公开(公告)号：US09783888B2

公开(公告)日：2017-10-10

申请号：US14957273

申请日：2015-12-02

Applicant: Ultratech, Inc.

Inventor： Michael J. Sershen ,  Ganesh M. Sundaram ,  Roger R. Coutu ,  Jill Svenja Becker ,  Mark J. Dalberth

IPC: C23C16/00 ,  C23C16/455 ,  C23C16/54 ,  C23C16/453 ,  C23C16/458 ,  C23C16/44

CPC classification number: C23C16/45574 ,  C23C16/4412 ,  C23C16/453 ,  C23C16/45544 ,  C23C16/45551 ,  C23C16/45557 ,  C23C16/4584 ,  C23C16/545

Abstract: An ALD coating method to provide a coating surface on a substrate is provided. The ALD coating method comprises: providing a deposition heading including a unit cell having a first precursor nozzle assembly and a second precursor nozzle assembly; emitting a first precursor from the first precursor nozzle assembly into chamber under atmospheric conditions in a direction substantially normal to the coating surface; emitting a second precursor from the first precursor nozzle assembly into chamber under atmospheric conditions in a direction substantially normal to the coating surface; removing moving the substrate under the deposition head such that the first precursor is directed onto a first area of the coating surface prior to the second precursor being directed onto the first area of the coating surface.

公开(公告)号：US20160115596A1

公开(公告)日：2016-04-28

申请号：US14957273

申请日：2015-12-02

Applicant: Ultratech, Inc.

Inventor： Michael J. Sershen ,  Ganesh M. Sundaram ,  Roger R. Coutu ,  Jill Svenja Becker ,  Mark J. Dalberth

IPC: C23C16/455 ,  C23C16/44

CPC classification number: C23C16/45574 ,  C23C16/4412 ,  C23C16/453 ,  C23C16/45544 ,  C23C16/45551 ,  C23C16/45557 ,  C23C16/4584 ,  C23C16/545

Abstract: An ALD coating method to provide a coating surface on a substrate is provided. The ALD coating method comprises: providing a deposition heading including a unit cell having a first precursor nozzle assembly and a second precursor nozzle assembly; emitting a first precursor from the first precursor nozzle assembly into chamber under atmospheric conditions in a direction substantially normal to the coating surface; emitting a second precursor from the first precursor nozzle assembly into chamber under atmospheric conditions in a direction substantially normal to the coating surface; removing moving the substrate under the deposition head such that the first precursor is directed onto a first area of the coating surface prior to the second precursor being directed onto the first area of the coating surface.

Abstract translation: 提供了一种在基板上提供涂层表面的ALD涂覆方法。 ALD涂覆方法包括：提供包括具有第一前体喷嘴组件和第二前体喷嘴组件的单元的沉积标题; 在大气条件下沿基本上垂直于涂层表面的方向将第一前体从第一前体喷嘴组件发射到室中; 在大气条件下沿基本上垂直于涂层表面的方向将第二前体从第一前体喷嘴组件发射到室中; 去除在沉积头下方移动衬底，使得第一前体在第二前体被引导到涂层表面的第一区域之前被引导到涂层表面的第一区域上。

公开(公告)号：US20150275363A1

公开(公告)日：2015-10-01

申请号：US14584034

申请日：2014-12-29

Applicant: Ultratech, Inc.

Inventor： Michael J. Sershen ,  Ganesh M. Sundaram ,  Roger R. Coutu ,  Jill Svenja Becker ,  Mark J. Dalberth

IPC: C23C16/455 ,  C23C16/453 ,  C23C16/458

CPC classification number: C23C16/45574 ,  C23C16/4412 ,  C23C16/453 ,  C23C16/45544 ,  C23C16/45551 ,  C23C16/45557 ,  C23C16/4584 ,  C23C16/545

Abstract: An ALD coating method to provide a coating surface on a substrate is provided. The ALD coating method comprises: providing a deposition heading including a unit cell having a first precursor nozzle assembly and a second precursor nozzle assembly; emitting a first precursor from the first precursor nozzle assembly into chamber under atmospheric conditions in a direction substantially normal to the coating surface; emitting a second precursor from the first precursor nozzle assembly into chamber under atmospheric conditions in a direction substantially normal to the coating surface; removing moving the substrate under the deposition head such that the first precursor is directed onto a first area of the coating surface prior to the second precursor being directed onto the first area of the coating surface.

