-
公开(公告)号：US11230057B2
公开(公告)日：2022-01-25
申请号：US15993197
申请日：2018-05-30
Applicant: University of Southern California
Inventor： Yong Chen , Yuanrui Li , Huachao Mao , Wei Wu
IPC: B29C64/268 , B29C64/393 , B29C64/277 , B29C64/245 , B29C67/04 , B33Y10/00 , B33Y30/00 , B23K26/067 , B29C64/286 , B29C64/129 , B33Y50/02
Abstract: Methods, systems, and apparatus for multi-scale stereolithography. The apparatus includes a light source for providing a laser beam having a first shape and a first size. The apparatus includes a dynamic aperture having multiple apertures that are of the same or different sizes or shapes. The dynamic aperture is configured to receive the laser beam and modify at least one of the shape or the size of the laser beam. The apparatus includes a platform for holding an object to be printed. The apparatus includes a processor connected to at least one of the light source, the dynamic aperture or the platform. The processor is configured to move the platform to direct the laser beam or direct the laser beam to cure resin onto the object to be printed using a first aperture of the multiple apertures to form the object.
-
公开(公告)号：US20220118703A1
公开(公告)日：2022-04-21
申请号：US17566112
申请日：2021-12-30
Applicant: UNIVERSITY OF SOUTHERN CALIFORNIA
Inventor： Yong Chen , Yuanrui Li , Huachao Mao , Wei Wu
IPC: B29C64/268 , B29C64/393 , B29C64/277 , B29C64/245 , B29C67/04 , B33Y10/00 , B33Y30/00 , B23K26/067 , B29C64/286 , B29C64/129
Abstract: Methods, systems, and apparatus for multi-scale stereolithography. The apparatus includes a light source for providing a laser beam having a first shape and a first size. The apparatus includes a dynamic aperture having multiple apertures that are of the same or different sizes or shapes. The dynamic aperture is configured to receive the laser beam and modify at least one of the shape or the size of the laser beam. The apparatus includes a platform for holding an object to be printed. The apparatus includes a processor connected to at least one of the light source, the dynamic aperture or the platform. The processor is configured to move the platform to direct the laser beam or direct the laser beam to cure resin onto the object to be printed using a first aperture of the multiple apertures to form the object.
-
公开(公告)号：US10688771B2
公开(公告)日：2020-06-23
申请号：US15498381
申请日：2017-04-26
Applicant: University of Southern California
Inventor： Yong Chen , Yuanrui Li , Huachao Mao , Wei Wu
IPC: G02B27/42 , G02B27/09 , G02B26/10 , B33Y10/00 , B33Y30/00 , B29C67/00 , B29C64/277 , B29C64/135 , B29C64/386 , G02B5/00 , G02B5/22
Abstract: A three-dimensional printing approach based on stereolithography with variable printing resolutions to solve the trade-off between throughput and resolution. In this technology, the variable fabrication resolutions are achieved by switching light wavelength. The apparatus includes an optical filter based on high-contrast gratings. In one embodiment, the minimum printing resolution of the accordingly constructed stereolithography apparatus is reduced to 37 μm.
-
公开(公告)号：US20170307902A1
公开(公告)日：2017-10-26
申请号：US15498381
申请日：2017-04-26
Applicant: University of Southern California
Inventor： Yong Chen , Yuanrui Li , Huachao Mao , Wei Wu
CPC classification number: B33Y30/00 , B29C64/135 , B29C64/277 , B29C64/386 , B33Y10/00 , G02B5/005 , G02B5/22 , G02B26/101 , G02B27/0988
Abstract: A three-dimensional printing approach based on stereolithography with variable printing resolutions to solve the trade-off between throughput and resolution. In this technology, the variable fabrication resolutions are achieved by switching light wavelength. The apparatus includes an optical filter based on high-contrast gratings. In one embodiment, the minimum printing resolution of the accordingly constructed stereolithography apparatus is reduced to 37 μm.
-
-
-
Search Results
4
records
(took 0.014 seconds)
