公开(公告)号：JP2006041499A

公开(公告)日：2006-02-09

申请号：JP2005183273

申请日：2005-06-23

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： HAM ERIK LEONARDUS ,  HEERENS GERT-JAN ,  LANSBERGEN ROBERT GABRIEL M ,  MEIJER ELLARD A ,  MEIJER HENDRICUS JOHANNES MARI ,  MEILING HANS ,  MERTENS BASTIAAN MATTHIAS ,  MOORS JOHANNES HUBERTUS JOSEPH

IPC: H01L21/027 ,  B65G49/00 ,  G03B27/52 ,  G03B27/62 ,  G03F7/20 ,  H01L21/677

CPC classification number: G03B27/52 ,  G03F7/70741

Abstract: PROBLEM TO BE SOLVED: To provide a box which is capable of protecting a lithography patterning device against external contaminants and making its throughput optimal.
SOLUTION: The transfer box 2 is equipped with an internal space 10 provided with a housing position at which the patterning device is housed and a container 8 provided with an opening used for transferring the patterning device. The internal space 10 is pressurized before the patterning device is transferred from the internal space 10 to a lithography apparatus. The box is equipped with a closure which closes the opening and/or a channel system 18 which discharges gas from the internal space 10 of the box to / and/or supplies the gas from / to the internal space of the box, and the lithography apparatus which is so constituted as to collaborate with the box device is included.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种能够保护光刻图案形成装置免受外部污染物并使其吞吐量最优化的盒子。 解决方案：转印盒2配备有内部空间10，内部空间10设置有容纳图案形成装置的容纳位置，容器8具有用于转印图案形成装置的开口。 在图案形成装置从内部空间10传送到光刻装置之前，内部空间10被加压。 该箱子装有封闭开口和/或通道系统18，该通道系统18将来自箱体的内部空间10的气体从盒子的内部空间排出和/或从气体的内部空间供应气体，并且光刻 包括与盒装置协作的装置。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2004207730A

公开(公告)日：2004-07-22

申请号：JP2003422366

申请日：2003-12-19

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： STEVENS LUCAS HENRICUS JOHANNE ,  LEENDERS MARTINUS HENDRIKUS AN ,  MEILING HANS ,  MOORS JOHANNES HUBERTUS JOSEPH

IPC: B08B7/00 ,  G03F7/20 ,  H01L21/027

CPC classification number: G03F7/70925 ,  B08B7/0035

Abstract: PROBLEM TO BE SOLVED: To solve the problem of excess exposure of an optical element and a problem due to the excess exposure of the optical element caused when using a cleaning method by a conventional technology. SOLUTION: A radiation beam produced in a radiation source LA, which is applied in an illumination system IL, enters the illumination system IL and impinges on a first optical element, a mirror SPF. The radiation beam is then reflected by a plurality of other mirrors, FF, FF, N1, N2 and G, and finally departs from the illumination system as a projection beam PB. A light path of radiation can be selectively blocked, by using shutters SH1 and SH2. The excess exposure of the photo-element can be prevented by measures of the excess cleaning of the optical element. COPYRIGHT: (C)2004,JPO&NCIPI

公开(公告)号：JP2006191091A

公开(公告)日：2006-07-20

申请号：JP2005377813

申请日：2005-12-28

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： WASSINK ARNOUD C ,  BAKKER LEVINUS PIETER ,  MOORS JOHANNES HUBERTUS JOSEPH ,  SCHUURMANS FRANK JEROEN PIETER

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70916

Abstract: PROBLEM TO BE SOLVED: To provide a filter system for actively catching debris particles by rotating a foil trap, and for cooling the foil trap in a lithography device. SOLUTION: This lithography device is provided with an illumination system configured so that radiation beams can be conditioned, a projection system configured so that the radiation beams can be projected to a substrate and a filter system for filter-removing debris particles from the radiation beam. A filter 820 system includes a plurality of foils F1 and F2 for trapping debris particles, supports S1 and S2 for storing a plurality of foils and cooling systems CS1 and CS2 having surfaces configured to be cooled. The cooling systems and supports are positioned so that a gap G can be formed between the surface of the cooling system and the support. The cooling system is configured to inject gas into the gap. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种用于通过旋转箔捕获器并且用于在光刻装置中冷却箔捕获器来主动捕获碎屑颗粒的过滤系统。 解决方案：该光刻设备设置有照明系统，其被配置为可以对辐射束进行调节;投影系统被配置成使得辐射束可以投射到基底和用于从 辐射束。 过滤器820系统包括用于捕集碎屑颗粒的多个箔F1和F2，用于存储多个箔的支撑件S1和S2以及具有被配置为被冷却的表面的冷却系统CS1和CS2。 冷却系统和支撑件被定位成使得可以在冷却系统的表面和支撑件之间形成间隙G. 冷却系统配置成将气体注入到间隙中。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2006135307A

