公开(公告)号：US20160107882A1

公开(公告)日：2016-04-21

申请号：US14890852

申请日：2014-06-05

Applicant: TRONICS MICROSYSTEMS S.A.

Inventor： Julien CUZZOCREA ,  Joël COLLET

IPC: B81B7/00 ,  B81C1/00

CPC classification number: B81B7/0038 ,  B81C1/00285

Abstract: A MEMS device comprises a first layer (1), a second layer (2) and a third layer (3) sealed together. A mobile structure (7.1, 7.2) in the second layer (2) is defined by openings (8.1, 8.2) in the second layer (2). In the first layer (1), there is at least one first-layer cavity (6.1, 6.2) with an opening towards the mobile structure (7.1, 7.2) of the second layer (2). In the third layer (3), there is at least one third-layer cavity (9) with an opening towards the mobile structure (7.1, 7.2) of the second layer (2). Therefore, the third-layer cavity (9) and the second layer (2) define a space within the MEMS device, A getter layer (10.1, 10.2) arranged on a surface of said space. The getter layer (10.1, 10.2) is preferably arranged on a surface of the second layer (2) and in particular, the getter layer (10.1, 10.2) is arranged on a static part of the second layer (2). Alternatively, the MEMS device has a third-layer cavity (24) with at least two recesses (25.1, 25.2, 25.3) and the getter layer (26.1, 26.2, 26.3) is arranged on a surface of the recesses (25.1, 25.2, 25.3).

Abstract translation: MEMS器件包括密封在一起的第一层（1），第二层（2）和第三层（3）。 第二层（2）中的移动结构（7.1,7.2）由第二层（2）中的开口（8.1,8.2）限定。 在第一层（1）中，存在至少一个具有朝向第二层（2）的移动结构（7.1,7.2）的开口的第一层空腔（6.1,6.2）。 在第三层（3）中，存在至少一个具有朝向第二层（2）的移动结构（7.1,7.2）的开口的第三层空腔（9）。 因此，第三层空腔（9）和第二层（2）在MEMS装置内限定了布置在所述空间表面上的吸气剂层（10.1,10.2）。 吸气剂层（10.1,10.2）优选地布置在第二层（2）的表面上，特别地，吸气剂层（10.1,10.2）布置在第二层（2）的静态部分上。 或者，MEMS器件具有具有至少两个凹部（25.1,25.2,25.3）的第三层腔（24），并且吸气剂层（26.1,26.2,26.3）布置在凹部（25.1,25.2,25.3）的表面上， 25.3）。

公开(公告)号：US09856133B2

公开(公告)日：2018-01-02

申请号：US14891033

申请日：2014-05-21

Applicant: TRONICS MICROSYSTEMS S.A.

Inventor： François-Xavier Boillot ,  Rémi Laoubi

IPC: G01P15/08 ,  B81B3/00 ,  G01C19/5747 ,  B81B7/02 ,  G01C19/5762

CPC classification number: B81B3/0021 ,  B81B3/0048 ,  B81B7/02 ,  G01C19/5747 ,  G01C19/5762 ,  G01P2015/0837

Abstract: A sensor which measures parameters such as acceleration, rotation and magnetic field comprises a substrate defining a plane and at least one sensing plate suspended above the substrate for movement in a sensing direction orthogonal to the substrate plane. A detection arm suspended above the substrate is rotational about an axis parallel to the substrate plane. An out-of-plane coupling structure couples the sensing plate to the detection arm for generating rotational movement of the detection arm, which is detected by a rotation detection structure. A pivot element arranged at a distance from the coupling structure facilitates tilting movement of the sensing plate.

公开(公告)号：US20160130133A1

公开(公告)日：2016-05-12

申请号：US14891033

申请日：2014-05-21

Applicant: TRONICS MICROSYSTEMS S.A.

