Invention Grant
- Patent Title: Multiple coil inductively coupled plasma source with offset frequencies and double-walled shielding
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Application No.: US14294431Application Date: 2014-06-03
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Publication No.: US10170279B2Publication Date: 2019-01-01
- Inventor: Jason A. Kenney , James D. Carducci , Kenneth S. Collins , Richard Fovell , Kartik Ramaswamy , Shahid Rauf
- Applicant: APPLIED MATERIALS, INC.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Agency: Fish & Richardson P.C.
- Main IPC: C23C16/00
- IPC: C23C16/00 ; H01L21/306 ; H01J37/32 ; H05H1/46 ; C23C16/509
Abstract:
A plasma reactor has an overhead multiple coil antennas including a parallel spiral coil antenna and symmetric and radial RF feeds and cylindrical RF shielding around the symmetric and radial RF feeds. The radial RF feeds are symmetrically fed to the plasma source.
Public/Granted literature
- US20140265832A1 MULTIPLE COIL INDUCTIVELY COUPLED PLASMA SOURCE WITH OFFSET FREQUENCIES AND DOUBLE-WALLED SHIELDING Public/Granted day:2014-09-18
Information query
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