公开(公告)号：US3753022A

公开(公告)日：1973-08-14

申请号：US3753022D

申请日：1971-04-26

Applicant: US ARMY

Inventor： FRASER D

IPC: H01J1/304 ,  H01J3/02 ,  H01J29/74 ,  H01J1/90

CPC classification number: H01J3/022 ,  H01J1/3042 ,  H01J3/027

Abstract: A miniature, directed, electron-beam source, consisting of a conventional field emission source with an associated first anode plate, and several deposited layers of alumina and molybdenum for focusing and deflecting the electron beam, the deposited layers having a column etched through them to the field emission source.

Abstract translation: 由具有相关联的第一阳极板的常规场发射源和用于聚焦和偏转电子束的多个氧化铝和钼沉积层组成的微型定向电子束源，沉积层具有通过它们蚀刻的柱， 场发射源。