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公开(公告)号：US10065854B2
公开(公告)日：2018-09-04
申请号：US15154900
申请日：2016-05-13
Applicant: uBeam Inc.
Inventor： Andrew Joyce , Sean Taffler , Paul Reynolds , Nicholas Lavada Nemeth , Adam Stephen Elhadad , Boozarjomehr Faraji
Abstract: Systems and techniques are provided for membrane bonding. A photoresist may be applied to an ultrasonic device. A portion of the photoresist may be removed. A bonding agent may be applied a portion of the photoresist that is not removed. A membrane may be placed on the ultrasonic device such that the membrane is in contact with the ultrasonic device through the bonding agent and the photoresist. The membrane and the ultrasonic device may be placed in between a first flat plate and a second flat plate, such that the second flat plate rests on top of the membrane. Light pressure may be applied to the membrane. The light pressure may be applied by one or more of the weight of the second flat plate and a pressure providing device applying pressure to either or both of the first flat plate and the second flat plate.
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公开(公告)号：US10252908B2
公开(公告)日：2019-04-09
申请号：US15902570
申请日：2018-02-22
Applicant: UBEAM INC.
Inventor： Andrew Joyce , Sean Taffler , Paul Reynolds , Nicholas Lavada Nemeth , Adam Stephen Elhadad , Boozarjomehr Faraji
Abstract: Systems and techniques are provided for membrane bonding. A photoresist may be applied to an ultrasonic device. A portion of the photoresist may be removed. A bonding agent may be applied a portion of the photoresist that is not removed. A membrane may be placed on the ultrasonic device such that the membrane is in contact with the ultrasonic device through the bonding agent and the photoresist. The membrane and the ultrasonic device may be placed in between a first flat plate and a second flat plate, such that the second flat plate rests on top of the membrane. Light pressure may be applied to the membrane. The light pressure may be applied by one or more of the weight of the second flat plate and a pressure providing device applying pressure to either or both of the first flat plate and the second flat plate.
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公开(公告)号：US20180179053A1
公开(公告)日：2018-06-28
申请号：US15902570
申请日：2018-02-22
Applicant: UBEAM INC.
Inventor： Andrew Joyce , Sean Taffler , Paul Reynolds , Nicholas Lavada Nemeth , Adam Stephen Elhadad , Boozarjomehr Faraji
CPC classification number: B81C1/00182 , B81B2201/0271 , B81B2201/032 , B81B2203/0127 , B81C2203/032 , F16B11/006 , G03F7/00 , H01L21/00
Abstract: Systems and techniques are provided for membrane bonding. A photoresist may be applied to an ultrasonic device. A portion of the photoresist may be removed. A bonding agent may be applied a portion of the photoresist that is not removed. A membrane may be placed on the ultrasonic device such that the membrane is in contact with the ultrasonic device through the bonding agent and the photoresist. The membrane and the ultrasonic device may be placed in between a first flat plate and a second flat plate, such that the second flat plate rests on top of the membrane. Light pressure may be applied to the membrane. The light pressure may be applied by one or more of the weight of the second flat plate and a pressure providing device applying pressure to either or both of the first flat plate and the second flat plate.
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公开(公告)号：US20160340178A1
公开(公告)日：2016-11-24
申请号：US15154900
申请日：2016-05-13
Applicant: uBeam Inc.
Inventor： Andrew Joyce , Sean Taffler , Paul Reynolds , Nicholas Lavada Nemeth , Adam Stephen Elhadad , Boozarjomehr Faraji
CPC classification number: B81C1/00182 , B81B2201/0271 , B81B2201/032 , B81B2203/0127 , B81C2203/032 , F16B11/006 , G03F7/00 , H01L21/00
Abstract: Systems and techniques are provided for membrane bonding. A photoresist may be applied to an ultrasonic device. A portion of the photoresist may be removed. A bonding agent may be applied a portion of the photoresist that is not removed. A membrane may be placed on the ultrasonic device such that the membrane is in contact with the ultrasonic device through the bonding agent and the photoresist. The membrane and the ultrasonic device may be placed in between a first flat plate and a second flat plate, such that the second flat plate rests on top of the membrane. Light pressure may be applied to the membrane. The light pressure may be applied by one or more of the weight of the second flat plate and a pressure providing device applying pressure to either or both of the first flat plate and the second flat plate.
Abstract translation: 提供了用于膜结合的系统和技术。 可以将光致抗蚀剂施加到超声波装置。 光刻胶的一部分可以被去除。 粘合剂可以施加未被除去的光致抗蚀剂的一部分。 膜可以放置在超声波装置上，使得膜通过粘合剂和光致抗蚀剂与超声波装置接触。 膜和超声波装置可以放置在第一平板和第二平板之间，使得第二平板位于膜的顶部上。 可以对膜施加轻微的压力。 轻压力可以通过第二平板的一个或多个重量和对第一平板和第二平板中的任一个或两者施加压力的压力提供装置施加。
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