或断裂，并且还可以防止腐蚀时的腐蚀 提供气体或等离子体。 静电吸盘装置具有静电吸盘部2，该静电卡盘部2具有由耐腐蚀陶瓷构成的安装板11，与安装板11一体形成的支撑板12，以支撑安装板11，并由绝缘陶瓷 具有比耐腐蚀陶瓷的热导率大的热导率和设置在安装板11和支撑板12之间的用于静电吸附的内部电极13; 以及将静电吸盘部2调整到期望温度的温度控制基部3。

公开(公告)号：US11012008B2

公开(公告)日：2021-05-18

申请号：US16954989

申请日：2019-11-11

Applicant: SUMITOMO OSAKA CEMENT CO., LTD.

Inventor： Shinichi Maeta

IPC: H02N13/00 ,  H01L21/683

Abstract: According to an electrostatic chuck device of the present invention, a cross-sectional shape of a base body in a thickness direction is a convex curved surface or a concave curved surface that gradually curves from a center of one main surface toward an outer periphery of the one main surface, an annular projection portion is provided on a peripheral portion on the one main surface of the base body so as to go around the peripheral portion, a plurality of convex projection portions are provided in a region surrounded by the annular projection portion, the convex projection portion has the top surface in contact with the plate-shaped sample, a side surface, and an R surface continuously connecting the top surface and the side surface.

公开(公告)号：US10475688B2

公开(公告)日：2019-11-12

申请号：US15550205

申请日：2016-02-03

Applicant: SUMITOMO OSAKA CEMENT CO., LTD.

Inventor： Kazunori Ishimura ,  Kazuto Ando ,  Kentaro Takahashi ,  Yuhki Kinpara ,  Shinichi Maeta ,  Mamoru Kosakai

IPC: H01L21/683 ,  H01L21/67 ,  H01L21/687

Abstract: An electrostatic chuck part of an electrostatic chuck device has an electrostatic chuck part inner peripheral surface surrounding an opening of a chuck part through-hole, and an electrostatic chuck part outer peripheral surface surrounding the electrostatic chuck part inner peripheral surface. An insulator has an insulator main body in which an insulator through-hole having an opening on the electrostatic chuck part side is formed, an insulator inner end face, and an insulator outer end face which faces the electrostatic chuck part outer peripheral surface. The insulator inner end face and the electrostatic chuck part inner peripheral surface are in contact with each other, or an adhesion layer or a plasma-resistant adhesive layer extends in a gap between the insulator inner end face and the electrostatic chuck part inner peripheral surface. The plasma-resistant adhesive layer is formed between the electrostatic chuck part outer peripheral surface and the insulator outer end face.

公开(公告)号：US09287156B2

公开(公告)日：2016-03-15

申请号：US14155591

申请日：2014-01-15

Applicant: Sumitomo Osaka Cement Co., Ltd.

Inventor： Yoshiaki Moriya ,  Yukio Miura ,  Shinichi Maeta

IPC: H01L21/683 ,  H01L21/67

CPC classification number: H01L21/6833 ,  H01L21/67103

Abstract: The electrostatic chucking device 1 of the invention includes an electrostatic chucking portion 2 which includes a plate-like body 11, a top surface 11a of which is used as a mounting surface that mounts a plate-like specimen W, an electrostatic adsorption electrode 12 provided in the plate-like body 11 and a power-feeding terminal 13 that applies a direct-current voltage to the electrostatic adsorption electrode 12; and a base portion 31 that supports the electrostatic chucking portion 2, in which the plate-like body 11 is a corrosion-resistant ceramic, a circular insulation member 21 is provided in a circumferential edge portion between the electrostatic chucking portion 2 and the base portion 31, and a heat radiation plate 34 is provided on the top surface 31a of the base portion 31.

Abstract translation: 本发明的静电吸附装置1包括静电吸附部分2，其包括板状体11，其顶表面11a用作安装板状样本W的安装表面，设置有静电吸附电极12 在板状体11和向静电吸附电极12施加直流电压的供电端子13; 以及支撑静电吸附部2的基部31，其中板状体11是耐腐蚀陶瓷，在静电吸附部2和基部之间的周缘部设置有圆形绝缘部件21 31，在基部31的顶面31a上设有散热板34。

公开(公告)号：US20140355169A1

公开(公告)日：2014-12-04

申请号：US14286898

申请日：2014-05-23

Applicant: SUMITOMO OSAKA CEMENT CO., LTD.

Inventor： Shinichi Maeta ,  Mamoru Kosakai ,  Yukio Miura ,  Takeshi Otsuka

IPC: H01L21/683

CPC classification number: H01L21/6831 ,  G03F7/707 ,  G03F7/70708 ,  H01J37/32715 ,  H01L21/67109 ,  H01L21/68735 ,  H01L21/6875

Abstract: An electrostatic chuck device is provided in which there is no concern that a plate-shaped sample may be deformed when adsorbing the plate-shaped sample or when detaching the plate-shaped sample, the temperature of the plate-shaped sample is uniformized, and particles are not easily produced.In an electrostatic chuck device 1 provided with an electrostatic chuck section 2 which has a placement plate 11, an upper surface 11a of which is a placement surface on which a plate-shaped sample W such as a semiconductor wafer is placed, a support plate 12 integrated with the placement plate 11, and an internal electrode for electrostatic adsorption 13 and an insulating material layer 14 which are provided between the placement plate 11 and the support plate 12, an annular projection portion 21 is provided at a peripheral border portion on the upper surface 11a, a plurality of projection portions 22 having the same height as the height of the annular projection portion 21 are provided in an area surrounded by the annular projection portion 21 of the upper surface 11a, and an upper end portion of the annular projection portion 21 and an upper end portion of each of the plurality of projection portions 22 are located on a concave surface 23 with a central portion of the upper surface 11a as a basal plane.

Abstract translation: 提供了一种静电卡盘装置，其中不考虑板状样品在吸附板状样品时可能变形，或者当分离板状样品时，板状样品的温度均匀化，颗粒的颗粒 不容易生产。 在设置有具有放置板11的静电卡盘部2的静电卡盘装置1中，其上表面11a是放置有诸如半导体晶片的板状样品W的放置表面，支撑板12 与放置板11和设置在放置板11和支撑板12之间的静电吸附用内部电极13和绝缘材料层14一体化的环状突起部21设置在上部的周边边界部 表面11a，在由上表面11a的环形突出部分21围绕的区域中设置有与环形突出部分21的高度相同高度的多个突出部分22，并且环形突起部分的上端部分 21，并且多个突出部22中的每一个的上端部位于凹面23上，上表面的中心部分 11a作为基础飞机。