Inventor： François-Xavier BOILLOT ,  Rémi LAOUBI

IPC: B81B3/00 ,  B81B7/02 ,  G01C19/5762

CPC classification number: B81B3/0021 ,  B81B3/0048 ,  B81B7/02 ,  G01C19/5747 ,  G01C19/5762 ,  G01P2015/0837

Abstract: A sensor for measuring physical parameters such as acceleration, rotation, magnetic field, comprises a substrate (13) defining a substrate plane and at least one sensing plate (11, 12) suspended above the substrate (13) for performing a movement having at least a first component in a sensing direction. The sensing direction is orthogonal to the substrate plane. There is at least one detection arm (14.1, 14.2) that is suspended above the substrate (13) for performing a rotational movement about a rotation axis parallel to the substrate plane. An out-of-plane coupling structure (17.1, 17.4) is used to couple the first component of the movement of said sensing plate (11, 12) to said detection arm (14.1, 14.2) for generating the rotational movement of the detection arm (14.1, 14.2). A rotation detection structure cooperates with the detection arm (14.1, 14.2) for detecting the rotational movement of the detection arm (14.1, 14.2) with respect to the substrate plane. A pivot element (17.2, 17.3) is arranged at a distance from the out-of-plane coupling structure (17.1, 17.4), said pivot element (17.2, 17.3) coupling the sensing plate to a geometric reference plane (19), which is at a fixed distance above the substrate plane, so that the sensing plate (11, 12) performs a tilting out-of-plane movement.

Abstract translation: 用于测量诸如加速度，旋转，磁场的物理参数的传感器包括限定衬底平面的衬底（13）和悬挂在衬底（13）上方的至少一个感测板（11,12），用于执行至少具有 感测方向上的第一分量。 检测方向与基板平面正交。 至少有一个检测臂（14.1,14.2）悬挂在基板（13）上方，用于围绕平行于基板平面的旋转轴线进行旋转运动。 平面外耦合结构（17.1,17.4）用于将所述感测板（11,12）的运动的第一分量耦合到所述检测臂（14.1,14.2），以产生检测臂的旋转运动 （14.1,14.2）。 旋转检测结构与检测臂（14.1,14.2）配合，用于检测检测臂（14.1,14.2）相对于基板平面的旋转运动。 枢轴元件（17.2,17.3）被布置成离开平面外联接结构（17.1,17.4）一定距离，所述枢转元件（17.2,17.3）将感测板联接到几何参考平面（19），其中 在基板平面上方固定距离，使得感测板（11,12）执行倾斜的平面外运动。

公开(公告)号：US20150316378A1

公开(公告)日：2015-11-05

申请号：US14654154

申请日：2013-12-09

Applicant: TRONICS MICROSYSTEMS S.A.

Inventor： Christophe KERGUERIS ,  Olivier GIGAN ,  Christian PISELLA ,  Yongjun YANG ,  Bo LI ,  Shujing XU

IPC: G01C19/5747

CPC classification number: G01C19/5747

Abstract: A micromechanical sensor device for measuring angular z-axis motion comprises two vibratory structures each having at least one proof mass. A suspension structure maintains the two vibratory structures in a mobile suspended position above the substrate for movement parallel to the substrate plane in drive-mode (x-axis) direction and in sense-mode direction (y-axis). A coupling support structure connects the coupling structure to an anchor structure and enables a rotational swinging movement of the coupling structure, the rotational swinging movement having an axis of rotation that is perpendicular to the substrate plane. Each of the vibratory structures comprises at least one shuttle mass coupled to the at least one proof mass by sense-mode springs, which are more flexible in sense-mode direction than in drive-mode direction (x), for activating a vibration movement of each vibratory structure. A sensing electrode structure for each proof mass is designed for detecting sense-mode movements that are parallel to the substrate plane, The coupling support structure is designed to also enable a translational movement of the coupling structure in drive-mode direction (x).

Abstract translation: 用于测量角度z轴运动的微机械传感器装置包括两个振动结构，每个具有至少一个检验质量。 悬挂结构将两个振动结构保持在基板上方的可移动悬挂位置，以在驱动模式（x轴）方向和感测模式方向（y轴）上平行于基板平面移动。 联接支撑结构将联接结构连接到锚固结构并且能够实现联接结构的旋转摆动运动，旋转摆动运动具有垂直于基板平面的旋转轴线。 每个振动结构包括通过感测模式弹簧耦合到至少一个检测质量块的至少一个穿梭质量，其在感测模式方向上比在驱动模式方向（x）上更灵活，用于激活振动运动 每个振动结构。 用于每个检验质量块的感测电极结构被设计用于检测平行于衬底平面的感测模式运动。耦合支撑结构被设计成还能够实现耦合结构在驱动模式方向（x）上的平移运动。

