公开(公告)号：US12163899B2

公开(公告)日：2024-12-10

申请号：US18341339

申请日：2023-06-26

Applicant: Unity Semiconductor

Inventor： Mayeul Durand de Gevigney ,  Guillaume Vienne ,  Kaiss Benhadjsalem

IPC: G01N21/95 ,  G01N21/88

Abstract: A system for optical inspection of a substrate. The system comprises an illumination device defining an inspection area on the substrate, a support to receive the substrate, and a detection device defining a detection area on the substrate. The inspection area is positioned ahead, with respect to the scanning direction, of at least a portion of the detection area.

公开(公告)号：US20240068956A1

公开(公告)日：2024-02-29

申请号：US18341339

申请日：2023-06-26

Applicant: Unity Semiconductor

Inventor： Mayeul Durand de Gevigney ,  Guillaume Vienne ,  Kaiss Benhadjsalem

IPC: G01N21/95 ,  G01N21/88

CPC classification number: G01N21/9501 ,  G01N21/8806 ,  G01N2021/8845 ,  G01N2201/0846

Abstract: A system for optical inspection of a substrate. The system comprises an illumination device defining an inspection area on the substrate, a support to receive the substrate, and a detection device defining a detection area on the substrate. The inspection area is positioned ahead, with respect to the scanning direction, of at least a portion of the detection area.

公开(公告)号：US20210349037A1

公开(公告)日：2021-11-11

申请号：US17283686

申请日：2019-09-20

Applicant: Unity Semiconductor

Inventor： Mayeul Durand de Gevigney

IPC: G01N21/88 ,  G01N21/95 ,  G01N21/47

Abstract: A device for dark-field optical inspection of a substrate comprises: a light source for generating an incident beam that is projected onto an inspection zone of the substrate and that is capable of being reflected in the form of diffuse radiation; at least one first and one second collecting device; and a reflecting device for directing at least a portion of the diffuse radiation originating from a focal point of collection coincident with the inspection zone in the direction of the collecting devices, with a first and second reflective zone from which a first portion of the diffuse radiation is directed toward a first focal point, which is optically conjugated with the focal point of collection, and a second portion of the diffuse radiation is reflected toward a second focal point, which is optically conjugated with the collection focal point and distinct from the first focal point of detection.

公开(公告)号：US12074400B1

公开(公告)日：2024-08-27

申请号：US18630700

申请日：2024-04-09

Applicant: Unity Semiconductor

Inventor： Yueh Sheng Ow ,  Mayeul Durand de Gevigney ,  Christophe Isnard

IPC: H01R31/06 ,  H01R12/71

CPC classification number: H01R31/06 ,  H01R12/716

Abstract: An adapter for retaining a wafer has a back side intended to be placed on, and to extend over, a first suction channel and a second suction channel disposed on a main face of a support. The adapter has a shallow recess disposed on the front side to receive the wafer, the shallow recess being shaped to the wafer size and having a flat base to contact a surface of the wafer. The adapter also includes a vacuum network extending through the adapter and comprising at least one through-passage connecting the adapter back side and the adapter front side, the through-passage opening out, on the front side, in the shallow recess. The through-passage intercepts, on the back side, the first suction channel of the support but not the second suction channel.

公开(公告)号：US11965834B2

公开(公告)日：2024-04-23

申请号：US17283686

申请日：2019-09-20

Applicant: Unity Semiconductor

Inventor： Mayeul Durand de Gevigney

IPC: G01N21/88 ,  G01N21/47 ,  G01N21/95

CPC classification number: G01N21/8806 ,  G01N21/474 ,  G01N21/9501 ,  G01N21/9506 ,  G01N2021/4707 ,  G01N2021/4709 ,  G01N2021/4742 ,  G01N2021/8822

Abstract: A device for dark-field optical inspection of a substrate comprises: a light source for generating an incident beam that is projected onto an inspection zone of the substrate and that is capable of being reflected in the form of diffuse radiation; at least one first and one second collecting device; and a reflecting device for directing at least a portion of the diffuse radiation originating from a focal point of collection coincident with the inspection zone in the direction of the collecting devices, with a first and second reflective zone from which a first portion of the diffuse radiation is directed toward a first focal point, which is optically conjugated with the focal point of collection, and a second portion of the diffuse radiation is reflected toward a second focal point, which is optically conjugated with the collection focal point and distinct from the first focal point of detection.