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公开(公告)号：US11951472B2
公开(公告)日：2024-04-09
申请号：US16623194
申请日：2018-06-15
Applicant: Wisconsin Alumni Research Foundation
Inventor： Chao Li , Jiaquan Yu , Theodorus Evan de Groot , David James Beebe
CPC classification number: B01L3/502 , B05D1/60 , B05D5/08 , B01L2300/166
Abstract: Systems, methods, compositions of matter, and kits for undermedia repellency are disclosed. In some cases, these involve a first volume of a first liquid presented in a second volume of a second liquid above a first location of a first surface. The first liquid, second liquid, and first location can have properties sufficient to give rise to undermedia perfect liquid repellency.
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公开(公告)号：US20240351020A1
公开(公告)日：2024-10-24
申请号：US18581696
申请日：2024-02-20
Applicant: Wisconsin Alumni Research Foundation
Inventor： Chao Li , Jiaquan Yu , Theodorus Evan de Groot , David James Beebe
CPC classification number: B01L3/502 , B05D1/60 , B05D5/08 , B01L2300/166
Abstract: Systems, methods, compositions of matter, and kits for undermedia repellency are disclosed. In some cases, these involve a first volume of a first liquid presented in a second volume of a second liquid above a first location of a first surface. The first liquid, second liquid, and first location can have properties sufficient to give rise to undermedia perfect liquid repellency.
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公开(公告)号：US20210138451A1
公开(公告)日：2021-05-13
申请号：US16623194
申请日：2018-06-15
Applicant: Wisconsin Alumni Research Foundation
Inventor： Chao Li , Jiaquan Yu , Theodorus Evan de Groot , David James Beebe
Abstract: Systems, methods, compositions of matter, and kits for undermedia repellency are disclosed. In some cases, these involve a first volume of a first liquid presented in a second volume of a second liquid above a first location of a first surface. The first liquid, second liquid, and first location can have properties sufficient to give rise to undermedia perfect liquid repellency.
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