公开(公告)号：US12243716B2

公开(公告)日：2025-03-04

申请号：US17584781

申请日：2022-01-26

Applicant: Tokyo Electron Limited

Inventor： Taro Ikeda ,  Toshifumi Kitahara

IPC: H01J37/32

Abstract: A plasma processing apparatus includes: a coaxial tube that extends in a vertical direction and forms a portion of a radio frequency waveguide; a substrate support configured to support a substrate; an electrode including a gas flow path connected to a gas ejection port opened toward a space above the substrate support, wherein the electrode is provided above the substrate support and an inner conductor of the coaxial tube is connected to a center of the electrode; an enlarged diameter portion forming a part of the radio frequency waveguide together with the electrode and connected to an outer conductor of the coaxial tube; and dielectric tubes formed of a dielectric material, wherein each of the dielectric tubes is connected to the electrode and penetrates a space between the electrode and the enlarged diameter portion to supply a gas to the electrode, wherein the dielectric tubes is scatteredly provided.

公开(公告)号：US12046455B2

公开(公告)日：2024-07-23

申请号：US16984778

申请日：2020-08-04

Applicant: TOKYO ELECTRON LIMITED

Inventor： Satoru Kawakami ,  Atsushi Kubo ,  Taro Ikeda

IPC: C23C16/00 ,  H01J37/32 ,  H01L21/00 ,  H01L21/67

CPC classification number: H01J37/32449 ,  H01J37/32082 ,  H01J37/32541 ,  H01J37/3255 ,  H01L21/67069

Abstract: A shower plate includes a plate-shaped dielectric main body having gas holes, and a plurality of sealed areas formed in the dielectric main body. Each of the sealed areas has a permittivity lower than a permittivity of the dielectric main body. A volume density of the sealed areas at a central region of the dielectric main body is higher than a volume density of the sealed areas at a peripheral region of the dielectric main body.

公开(公告)号：US11929234B2

公开(公告)日：2024-03-12

申请号：US17299483

申请日：2019-11-26

Applicant: TOKYO ELECTRON LIMITED ,  TOHOKU UNIVERSITY

Inventor： Taro Ikeda ,  Sumi Tanaka ,  Satoru Kawakami ,  Masaki Hirayama

IPC: H01J37/32

CPC classification number: H01J37/32155 ,  H01J37/32541 ,  H01J37/32568 ,  H01J37/32724

Abstract: A plasma processing apparatus capable of improving the in-plane uniformity of plasma and a lower stage used for the plasma processing apparatus are anticipated. In an exemplary embodiment, the lower stage is for a lower stage that generates plasma with an upper electrode. The lower stage includes: a lower dielectric body formed of ceramic, a lower electrode embedded in the lower dielectric body, and a heating element embedded in the lower dielectric body. The separation distance between the top surface of the lower dielectric body at the outer edge position thereof and the lower electrode is smaller than the separation distance between the top surface of the lower dielectric body in the central region thereof and the lower electrode. The lower electrode has an inclination region inclined with respect to the top surface between the outer edge position and the central region.

公开(公告)号：US11923170B2

公开(公告)日：2024-03-05

申请号：US17311183

申请日：2019-11-26

Applicant: TOKYO ELECTRON LIMITED ,  TOHOKU UNIVERSITY

Inventor： Satoru Kawakami ,  Hiroyuki Yamamoto ,  Taro Ikeda ,  Masaki Hirayama

IPC: C23F1/08 ,  H01J37/32

CPC classification number: H01J37/32082 ,  H01J37/32449 ,  H01J37/32559 ,  H01J37/32568 ,  H01J37/32577 ,  H01J37/32651

Abstract: The plasma processing apparatus according to an exemplary embodiment includes a processing container, a stage, an upper electrode, a dielectric plate, and a waveguide. The stage is provided in the processing container. The dielectric plate is provided above the stage with a space in the processing container interposed therebetween. The upper electrode is provided above the dielectric plate. The waveguide has an end and guides high frequency waves in a VHF band or a UHF band. The end is arranged to face the space to radiate high frequency waves to the space. The dielectric plate includes a conductive film. The conductive film is provided on an upper surface of the dielectric plate. The upper surface faces the upper electrode. The conductive film is electrically connected to the upper electrode.

公开(公告)号：US11908663B2

公开(公告)日：2024-02-20

申请号：US17299430

申请日：2019-11-26

Applicant: Tokyo Electron Limited

Inventor： Taro Ikeda ,  Toshifumi Kitahara

IPC: H01J37/32

CPC classification number: H01J37/32568 ,  H01J37/32082 ,  H01J37/32449

Abstract: Provided is a plasma processing apparatus capable of suppressing abnormal discharge. The plasma processing apparatus includes: an upper electrode and a lower electrode which are disposed inside a processing container so as to face each other inside the processing container; and a dielectric shower for gas introduction disposed below the upper electrode, wherein the plasma processing apparatus generates plasma in a space between the upper electrode and the lower electrode. The upper electrode includes: at least one slot configured to introduce VHF waves into the processing container; and a gas flow path provided independently of the at least one slot and in communication with the dielectric shower.

