Lithographic apparatus, device manufacturing method, cleaning system and method for cleaning a patterning device.

Invention Patent

NL1036769A1 Lithographic apparatus, device manufacturing method, cleaning system and method for cleaning a patterning device. 未知

Patent Title: Lithographic apparatus, device manufacturing method, cleaning system and method for cleaning a patterning device.
Application No.: NL1036769

Application Date: 2009-03-25
Publication No.: NL1036769A1

Publication Date: 2009-10-26
Inventor: SCACCABAROZZI LUIGI , IVANOV VLADIMIR VITALEVICH , KOSHELEV KONSTANTIN NIKOLAEVICH , MOORS JOHANNES HUBERTUS JOSEPH , STEVENS LUCAS HENRICUS JOHANNE , ANTSIFEROV PAVEL STANISLAVOVICH , KRIVTSUN VLADIMIR MIHAILOVITCH , DOROKHIN LEONID ALEXANDROVICH , KAMPEN MAARTEN VAN
Applicant: ASML NETHERLANDS BV
Assignee: ASML NETHERLANDS BV
Current Assignee: ASML NETHERLANDS BV
Priority: US7134508 2008-04-23
Main IPC: G03F7/20
IPC: G03F7/20

Information query

Espacenet

IPC分类:

G	物理
G03	摄影术；电影术；利用了光波以外其他波的类似技术；电记录术；全息摄影术
G03F	图纹面的照相制版工艺，例如，印刷工艺、半导体器件的加工工艺；其所用材料；其所用原版；其所用专用设备（照相排版装置入B41B；为摄影用的感光材料或处理入G03C；电记录、感光层或处理入G03G）
G03F7/00	图纹面，例如，印刷表面的照相制版如光刻工艺；图纹面照相制版用的材料，如：含光致抗蚀剂的材料；图纹面照相制版的专用设备（用于特殊工艺的光致抗蚀剂结构见相关的位置，例如，B44C，H01L，例如，H01L21/00，H05K）
G03F7/20	.曝光及其设备（复制用照相印制设备入G03B27/00）