公开(公告)号：US20250027875A1

公开(公告)日：2025-01-23

申请号：US18775796

申请日：2024-07-17

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Jinwoo Lee ,  Seungryeol Oh ,  Hidong Kwak ,  Jeongho Ahn ,  Seongsil Lee ,  Suyoung Lee ,  Hyeongcheol Lee

IPC: G01N21/31

Abstract: An optical imaging device includes a pulse generator including a pulse generating device configured to generate pulse lasers and a pulse expander configured to receive a pulse laser from the pulse generating device, and generate a broadened pulse laser by expanding a spectrum and width of the received pulse laser, an optical assembly including an objective lens configured to receive the broadened pulse laser and pass the received broadened pulse laser to a target object, and a light receiver including a light receiving device configured to receive a reflected pulse laser corresponding to the broadened pulse laser reflected from the target object and convert the reflected pulse laser into an electrical signal, and at least one processor configured to generate a spectral image set based on the electrical signal generated by the light receiving device.

公开(公告)号：US20210396510A1

公开(公告)日：2021-12-23

申请号：US17156049

申请日：2021-01-22

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Kwangsoo Kim ,  Sungyoon Ryu ,  Daejun Park ,  Seong Yun ,  Seungryeol Oh ,  Sujin Lee ,  Jaeyong Lee ,  Minho Rim ,  Chungsam Jun ,  Myungjun Lee

IPC: G01B11/02 ,  G01Q60/24 ,  G03F7/20

Abstract: Provided is a through-focus image-based metrology device including an optical device, and a computing device configured to acquire at least one through-focus image of a target from the optical device, generate an intensity profile based on the acquired at least one through-focus image, and perform metrology on the target based on the generated intensity profile, wherein the optical device includes a stage on which the target is disposed, the stage being configured to move by one step in at least one direction based on control of the computing device, and to acquire the at least one through-focus image, an image sensor disposed on the stage, an objective lens disposed between the image sensor and the stage, the objective lens being configured to transmit reflected light from the target, and a light source configured to emit illumination light to the target through the objective lens.

公开(公告)号：US20240272089A1

公开(公告)日：2024-08-15

申请号：US18411816

申请日：2024-01-12

Applicant: Samsung Electronics Co., Ltd.

Inventor： Minsu Kim ,  Seungryeol Oh ,  Jeongho Ahn

IPC: G01N21/956 ,  G01N21/25 ,  G01N21/55 ,  G01N21/88

CPC classification number: G01N21/956 ,  G01N21/255 ,  G01N2021/555 ,  G01N2021/8835 ,  G01N2201/068 ,  G01N2201/127

Abstract: A defect inspection device includes a stage on which a substrate is provided, an objective lens disposed above the stage to project light onto the substrate, a light source configured to emit light onto a main surface of the substrate via the objective lens, a light quantity measurement sensor disposed above the stage and configured to measure an amount of the light that is reflected from a first region of the main surface of the substrate, a light quantity regulator located between the light source and the objective lens and configured to regulate an amount of the light that is emitted from the light source onto the main surface of the substrate.

公开(公告)号：US11988495B2

公开(公告)日：2024-05-21

申请号：US17156049

申请日：2021-01-22

Applicant: SAMSUNG ELECTRONICS CO., LTD.

Inventor： Kwangsoo Kim ,  Sungyoon Ryu ,  Daejun Park ,  Seong Yun ,  Seungryeol Oh ,  Sujin Lee ,  Jaeyong Lee ,  Minho Rim ,  Chungsam Jun ,  Myungjun Lee

IPC: G01B11/02 ,  G01N21/88 ,  G03F7/00

CPC classification number: G01B11/02 ,  G01N21/8806 ,  G01N21/8851 ,  G03F7/70625 ,  G03F7/7065 ,  G01B2210/56 ,  G01N2021/8887

Abstract: Provided is a through-focus image-based metrology device including an optical device, and a computing device configured to acquire at least one through-focus image of a target from the optical device, generate an intensity profile based on the acquired at least one through-focus image, and perform metrology on the target based on the generated intensity profile, wherein the optical device includes a stage on which the target is disposed, the stage being configured to move by one step in at least one direction based on control of the computing device, and to acquire the at least one through-focus image, an image sensor disposed on the stage, an objective lens disposed between the image sensor and the stage, the objective lens being configured to transmit reflected light from the target, and a light source configured to emit illumination light to the target through the objective lens.

公开(公告)号：US20240019380A1

公开(公告)日：2024-01-18

申请号：US18219494

申请日：2023-07-07

Applicant: Samsung Electronics Co., Ltd.

Inventor： Kihong Chung ,  Kiwook Song ,  Seungryeol Oh ,  Chungsam Jun

IPC: G01N21/95 ,  G01N21/29 ,  G01N21/21 ,  G01N23/2251 ,  G01B15/02 ,  G01N21/88

CPC classification number: G01N21/9501 ,  G01N21/29 ,  G01N21/211 ,  G01N23/2251 ,  G01B15/02 ,  G01N21/8851 ,  G01B2210/56 ,  G01N2223/6116 ,  G01N2021/213 ,  G01N2021/8864 ,  H01L22/12

Abstract: A substrate inspection method includes radiating light onto a substrate, extracting a spectrum representing an intensity of light according to a wavelength from a light reflected from the substrate, analyzing the extracted spectrum in units of each of an entire substrate, a shot, a chip, and a block, generating a spectrum distribution map indicating reflectivity for each wavelength band by using the analyzed spectrum, and extracting a weak point in the substrate based on the spectrum distribution map.