公开(公告)号：US20230130384A1

公开(公告)日：2023-04-27

申请号：US17913994

申请日：2021-03-24

Applicant: ams-Osram AG

Inventor： Deborah MORECROFT ,  Gerhard EILMSTEINER ,  Manuel KOCH

IPC: G02B5/28 ,  G02B5/20 ,  H04N23/55

Abstract: An interference filter comprises a substrate, a filter stack and at least one absorption layer. The filter stack comprises alternating layers of optical coatings with different refractive indices arranged on the substrate. The at least one absorption layer is comprised of an optically absorbing material which is arranged on the substrate.

公开(公告)号：US20240230540A1

公开(公告)日：2024-07-11

申请号：US18560163

申请日：2022-05-04

Applicant: ams-OSRAM AG

Inventor： Deborah MORECROFT ,  Jochen KRAFT ,  Desiree RIST ,  Josef EHGARTNER

IPC: G01N21/77 ,  G02B6/136 ,  G02B6/12

CPC classification number: G01N21/7703 ,  G02B6/136 ,  G01N2021/7779 ,  G01N2201/0221 ,  G02B2006/12138

Abstract: A method for manufacturing a sensor includes providing a lower cladding layer, depositing a waveguide layer on the lower cladding layer, forming a sensing waveguide and a reference waveguide by photolithography and etching the waveguide layer in places, and forming a photoresist structure-on a part of the sensing waveguide by photolithography. The method also includes depositing an upper cladding layer on the photoresist structure, the sensing waveguide, the reference waveguide, and the lower cladding layer. The method further includes removing the photoresist structure with the part of the upper cladding layer deposited on the photoresist structure so that an opening within the upper cladding layer is formed above the sensing waveguide. The method additionally includes depositing a functionalization material within the opening. From the waveguide layer an auxiliary structure is formed by photolithography and etching the waveguide layer, and the opening is above the auxiliary structure.

公开(公告)号：US20230175890A1

公开(公告)日：2023-06-08

申请号：US17923088

申请日：2021-05-04

Applicant: AMS-Osram AG

Inventor： Deborah MORECROFT ,  Fernando Jesus CASTANO SANCHEZ ,  Richard HOPPER ,  Sophie BOUAL ,  Gerhard EILMSTEINER ,  Rafael SERRANO GOTARREDONA ,  Jozef PULKO ,  Gerald MEINHARDT

IPC: G01J3/02 ,  G01J3/10

CPC classification number: G01J3/0297 ,  G01J3/108 ,  G01J3/0272 ,  G01J3/0259

Abstract: A spectrometer includes an emitter that is configured to emit electromagnetic radiation, a sample area that is arranged at an outer face of the spectrometer, a modulation unit including an electrochromic material, an optical filter, an optical detector, an integrated circuit that has a main plane of extension, and an optical path for electromagnetic radiation emitted by the emitter towards the optical detector via the sample area, the modulation unit and the optical filter, wherein the electrochromic material is electrically connected with the integrated circuit, and the modulation unit is configured to modulate electromagnetic radiation temporally. Furthermore, a method for detecting electromagnetic radiation is provided.