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    Lithographic apparatus, illumination system and method for providing projection beam of euv radiation
    1.
    发明专利
    Lithographic apparatus, illumination system and method for providing projection beam of euv radiation 有权
    提供EUV辐射投影光束的照相装置，照明系统和方法

    公开(公告)号：JP2009141378A

    公开(公告)日：2009-06-25

    申请号：JP2009007569

    申请日：2009-01-16

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： IVANOV VLADIMIR VITALEVICH ,  BANINE VADIM YEVGENYEVICH ,  KOSHELEV KONSTANTIN NIKOLAEVIT

    IPC: G21K5/02 ,  H01L21/027 ,  G03F7/20 ,  H05G2/00

    CPC classification number: G03F7/70858 ,  G03F7/70916

    Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus which is not influenced by a problem caused by particles produced as a by-product of the EUV radiation production.
    SOLUTION: The lithographic apparatus includes an illumination system that provides a beam of radiation and a support structure that supports a patterning structure. The patterning structure is configured to impart a pattern to the beam of radiation in its cross-section. The apparatus also includes a substrate support that supports a substrate and a projection system that projects the patterned beam onto a target portion of the substrate. The illumination system includes a radiation-production system that produces extreme ultra-violet radiation and a radiation-collection system that collects extreme ultra-violet radiation. Particles that are produced as a by-product of extreme ultra-violet radiation production move substantially in a particle-movement direction. The radiation-collection system is adjusted to collect extreme ultra-violet radiation which radiates in a collection-direction, which is substantially different from the particle-movement direction.
    COPYRIGHT: (C)2009,JPO&INPIT

    Abstract translation: 要解决的问题：提供不受由作为EUV辐射生产的副产物产生的颗粒引起的问题的光刻设备。 光刻设备包括提供辐射束的照明系统和支撑图形结构的支撑结构。 图案形成结构被配置为在其横截面中赋予辐射束的图案。 该装置还包括支撑基板的基板支撑件和将图案化的光束投影到基板的目标部分上的投影系统。 照明系统包括产生极紫外辐射的辐射生产系统和收集极紫外辐射的辐射收集系统。 作为极紫外线辐射产物的副产物产生的颗粒基本上沿颗粒移动方向移动。 调整辐射收集系统以收集在与颗粒移动方向基本不同的收集方向上辐射的极紫外辐射。 版权所有（C）2009，JPO＆INPIT

    Radiation system, and lithographic device
    3.
    发明专利
    Radiation system, and lithographic device 审中-公开
    辐射系统和光刻设备

    公开(公告)号：JP2011018903A

    公开(公告)日：2011-01-27

    申请号：JP2010151526

    申请日：2010-07-02

    Applicant: Asml Netherlands Bv ,  エーエスエムエル ネザーランズ ビー.ブイ.

    Inventor： LOOPSTRA ERIK ROELOF ,  IVANOV VLADIMIR VITALEVICH ,  MOORS JOHANNES HUBERTUS JOSEPHINA ,  SWINKELS GERARDUS HUBERTUS PETRUS MARIA ,  YAKUNIN ANDREY MIKHAILOVICH ,  DE GRAAF DENNIS ,  STAMM UWE BRUNO HEINI

    IPC: H01S3/08 ,  H01L21/027 ,  H01S3/00

    CPC classification number: H05G2/003 ,  G03F7/70033 ,  H05G2/005 ,  H05G2/008

    Abstract: PROBLEM TO BE SOLVED: To provide a radiation system capable of improving conversion efficiency of EUV radiation/emission plasma, and to provide a lithographic device.SOLUTION: The radiation system includes a target material source for supplying droplets of a target material along a track, and a laser system including an amplifier and an optical system. The optical system establishes a first beam path which passes through the amplifier and a first point on the track, and establishes a second beam path which passes through the amplifier and a second point on the track. When a photon emitted from the amplifier is reflected along the first beam path by the droplet of the target material at the first point on the track, the laser system generates a first pulse of laser radiation. When a photon emitted from the amplifier is reflected along the second beam path by the droplet of the target material at the second point on the track, the laser system generates a second pulse of laser radiation.