公开(公告)日：2006-05-25

申请号：JP2005289648

申请日：2005-10-03

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： VAN HERPEN MAARTEN MARINUS JOH ,  VADIM YEVGENYEVICH BANINE ,  MOORS JOHANNES HUBERTUS JOSEPH ,  SPEE CAROLUS IDA MARIA ANTONIU ,  KLUNDER DERK JAN W ,  ZALM PETER CORNELIS

IPC: H01L21/027 ,  G02B1/10 ,  G02B5/26 ,  G21K1/06

CPC classification number: B82Y10/00 ,  B08B7/0035 ,  B08B17/04 ,  G03F7/70925 ,  G03F7/70983 ,  G21K1/062

Abstract: PROBLEM TO BE SOLVED: To provide a method to remove things deposited in optical elements in an apparatus containing optical elements, and a method to protect optical elements in the apparatus. SOLUTION: The method to remove things deposited in an optical device in an apparatus containing optical elements comprises supply of H 2 content gas to at least part of the apparatus, generation of hydrogen radicals from H 2 of the H 2 content gas, and removal of at least part of the deposits by making optical elements having deposits contact at least part of the hydrogen radicals. In addition, the method to protect optical elements comprises supply of a cap layer to the optical elements in a depositing process and removal of at least part of the cap layer from the optical elements in the foregoing removal process when the apparatus is being used or after it is used. This method is applicable to the lithography apparatus. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种去除沉积在含有光学元件的装置中的光学元件中的物体的方法，以及保护设备中的光学元件的方法。 解决方案：在含有光学元件的设备中去除沉积在光学器件中的物质的方法包括向至少部分设备供应H SB 2含量气体，从H < SB> 2 ，并且通过使具有沉积物的光学元件与至少一部分氢原子接触而去除至少部分沉积物。 此外，保护光学元件的方法包括在沉积工艺中向光学元件提供盖层，并且在上述去除工艺中，当使用该装置时或之后，将其从光学元件中移除至少部分盖层 它被使用。 该方法适用于光刻设备。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2006032945A

公开(公告)日：2006-02-02

申请号：JP2005193839

申请日：2005-07-01

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： MOORS JOHANNES HUBERTUS JOSEPH ,  MICKAN UWE

IPC: H01L21/027 ,  G01J1/00 ,  G01J1/02 ,  G03F7/20

CPC classification number: G03F7/70558

Abstract: PROBLEM TO BE SOLVED: To provide a calibration apparatus and a method of calibrating a radiation sensor in a lithographic apparatus.
SOLUTION: A calibration apparatus 1 is provided for calibrating a radiation sensor RS in a lithographic apparatus. The calibration apparatus includes a window 3 formed of a substantially radiation-transparent material for allowing radiation to pass therethrough to reach the radiation sensor. A first reference sensor 6 is located behind the window having an active surface abutting the window for measuring the intensity of the radiation that passes through the window. A second reference sensor 8 is located at a short distance behind the window having an active surface facing the window. The second reference sensor measures the intensity of the radiation that passes through the window, a first contamination layer 12 formed on the window, and a second contamination layer 13 formed on the active surface of the second reference sensor. The radiation sensor can be calibrated by combining measurements from the first and the second reference sensors.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种校准装置和校准光刻设备中的辐射传感器的方法。 解决方案：提供校准装置1，用于校准光刻设备中的辐射传感器RS。 校准装置包括由基本上辐射透明的材料形成的窗口3，用于允许辐射通过其中以到达辐射传感器。 第一参考传感器6位于窗后面，具有邻接窗口的活动表面，用于测量通过窗口的辐射强度。 第二参考传感器8位于具有面向窗口的有效表面的窗后面的短距离处。 第二参考传感器测量通过窗口的辐射的强度，形成在窗口上的第一污染层12和形成在第二参考传感器的有效表面上的第二污染层13。 可以通过组合来自第一和第二参考传感器的测量来校准辐射传感器。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2006352081A

