公开(公告)号：US12101893B2

公开(公告)日：2024-09-24

申请号：US17596920

申请日：2020-07-28

Applicant: XTPL S.A.

Inventor： Mateusz Zając ,  Urszula Nowak ,  Piotr Kowalczewski ,  Filip Granek ,  Jan Kotarski ,  Maciej Tybel ,  Szymon Zięba

IPC: H05K3/12 ,  B05D1/26

CPC classification number: H05K3/1241 ,  B05D1/26 ,  B05D1/265 ,  H05K2201/0257 ,  H05K2203/0126

Abstract: A method of dispensing a metallic nanoparticle composition along a trajectory on a substrate is disclosed. The composition is dispensed from a nozzle through its outlet. The outlet is characterized by an outlet size. First, an initial pressure is applied to the composition in the nozzle to cause the composition to flow from the outlet. The nozzle is positioned at a height such that the composition does not flow onto the substrate. Second, the nozzle is lowered toward the substrate such that a fluid bridge forms between the outlet and the substrate and an adjusted pressure is applied to the composition in the nozzle. The adjusted pressure is lower than needed for the composition to continue to flow from the outlet. Third, the fluid is dispensed from the nozzle. A dispensing pressure is applied to the fluid while the nozzle is laterally displaced along the trajectory on the substrate.