Grating for EUV-radiation, method for manufacturing the grating and wavefront measurement system.

Invention Patent

NL1036305A1 Grating for EUV-radiation, method for manufacturing the grating and wavefront measurement system. 未知

Patent Title: Grating for EUV-radiation, method for manufacturing the grating and wavefront measurement system.
Application No.: NL1036305

Application Date: 2008-12-11
Publication No.: NL1036305A1

Publication Date: 2009-06-23
Inventor: KRUIZINGA BORGERT , WEHRENS MARTIJN GERARD DOMINIQUE , NIJKERK MICHIEL DAVID , FEENSTRA KORNELIS FRITS
Applicant: ASML NETHERLANDS BV
Assignee: ASML NETHERLANDS BV
Current Assignee: ASML NETHERLANDS BV
Priority: US857307 2007-12-21
Main IPC: G01M11/02
IPC: G01M11/02 ; G03F7/20

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Espacenet

IPC分类:

G	物理
G01	测量；测试
G01M	机器或结构部件的静或动平衡的测试；其他类目中不包括的结构部件或设备的测试
G01M11/00	光学设备的测试；其他类目未包括的用光学方法测试结构部件
G01M11/02	.•光学性质测试