公开(公告)号：US20120267730A1

公开(公告)日：2012-10-25

申请号：US13451367

申请日：2012-04-19

Applicant: Stéphane RENARD ,  Antoine FILIPE ,  Joël COLLET ,  François-Xavier BOILLOT

Inventor： Stéphane RENARD ,  Antoine FILIPE ,  Joël COLLET ,  François-Xavier BOILLOT

IPC: H01L29/84 ,  H01L21/50

CPC classification number: B81B7/0064 ,  B81B2201/0235 ,  B81C2201/019 ,  B81C2203/036

Abstract: A micro-electromechanical system (MEMS) device for measuring accelerations, angular rates, or for actuation comprises at least two substrates and at least one movable structure arranged in a cavity between the substrates. An electrically conducting frame surrounding the movable structure is arranged at an interface of the two substrates. The frame is electrically separated from the movable structure and connected by at least first and second electrically conducting connections to the first and second substrates, respectively. The frame may have a width of not more than 150 preferably not more than 50 μm. The first connection is at an interface between the frame and the first substrate. The second connection is a layer applied at an outer periphery of the frame and a peripheral face of the second substrate. The structure keeps electrical fields and electromagnetic disturbances away from the sensor and may also be used for shielding micro-electronic circuits.

Abstract translation: 用于测量加速度，角速率或用于致动的微机电系统（MEMS）装置包括至少两个基板和布置在基板之间的空腔中的至少一个可移动结构。 围绕可移动结构的导电框架布置在两个基板的界面处。 框架与可移动结构电分离，并通过至少第一和第二导电连接分别连接到第一和第二基板。 框架可以具有不大于150的宽度，优选不大于50μm。 第一连接在框架和第一基板之间的界面处。 第二连接是施加在框架的外周和第二基板的周面的层。 该结构使电场和电磁干扰远离传感器，也可用于屏蔽微电子电路。

公开(公告)号：US09944512B2

公开(公告)日：2018-04-17

申请号：US15520618

申请日：2015-11-09

Applicant: TRONIC'S MICROSYSTEMS

Inventor： Joël Collet

IPC: H01L29/84 ,  B81B3/00 ,  B81C1/00 ,  G01L9/00

CPC classification number: B81B3/0051 ,  B81C1/00182 ,  B81C1/00333 ,  B81C2201/0194 ,  B81C2203/051 ,  G01L9/0042

Abstract: An electromechanical device includes a stack formed of an insulating layer interposed between two solid layers, and a micromechanical structure of predetermined thickness suspended above a recess of predetermined depth, the recess and the micromechanical structure forming one of the two solid layers of the stack, and the insulating layer forming the bottom of the recess.

公开(公告)号：US09884756B2

公开(公告)日：2018-02-06

申请号：US14890852

申请日：2014-06-05

Applicant: TRONICS MICROSYSTEMS S.A.

Inventor： Julien Cuzzocrea ,  Joël Collet

IPC: B81B7/00 ,  B81C1/00

CPC classification number: B81B7/0038 ,  B81C1/00285

Abstract: A MEMS device comprises a first layer (1), a second layer (2) and a third layer (3) sealed together. A mobile structure (7.1, 7.2) in the second layer (2) is defined by openings (8.1, 8.2) in the second layer (2). In the first layer (1), there is at least one first-layer cavity (6.1, 6.2) with an opening towards the mobile structure (7.1, 7.2) of the second layer (2). In the third layer (3), there is at least one third-layer cavity (9) with an opening towards the mobile structure (7.1, 7.2) of the second layer (2). Therefore, the third-layer cavity (9) and the second layer (2) define a space within the MEMS device, A getter layer (10.1, 10.2) arranged on a surface of said space. The getter layer (10.1, 10.2) is preferably arranged on a surface of the second layer (2) and in particular, the getter layer (10.1, 10.2) is arranged on a static part of the second layer (2). Alternatively, the MEMS device has a third-layer cavity (24) with at least two recesses (25.1, 25.2, 25.3) and the getter layer (26.1, 26.2, 26.3) is arranged on a surface of the recesses (25.1, 25.2, 25.3).