公开(公告)号：US11932947B2

公开(公告)日：2024-03-19

申请号：US17005884

申请日：2020-08-28

Applicant: TECH MET, INC.

Inventor： Michael Vidra ,  Jordan Incerpi ,  Daniel Jon Schutzer

IPC: C23F1/26 ,  A61F2/30 ,  A61L31/02 ,  B82Y5/00 ,  B82Y30/00 ,  B82Y40/00

CPC classification number: C23F1/26 ,  A61F2/30767 ,  A61L31/022 ,  A61F2002/30925 ,  A61F2310/00029 ,  B82Y5/00 ,  B82Y30/00 ,  B82Y40/00

Abstract: Compositions and methods for etching an implantable device having a cobalt chrome surface are disclosed. The compositions generally include at least two mineral acids, iron (Fe), and certain component metals of the cobalt chrome to be etched. For example, when etching a cobalt chromium molybdenum alloy, the metals may include chromium (Cr), molybdenum (Mo), and optionally, cobalt (Co). The at least two mineral acids may include hydrochloric acid (HCl), nitric acid (HNO3), and hydrofluoric acid (HF). Alternatively, the composition may be an electrolyte composition useful for electrochemical etching of the implantable device. These compositions and methods may generate nanoscale geometry on the surface of the implantable device to provide implants with improved osseointegration, biocompatibility, and healing after surgery.

公开(公告)号：US20210062347A1

公开(公告)日：2021-03-04

申请号：US17005884

申请日：2020-08-28

Applicant: TECH MET, INC.

Inventor： Michael Vidra ,  Jordan Incerpi ,  Daniel Jon Schutzer

IPC: C23F1/26 ,  A61F2/30 ,  A61L31/02

Abstract: Compositions and methods for etching an implantable device having a cobalt chrome surface are disclosed. The compositions generally include at least two mineral acids, iron (Fe), and certain component metals of the cobalt chrome to be etched. For example, when etching a cobalt chromium molybdenum alloy, the metals may include chromium (Cr), molybdenum (Mo), and optionally, cobalt (Co). The at least two mineral acids may include hydrochloric acid (HCl), nitric acid (HNO3), and hydrofluoric acid (HF). Alternatively, the composition may be an electrolyte composition useful for electrochemical etching of the implantable device. These compositions and methods may generate nanoscale geometry on the surface of the implantable device to provide implants with improved osseointegration, biocompatibility, and healing after surgery.

公开(公告)号：US20240254390A1

公开(公告)日：2024-08-01

申请号：US18628784

申请日：2024-04-07

Applicant: Tech Met, Inc.

Inventor： Michael Vidra ,  Edward Palanko ,  Robert Vaccaro ,  Jordan Incerpi

IPC: C09K13/00 ,  A61L27/06 ,  C23F1/02 ,  C23F1/26 ,  C23F1/38

CPC classification number: C09K13/00 ,  A61L27/06 ,  C23F1/02 ,  C23F1/26 ,  C23F1/38 ,  A61L2430/02

Abstract: Compositions and methods for etching a surface of an implantable device are disclosed. The compositions generally include one or more alkali components, such as a metal hydroxide and optionally an amine, one or more chelating agents, and certain dissolved metals, such as component metals of the metal or alloy to be etched and optionally iron. For example, when etching a titanium device, the metals may include titanium (Ti). Alternatively, the composition may be an electrolyte composition useful for electrochemical etching of the implantable device. These compositions and methods may generate nanoscale geometry on the surface of the implantable device to provide implants with accelerate osseointegration and healing after surgery.

公开(公告)号：US20220017822A1

公开(公告)日：2022-01-20

申请号：US17488093

申请日：2021-09-28

Applicant: TECH MET, INC.

Inventor： Michael Vidra ,  Edward Palanko ,  Robert Vaccaro ,  Jordan Incerpi

IPC: C09K13/00 ,  A61L27/06 ,  C23F1/02 ,  C23F1/26 ,  C23F1/38

Abstract: Compositions and methods for etching a surface of an implantable device are disclosed. The compositions generally include one or more alkali components, such as a metal hydroxide and optionally an amine, one or more chelating agents, and certain dissolved metals, such as component metals of the metal or alloy to be etched and optionally iron. For example, when etching a titanium device, the metals may include titanium (Ti). Alternatively, the composition may be an electrolyte composition useful for electrochemical etching of the implantable device. These compositions and methods may generate nanoscale geometry on the surface of the implantable device to provide implants with accelerate osseointegration and healing after surgery.

