公开(公告)号：US20230358605A1

公开(公告)日：2023-11-09

申请号：US17751684

申请日：2022-05-24

Applicant: United Microelectronics Corp.

Inventor： Sheng Lung Teng ,  Guo Xin Hu ,  Chih-Hsien Tang

IPC: G01J1/44

CPC classification number: G01J1/44 ,  G01J2001/4247

Abstract: A matching method of light source parameters includes the following. First light source parameter data of a first exposure machine and second light source parameter data of a second exposure machine corresponding to the first light source parameter data are collected. Whether a second light intensity distribution included in the second light source parameter data meets a first light intensity distribution included in the first light source parameter data is determined. If the second light intensity distribution meets the first light intensity distribution, a simulated exposure process is performed by using the first light source parameter data and the second light source parameter data. Second simulated exposure data obtained by using the second light source parameter data is compared with first simulated exposure data obtained by using the first light source parameter data to determine whether the second simulated exposure data meets the first simulated exposure data.