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公开(公告)号：US20160193623A1
公开(公告)日：2016-07-07
申请号：US15071116
申请日：2016-03-15
Applicant: V TECHNOLOGY CO., LTD.
Inventor： Shigeto SUGIMOTO , Koichi KAJIYAMA , Michinobu MIZUMURA , Syuji KUDO , Eriko KIMURA , Hany Maher AZIZ , Yoshitaka KAJIYAMA
CPC classification number: B05B12/20 , B23K26/342 , B23K26/359 , B23K26/382 , C23C14/042 , C23C14/24 , C23C14/34 , C23C14/48 , H01L51/0011 , H01L51/5012 , Y10T156/10
Abstract: A deposition mask for forming a thin film pattern having a predetermined shape on a substrate by deposition, includes a resin film that transmits visible light and has an opening pattern penetrating through the resin film and having the same shape and dimension as those of the thin film pattern so as to correspond to a preliminarily determined forming region of the thin film pattern on the substrate.
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公开(公告)号：US20160194745A1
公开(公告)日：2016-07-07
申请号：US15071125
申请日：2016-03-15
Applicant: V TECHNOLOGY CO., LTD.
Inventor： Shigeto SUGIMOTO , Koichi KAJIYAMA , Michinobu MIZUMURA , Syuji KUDO , Eriko KIMURA , Hany Maher AZIZ , Yoshitaka KAJIYAMA
IPC: C23C14/04 , B23K26/00 , B23K26/342 , H01L51/00
CPC classification number: B05B12/20 , B23K26/342 , B23K26/359 , B23K26/382 , C23C14/042 , C23C14/24 , C23C14/34 , C23C14/48 , H01L51/0011 , H01L51/5012 , Y10T156/10
Abstract: A deposition mask for forming a thin film pattern having a predetermined shape on a substrate by deposition, includes a resin film that transmits visible light and has an opening pattern penetrating through the resin film and having the same shape and dimension as those of the thin film pattern so as to correspond to a preliminarily determined forming region of the thin film pattern on the substrate.
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3.发明申请DEPOSITION MASK, PRODUCING METHOD THEREFOR AND FORMING METHOD FOR THIN FILM PATTERN 有权沉积掩模，其薄膜形成方法及其形成方法公开(公告)号：US20140199808A1
公开(公告)日：2014-07-17
申请号：US14214428
申请日：2014-03-14
Applicant: V TECHNOLOGY CO., LTD.
Inventor： Shigeto SUGIMOTO , Koichi KAJIYAMA , Michinobu MIZUMURA , Syuji KUDO , Eriko KIMURA , Hany Maher AZIZ , Yoshitaka KAJIYAMA
CPC classification number: B05B12/20 , B23K26/342 , B23K26/359 , B23K26/382 , C23C14/042 , C23C14/24 , C23C14/34 , C23C14/48 , H01L51/0011 , H01L51/5012 , Y10T156/10
Abstract: A deposition mask for forming a thin film pattern having a predetermined shape on a substrate by deposition, includes a resin film that transmits visible light and has an opening pattern penetrating through the resin film and having the same shape and dimension as those of the thin film pattern so as to correspond to a preliminarily determined forming region of the thin film pattern on the substrate.
Abstract translation: 用于通过沉积在基板上形成具有预定形状的薄膜图案的沉积掩模包括透射可见光并具有穿透树脂膜的开口图案并具有与薄膜相同的形状和尺寸的树脂膜 图案，以对应于基板上的薄膜图案的预先确定的形成区域。
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4.发明申请DEPOSITION MASK, PRODUCING METHOD THEREFOR AND FORMING METHOD FOR THIN FILM PATTERN 有权沉积掩模，其薄膜形成方法及其形成方法公开(公告)号：US20150284839A1
公开(公告)日：2015-10-08
申请号：US14746727
申请日：2015-06-22
Applicant: V TECHNOLOGY CO., LTD.
Inventor： Shigeto SUGIMOTO , Koichi KAJIYAMA , Michinobu MIZUMURA , Syuji KUDO , Eriko KIMURA , Hany Maher AZIZ , Yoshitaka KAJIYAMA
CPC classification number: B05B12/20 , B23K26/342 , B23K26/359 , B23K26/382 , C23C14/042 , C23C14/24 , C23C14/34 , C23C14/48 , H01L51/0011 , H01L51/5012 , Y10T156/10
Abstract: A deposition mask for forming a thin film pattern having a predetermined shape on a substrate by deposition, includes a resin film that transmits visible light and has an opening pattern penetrating through the resin film and having the same shape and dimension as those of the thin film pattern so as to correspond to a preliminarily determined forming region of the thin film pattern on the substrate.
Abstract translation: 用于通过沉积在基板上形成具有预定形状的薄膜图案的沉积掩模包括透射可见光并具有穿透树脂膜的开口图案并具有与薄膜相同的形状和尺寸的树脂膜 图案，以对应于基板上的薄膜图案的预先确定的形成区域。
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