公开(公告)号：US20200290080A1

公开(公告)日：2020-09-17

申请号：US16768216

申请日：2018-12-07

Applicant: Tokyo Electron Limited

Inventor： Ryouichirou NAITOU ,  Masato HAYASHI ,  Hideo SHITE ,  Hiroyuki IDE ,  Yosuke KAMEDA ,  Seiya TOTSUKA ,  Atsumu MAITA ,  Takami SATOH ,  Hirofumi ARAKI ,  Kentaro YOSHIHARA

IPC: B05C19/06 ,  B05C11/10

Abstract: A solution supply apparatus for supplying a treatment solution to a treatment solution discharger configured to discharge the treatment solution to a treatment object, the solution supply apparatus includes: a supply pipe line connected to the treatment solution discharger; a filter provided on the supply pipe line and configured to filter the treatment solution to remove foreign substances; and a controller configured to perform a determination of a state of the treatment solution to be supplied to a primary side of the filter and, when the state of the treatment solution is determined to be bad, to output a control signal for restricting supply of the treatment solution to the primary side of the filter.