公开(公告)日：2006-12-28

申请号：JP2006093871

申请日：2006-03-30

Applicant: ASML NETHERLANDS BV

Inventor： BAKKER LEVINUS P ,  BANINE VADIM YEVGENYEVICH ,  IVANOV VLADIMIR VITALEVITCH ,  KOSHELEV KONSTANTIN NIKOLAEVIT ,  MERTENS BASTIAAN MATTHIAS ,  MOORS JOHANNES HUBERTUS JOSEPH ,  SCHUURMANS FRANK JEROEN PIETER ,  ZUKAVISHVILI GIVI GEORGIEVITCH ,  WOLSCHRIJN BASTIAAN THEODOOR ,  VAN DER VELDEN MARC H L

IPC: H01L21/027 ,  G03F7/20

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus for reducing sputtering caused by gas introduced to a projection beam optical path, and a method for manufacturing the apparatus. SOLUTION: The lithographic apparatus is arranged to project a beam from a radiation source to a substrate. The lithographic apparatus includes an optical element in an optical path of the beam, a gas inlet for introducing gas into the optical path of the beam so that the gas is ionized by the beam to a create electric field toward the optical element, and a gas source coupled to the gas inlet for supplying the gas. The gas has a threshold of kinetic energy that is greater than kinetic energy developed by ions of the gas in the electric fields for sputtering the optical element. COPYRIGHT: (C)2007,JPO&INPIT

公开(公告)号：JP2009049438A

公开(公告)日：2009-03-05

申请号：JP2008306412

申请日：2008-12-01

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： VAN HERPEN MAARTEN MARINUS JOH ,  VADIM YEVGENYEVICH BANINE ,  MOORS JOHANNES HUBERTUS JOSEPH ,  SPEE CAROLUS IDA MARIA ANTONIU ,  KLUNDER DERK JAN W ,  ZALM PETER CORNELIS

IPC: H01L21/027 ,  G03F7/20

CPC classification number: B82Y10/00 ,  B08B7/0035 ,  B08B17/04 ,  G03F7/70925 ,  G03F7/70983 ,  G21K1/062

Abstract: PROBLEM TO BE SOLVED: To provide a method to remove a deposition on an optical element of an apparatus including the optical element, and a method to protect the optical element. SOLUTION: A method for the removal of a deposition on an optical element of an apparatus including the optical element includes providing an H 2 containing gas in at least part of the apparatus, producing hydrogen radicals from H 2 from the H 2 containing gas, and bringing the optical element with deposition into contact with at least part of the hydrogen radicals and removing at least part of the deposition. Further, a method for the protection of the optical element includes providing a cap layer to the optical element by a deposition process, and during or after use of the apparatus, removing at least part of the cap layer from the optical element in a removal process as described above. The methods can be applied in a lithographic apparatus. COPYRIGHT: (C)2009,JPO&INPIT

Abstract translation: 要解决的问题：提供一种去除包括该光学元件的装置的光学元件上的沉积的方法以及保护光学元件的方法。 解决方案：一种用于去除包括光学元件在内的装置的光学元件上的沉积的方法包括在装置的至少一部分中提供含有H 2 S 2的气体，从而从 H SB 2含有气体，并使沉积的光学元件与至少部分氢原子接触并除去至少部分沉积物。 此外，用于保护光学元件的方法包括通过沉积工艺向光学元件提供盖层，并且在使用该装置期间或之后，在去除过程中从光学元件中去除至少一部分盖层 如上所述。 该方法可以应用在光刻设备中。 版权所有（C）2009，JPO＆INPIT

公开(公告)号：JP2007173792A

公开(公告)日：2007-07-05

申请号：JP2006316940

申请日：2006-11-24

Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

Inventor： WILHELMUS VAN HERPEN MAARTEN M ,  KLUNDER DERK JAN WILFRED ,  MOORS JOHANNES HUBERTUS JOSEPH

IPC: H01L21/027 ,  G21K3/00 ,  G21K5/02

CPC classification number: G03F7/70916 ,  B82Y10/00 ,  G03F7/70033 ,  G03F7/70041 ,  G03F7/70191 ,  G03F7/7055 ,  G03F7/70908 ,  G21K1/043 ,  G21K1/062