公开(公告)号：US11887825B2

公开(公告)日：2024-01-30

申请号：US17076463

申请日：2020-10-21

Applicant: Tokyo Electron Limited

Inventor： Mikio Sato ,  Eiki Kamata ,  Taro Ikeda

IPC: H01L21/26 ,  H01J37/32 ,  H01L21/67 ,  C23C16/50 ,  C23C16/52 ,  H01L21/66

CPC classification number: H01J37/32972 ,  C23C16/50 ,  C23C16/52 ,  H01J37/3222 ,  H01L21/67069 ,  H01L21/67253 ,  H01L22/26 ,  H01J2237/332 ,  H01J2237/334

Abstract: A method of controlling a scanning-type plasma processing apparatus using a phased array antenna, includes observing light emission of plasma generated inside a processing container through observation windows provided at multiple positions in the processing container, calculating an in-plane distribution of values representing characteristics of the plasma on a substrate, based on data on the observed light emission of the plasma, and correcting a scanning pattern and/or a plasma density distribution of the plasma based on the calculated in-plane distribution of the values representing the characteristics of the plasma on the substrate.

公开(公告)号：US11600475B2

公开(公告)日：2023-03-07

申请号：US16942145

申请日：2020-07-29

Applicant: TOKYO ELECTRON LIMITED

Inventor： Taro Ikeda ,  Mikio Sato ,  Eiki Kamata

IPC: H01J37/32

Abstract: A plasma processing apparatus includes a main container, one or more radio frequency antennas, a plurality of metal windows, and a plasma detector. The one or more radio frequency antennas are configured to generate inductively coupled plasma in a plasma generation region in the main container. The metal windows are disposed between the plasma generation region and the radio frequency antennas while being insulated from each other and from the main container. Further, a plasma detector is connected to each of the metal windows and configured to detect a plasma state.

公开(公告)号：US11164730B2

公开(公告)日：2021-11-02

申请号：US16122226

申请日：2018-09-05

Applicant: TOKYO ELECTRON LIMITED

Inventor： Taro Ikeda ,  Tomohito Komatsu ,  Yuki Osada ,  Hiroyuki Miyashita ,  Susumu Saito ,  Kazuhiro Furuki ,  Mikio Sato ,  Eiki Kamata

IPC: H01J37/32

Abstract: A plasma probe device includes an antenna unit installed at an opening formed in a wall of a processing chamber or a mounting table through a sealing member configured to seal between a vacuum space and an atmospheric space, an electrode connected to the antenna unit, and a dielectric support portion made of a dielectric material and configured to support the antenna unit from an outer peripheral side. A surface of the antenna unit which is exposed through the opening and separated from a facing surface of the wall or the mounting table facing the antenna unit by a width is depressed from a surface of the wall or the mounting table where the opening is formed, which faces a plasma generation space.

公开(公告)号：US20210043426A1

公开(公告)日：2021-02-11

申请号：US16984778

申请日：2020-08-04

Applicant: TOKYO ELECTRON LIMITED

Inventor： Satoru Kawakami ,  Atsushi Kubo ,  Taro Ikeda

IPC: H01J37/32

Abstract: A shower plate includes a plate-shaped dielectric main body having gas holes, and a plurality of sealed areas formed in the dielectric main body. Each of the sealed areas has a permittivity lower than a permittivity of the dielectric main body. A volume density of the sealed areas at a central region of the dielectric main body is higher than a volume density of the sealed areas at a peripheral region of the dielectric main body.

公开(公告)号：US09704693B2

公开(公告)日：2017-07-11

申请号：US15166561

申请日：2016-05-27

Applicant: TOKYO ELECTRON LIMITED

Inventor： Taro Ikeda ,  Hiroyuki Miyashita

IPC: H01J37/32 ,  H01P5/12 ,  H01P1/18 ,  H03H7/40

CPC classification number: H01J37/3222 ,  H01J37/32266 ,  H01P1/18 ,  H01P5/12 ,  H03H7/40

Abstract: A power combiner includes a main body composed of outer and inner conductors, a plurality of power introduction ports configured to introduce electromagnetic wave powers supplied through power supply lines into the main body, a power combining antenna configured to radiate electromagnetic waves to a space between the outer and inner conductors such that the powers are combined, and an output port through which the combined electromagnetic wave is outputted from the main body. The power combining antenna includes a plurality of antenna members, each of which has a first pole and a second pole that is in contact with the inner conductor, and a reflection part configured to reflect the electromagnetic waves.