公开(公告)号：US11952669B2

公开(公告)日：2024-04-09

申请号：US17525203

申请日：2021-11-12

Applicant: TECH MET, INC.

Inventor： Michael Vidra ,  Daniel Jon Schutzer ,  Jordan Incerpi

IPC: C23F1/28 ,  A61L27/04 ,  A61L27/06 ,  A61L27/36 ,  A61L27/50 ,  C23F1/30

CPC classification number: C23F1/28 ,  A61L27/042 ,  A61L27/047 ,  A61L27/06 ,  A61L27/365 ,  A61L27/50 ,  C23F1/30

Abstract: Compositions and methods for etching a nanoscale geometry on a metal or metal alloy surface are disclosed. Such surfaces, when included on an implantable medical device, enhance healing after surgery. When included on a bone contacting medical implant, the nanoscale geometry may enhance osseointegration. When included on a tissue contacting device, the nanoscale geometry may enhance endothelial cell attachment, proliferation, and restoration of a healthy endothelial surface.

公开(公告)号：US11952523B2

公开(公告)日：2024-04-09

申请号：US17488093

申请日：2021-09-28

Applicant: TECH MET, INC.

Inventor： Michael Vidra ,  Edward Palanko ,  Robert Vaccaro ,  Jordan Incerpi

IPC: C09K13/00 ,  A61L27/06 ,  C23F1/02 ,  C23F1/26 ,  C23F1/38

CPC classification number: C09K13/00 ,  A61L27/06 ,  C23F1/02 ,  C23F1/26 ,  C23F1/38 ,  A61L2430/02

Abstract: Compositions and methods for etching a surface of an implantable device are disclosed. The compositions generally include one or more alkali components, such as a metal hydroxide and optionally an amine, one or more chelating agents, and certain dissolved metals, such as component metals of the metal or alloy to be etched and optionally iron. For example, when etching a titanium device, the metals may include titanium (Ti). Alternatively, the composition may be an electrolyte composition useful for electrochemical etching of the implantable device. These compositions and methods may generate nanoscale geometry on the surface of the implantable device to provide implants with accelerate osseointegration and healing after surgery.

公开(公告)号：US11851772B2

公开(公告)日：2023-12-26

申请号：US15930484

申请日：2020-05-13

Applicant: TECH MET, INC.

Inventor： Michael Vidra ,  Edward Palanko ,  Robert Vaccaro ,  Jordan Incerpi

IPC: C23F1/40 ,  A61L31/02 ,  A61L27/06 ,  A61L27/36 ,  C09K13/02

CPC classification number: C23F1/40 ,  A61L27/06 ,  A61L27/365 ,  A61L31/022 ,  C09K13/02

Abstract: Compositions and methods for etching a surface of an implantable device are disclosed. The compositions generally include one or more alkali components, such as a metal hydroxide and an amine, one or more chelating agents, and optionally iron (Fe) and/or certain component metals of the metal or alloy to be etched. For example, when etching a titanium device, the metals may include titanium (Ti). Alternatively, the composition may be an electrolyte composition useful for electrochemical etching of the implantable device. These compositions and methods may generate nanoscale geometry on the surface of the implantable device to provide implants with accelerate osseointegration and healing after surgery.

公开(公告)号：US20220145474A1

公开(公告)日：2022-05-12

申请号：US17525203

申请日：2021-11-12

Applicant: TECH MET, INC.

Inventor： Michael Vidra ,  Daniel Jon Schutzer ,  Jordan Incerpi

IPC: C23F1/28 ,  A61L27/04 ,  A61L27/36 ,  A61L27/50 ,  C23F1/30 ,  A61L27/06

Abstract: Compositions and methods for etching a nanoscale geometry on a metal or metal alloy surface are disclosed. Such surfaces, when included on an implantable medical device, enhance healing after surgery. When included on a bone contacting medical implant, the nanoscale geometry may enhance osseointegration. When included on a tissue contacting device, the nanoscale geometry may enhance endothelial cell attachment, proliferation, and restoration of a healthy endothelial surface.