Abstract: PROBLEM TO BE SOLVED: To provide a radiation system in which a spectrum filter, for selectively transmitting a spectrum range of an EUV radiation beam from an EUV source, is not contaminated by debris.
SOLUTION: The radiation system 1 is constituted of a pulse EUV source 2 for generating EUV radiation; a movable mount 6 moved in synchronous with the pulse EUV source 2; and a spectrum filter 5 attached onto the movable mount 6. By selecting a proper interval based on an average speed of debris 4 and a speed of light, the spectrum filter 5 is maintained without substantially contaminated by debris 4.
COPYRIGHT: (C)2007,JPO&INPIT

Abstract translation: 要解决的问题：提供一种辐射系统，其中用于选择性地传输来自EUV源的EUV辐射束的光谱范围的光谱滤波器不被碎片污染。 解决方案：辐射系统1由用于产生EUV辐射的脉冲EUV源2构成; 与脉冲EUV源2同步移动的可移动安装件6; 以及附着在可移动支架6上的光谱滤波器5.通过基于碎片4的平均速度和光速选择适当的间隔，维持光谱滤波器5，基本上不被碎片4污染。版权所有（（ C）2007，JPO＆INPIT

公开(公告)号：JP2006135286A

公开(公告)日：2006-05-25

申请号：JP2005136766

申请日：2005-05-10

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： VADIM YEVGENYEVICH BANINE ,  MOORS JOHANNES HUBERTUS JOSEPH

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/70191 ,  G03F7/70575

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus for attenuating a strength of undesirable radiation in a radiation beam in an optical system, and to provide a device manufacturing method. SOLUTION: A lithographic apparatus comprises an illumination system configured to transmit the radiation beam which includes a desired radiation having a predetermined wavelength or a predetermined wavelength range, and undesired radiation having another wavelength or another wavelength range; a support structure configured to support a patterning structure in which a pattern is imparted to the cross section of the radiation beam; a substrate table configured to hold a substrate; and a projection system configured to project the pattern imparted radiation beam on the target of the substrate, wherein in the case of use at least part of the lithographic apparatus includes a gas substantially transmissive for at least part of the desired radiation and substantially less transmissive for at least part of the undesired radiation. COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种用于衰减光学系统中的辐射束中不需要的辐射的强度的光刻设备，并提供一种器件制造方法。 光刻设备包括被配置为透射包括具有预定波长或预定波长范围的期望辐射的辐射束的照明系统以及具有另一波长或另一波长范围的不需要的辐射; 支撑结构，其构造成支撑图案化结构，其中图案被赋予所述辐射束的横截面; 被配置为保持基板的基板台; 以及投影系统，被配置为将所述图案赋予的辐射束投影到所述基板的目标上，其中在使用的情况下，所述光刻设备的至少一部分包括对于至少部分所需辐射基本上透射的气体，并且对于 至少部分不期望的辐射。 版权所有（C）2006，JPO＆NCIPI

公开(公告)号：JP2006128676A

公开(公告)日：2006-05-18

申请号：JP2005306503

申请日：2005-10-21

Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

Inventor： NEERHOF HENDRIK ANTONY JOHANNE ,  MOORS JOHANNES HUBERTUS JOSEPH ,  OTTENS JOOST JEROEN ,  LE KLUSE MARCO

IPC: H01L21/027 ,  G03F7/20

CPC classification number: G03F7/707 ,  G03F7/70708 ,  G03F7/70783

Abstract: PROBLEM TO BE SOLVED: To provide a lithographic device provided with a structure for preventing the deformation of an article supported by an article support.
SOLUTION: The lithographic device includes an illuminating system adapted to provide a radiation beam, the article support adapted to support the article disposed in a beam path of the radiation beam, a multi-electrode clamp adapted to apply a clamping force for clamping the article against the article support, and a bias voltage circuit adapted to bias at least one electrode of the multi-electrode clamp so as to be able to avoid the formation of ridges appearing by electrostatic charge on the article.
COPYRIGHT: (C)2006,JPO&NCIPI

Abstract translation: 要解决的问题：提供一种设置有用于防止由物品支撑件支撑的物品变形的结构的光刻设备。 解决方案：光刻设备包括适于提供辐射束的照明系统，所述物品支撑件适于支撑设置在辐射束的光束路径中的物品，多电极夹具适于施加用于夹紧的夹紧力 所述制品抵靠所述物品支撑，以及偏置电压电路，其适于偏置所述多电极夹的至少一个电极，以便能够避免形成由所述物品上的静电电荷出现的脊。 版权所有（C）2006，JPO＆NCIPI