Abstract translation: 提供了一种在基板上提供涂层表面的ALD涂覆方法。 ALD涂覆方法包括：提供包括具有第一前体喷嘴组件和第二前体喷嘴组件的单元的沉积标题; 在大气条件下沿基本上垂直于涂层表面的方向将第一前体从第一前体喷嘴组件发射到室中; 在大气条件下沿基本上垂直于涂层表面的方向将第二前体从第一前体喷嘴组件发射到室中; 去除在沉积头下方移动衬底，使得第一前体在第二前体被引导到涂层表面的第一区域之前被引导到涂层表面的第一区域上。

公开(公告)号：US09567670B2

公开(公告)日：2017-02-14

申请号：US14584034

申请日：2014-12-29

Applicant: Ultratech, Inc.

Inventor： Michael J. Sershen ,  Ganesh M. Sundaram ,  Roger R. Coutu ,  Jill Svenja Becker ,  Mark J. Dalberth

IPC: C23C16/00 ,  C23C16/455 ,  C23C16/54 ,  C23C16/453 ,  C23C16/458 ,  C23C16/44

CPC classification number: C23C16/45574 ,  C23C16/4412 ,  C23C16/453 ,  C23C16/45544 ,  C23C16/45551 ,  C23C16/45557 ,  C23C16/4584 ,  C23C16/545

Abstract: An ALD coating method to provide a coating surface on a substrate is provided. The ALD coating method comprises: providing a deposition heading including a unit cell having a first precursor nozzle assembly and a second precursor nozzle assembly; emitting a first precursor from the first precursor nozzle assembly into chamber under atmospheric conditions in a direction substantially normal to the coating surface; emitting a second precursor from the first precursor nozzle assembly into chamber under atmospheric conditions in a direction substantially normal to the coating surface; removing moving the substrate under the deposition head such that the first precursor is directed onto a first area of the coating surface prior to the second precursor being directed onto the first area of the coating surface.

Abstract translation: 提供了一种在基板上提供涂层表面的ALD涂覆方法。 ALD涂覆方法包括：提供包括具有第一前体喷嘴组件和第二前体喷嘴组件的单元的沉积标题; 在大气条件下沿基本上垂直于涂层表面的方向将第一前体从第一前体喷嘴组件发射到室中; 在大气条件下沿基本上垂直于涂层表面的方向将第二前体从第一前体喷嘴组件发射到室中; 去除在沉积头下方移动衬底，使得第一前体在第二前体被引导到涂层表面的第一区域之前被引导到涂层表面的第一区域上。

公开(公告)号：US20160002781A1

公开(公告)日：2016-01-07

申请号：US14853594

申请日：2015-09-14

Applicant: Ultratech, Inc.

Inventor： Roger R. Coutu ,  Jill S. Becker ,  Douwe Johannes Monsma

IPC: C23C16/455 ,  C23C16/44

CPC classification number: C23C16/45525 ,  C23C16/4401 ,  C23C16/4407 ,  C23C16/4412 ,  C23C16/45504 ,  C23C16/45582

Abstract: A reaction chamber assembly for thin film deposition processes or the like includes an outer wall assembly for enclosing an outer volume and a removable liner installed into the outer volume through an outer aperture for preventing precursors or reactants from coming into contact with internal surfaces of the outer wall assembly and forming thin film layers thereon. The removable liner encloses a reaction chamber and includes substrate support trays or the like for supporting substrates being coated. Thin film layers are formed onto internal surfaces of the removable liner instead of onto surfaces of the outer wall assembly. The removable liner may be disposable or may comprise stainless steel, which can be removed when contaminated, cleaned by abrasive blasting such as bead blasting, and replaced. Two removable liners can be used to periodically swap removable liners and clean one of the liners while the other is in service with minimal disruption to production coating schedules. Other removable cleanable elements such as input and output plenums, door liners and conduits comprising stainless steel can be periodically removed and cleaned by abrasive blasting.

Abstract translation: 用于薄膜沉积工艺等的反应室组件包括用于封闭外部容积的外壁组件和通过外部孔安装到外部容积中的可移除衬套，用于防止前体或反应物与外部的内表面接触 壁组装和在其上形成薄膜层。 可拆卸的衬垫包围反应室，并且包括用于支撑被涂覆的衬底的衬底支撑托盘等。 薄膜层形成在可拆卸内衬的内表面上，而不是形成在外壁组件的表面上。 可移除衬垫可以是一次性的，或者可以包括不锈钢，其可以在被污染时被去除，通过诸如珠粒喷砂的喷砂处理来清洁并被更换。 两个可拆卸的衬垫可用于周期性地切换可拆卸的衬垫，并清洁其中一个衬垫，而另一个可以使用，而对生产涂层计划的影响最小。 其他可移除的可清洁元件，例如输入和输出增压室，门衬套和包括不锈钢的管道可以通过喷砂周期性地去除和清洁。