    Abstract translation: 要解决的问题：提供能够提高EUV辐射/发射等离子体的转换效率并提供光刻设备的辐射系统。解决方案：辐射系统包括用于沿着轨道提供目标材料的液滴的靶材料源， 以及包括放大器和光学系统的激光系统。 光学系统建立通过放大器和轨道上的第一点的第一光束路径，并建立通过放大器的第二光束路径和轨道上的第二点。 当从放大器发射的光子沿着第一光束路径被轨道上的第一点处的目标材料的液滴反射时，激光系统产生第一激光辐射脉冲。 当从放大器发射的光子在轨道上的第二点处由靶材料的液滴沿着第二光束路径反射时，激光系统产生激光辐射的第二脉冲。

    Lithographic apparatus, illumination system, and method for providing projection beam of euv radiation
    4.
    发明专利
    Lithographic apparatus, illumination system, and method for providing projection beam of euv radiation 有权
    光刻设备，照明系统和提供EUV辐射投影光束的方法

    公开(公告)号：JP2005183950A

    公开(公告)日：2005-07-07

    申请号：JP2004350743

    申请日：2004-12-03

    Applicant: Asml Netherlands Bv ,  エイエスエムエル ネザランドズ ベスローテン フエンノートシャップ

    Inventor： IVANOV VLADIMIR VITALEVICH ,  BANINE VADIM YEVGENYEVICH ,  KOSHELEV KONSTANTIN NIKOLAEVIT

    IPC: G21K5/02 ,  G03F7/20 ,  H01L21/027 ,  H05G2/00

    CPC classification number: G03F7/70858 ,  G03F7/70916

    Abstract: PROBLEM TO BE SOLVED: To provide a lithographic apparatus that is not influenced by problems caused by particles that are produced by the by-product of EUV radiation production.
    SOLUTION: The lithographic apparatus has an illumination system supplying a beam of radiation and a supporting structure supporting a patterning structure arranged. The patterning structure is formed to impart patterns to the cross section of the radiation beam. Moreover, the apparatus has a substrate support supporting a substrate and a projection system for projecting the patterned beam onto the target portion of the substrate. The illumination system has a radiation producing system of producing extreme ultraviolet radiation and a radiation collecting system of collecting extreme ultraviolet radiation arranged. The particles produced as the by-product of extreme ultraviolet radiation production move substantially in a particle movement direction. The radiation collecting system is regulated in such a manner as to collect the extreme ultraviolet radiation that radiates in the collecting direction that is largely different from the particle movement direction.
    COPYRIGHT: (C)2005,JPO&NCIPI

    Abstract translation: 要解决的问题：提供不受由由EUV辐射生产的副产物产生的颗粒引起的问题的光刻设备。 解决方案：光刻设备具有提供辐射束的照明系统和支撑布置图案化结构的支撑结构。 形成图形结构以赋予辐射束横截面图案。 此外，该装置具有支撑基板的基板支撑件和用于将图案化的光束投影到基板的目标部分上的投影系统。 照明系统具有产生极紫外辐射的辐射产生系统和收集极紫外辐射的辐射收集系统。 作为极紫外线辐射产生的副产物产生的颗粒基本上在颗粒移动方向上移动。 辐射收集系统被调节成收集与颗粒移动方向大不相同的收集方向辐射的极紫外线辐射。 版权所有（C）2005，JPO＆NCIPI

    EUV RADIATION SOURCE
    5.
    发明申请
    EUV RADIATION SOURCE 审中-公开
    EUV辐射源

    公开(公告)号：WO2009024860A3

    公开(公告)日：2009-04-16

    申请号：PCT/IB2008002201

    申请日：2008-08-20

    Applicant: ASML NETHERLANDS BV ,  BANINE VADIM YEVGENYEVICH ,  IVANOV VLADIMIR VITALEVICH

    Inventor： BANINE VADIM YEVGENYEVICH ,  IVANOV VLADIMIR VITALEVICH

    IPC: H05G2/00

    CPC classification number: H05G2/003 ,  H05G2/008

    Abstract: A radiation source comprising a chamber (1) and a supply of a plasma generating substance, the source having an interaction point (13) at which the plasma generating substance introduced into the chamber may interact with a laser beam (7) and thereby produce a radiation emitting plasma, wherein the source further comprises a conduit (11) arranged to deliver a buffer gas into the chamber, the conduit having an outlet (12) which is adjacent to the interaction point.

    Abstract translation: 一种辐射源，包括室（1）和等离子体产生物质的供应源，所述源具有相互作用点（13），等离子体产生物质引入到所述室中可以与激光束（7）相互作用，从而产生 辐射发射等离子体，其中所述源还包括布置成将缓冲气体输送到所述室中的导管（11），所述导管具有与所述相互作用点相邻的出口（12）。

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