公开(公告)号：US10141166B2

公开(公告)日：2018-11-27

申请号：US14460640

申请日：2014-08-15

Applicant: APPLIED MATERIALS, INC.

Inventor： Lawrence Wong ,  Kartik Ramaswamy ,  Yang Yang ,  Steven Lane ,  Richard Fovell

IPC: G06F19/00 ,  H01J37/32 ,  H01L21/67 ,  C23F1/00

Abstract: Plural sensors on an interior surface of a reactor chamber are linked by respective RF communication channels to a hub inside the reactor chamber, which in turn is linked to a process controller outside of the chamber.

公开(公告)号：US20160048111A1

公开(公告)日：2016-02-18

申请号：US14460640

申请日：2014-08-15

Applicant: APPLIED MATERIALS, INC.

Inventor： Lawrence Wong ,  Kartik Ramaswamy ,  Yang Yang ,  Steven Lane ,  Richard Fovell

IPC: G05B13/02

CPC classification number: H01J37/32935 ,  C23F1/00 ,  H01J37/32082 ,  H01L21/67253

Abstract: Plural sensors on an interior surface of a reactor chamber are linked by respective RF communication channels to a hub inside the reactor chamber, which in turn is linked to a process controller outside of the chamber.

Abstract translation: 在反应室的内表面上的多个传感器通过相应的RF连通通道连接到反应器室内的轮毂，反应器室又连接到室外的过程控制器。

公开(公告)号：US20140312766A1

公开(公告)日：2014-10-23

申请号：US14319089

申请日：2014-06-30

Applicant: APPLIED MATERIALS, INC.

Inventor： James D. Carducci ,  Kenneth S. Collins ,  Richard Fovell ,  Jason A. Kenney ,  Kartik Ramaswamy ,  Shahid Rauf

IPC: H01J37/32 ,  C23C16/505

CPC classification number: H01J37/3211 ,  C23C16/505 ,  H01J37/32119 ,  H01J37/32183 ,  H05H1/46 ,  H05H2001/4667

Abstract: A plasma reactor has an overhead inductively coupled plasma source with two coil antennas and symmetric and radial RF feeds and cylindrical RF shielding around the symmetric and radial RF feeds. The radial RF feeds are symmetrically fed to the plasma source.

Abstract translation: 等离子体反应器具有具有两个线圈天线的顶部电感耦合等离子体源，并且对称和径向RF馈送以及围绕对称和径向RF馈送的圆柱形RF屏蔽。 径向RF馈送对称地馈送到等离子体源。

公开(公告)号：US20140020839A1

公开(公告)日：2014-01-23

申请号：US13897592

申请日：2013-05-20

Applicant: APPLIED MATERIALS, INC.

Inventor： Jason A. Kenney ,  James D. Carducci ,  Kenneth S. Collins ,  Richard Fovell ,  Kartik Ramaswamy ,  Shahid Rauf

IPC: H01J37/04

CPC classification number: H01J37/04 ,  H01J37/321 ,  H01J37/3211 ,  H05H1/46 ,  H05H2001/4667

Abstract: A plasma reactor has an overhead multiple coil inductive plasma source with RF feeds arranged in equilateral symmetry.

Abstract translation: 等离子体反应器具有架空多线圈感应等离子体源，RF等离子体源以等边对称排列。

公开(公告)号：US20210391149A1

公开(公告)日：2021-12-16

申请号：US16898259

申请日：2020-06-10

Applicant: Applied Materials, Inc.

Inventor： Philip Allan Kraus ,  Robert Moore ,  James Carducci ,  Richard Fovell ,  Sathya Swaroop Ganta ,  Karthikeyan Balaraman ,  Silverst Rodrigues

IPC: H01J37/32

Abstract: Embodiments disclosed herein include a modular microwave source array. In an embodiment, a housing assembly for the source array comprises a first conductive layer, wherein the first conductive layer comprises a first coefficient of thermal expansion (CTE), and a second conductive layer over the first conductive layer, wherein the second conductive layer comprises a second CTE that is different than the first CTE. In an embodiment, the housing assembly further comprises a plurality of openings through the housing assembly, where each opening passes through the first conductive layer and the second conductive layer.

公开(公告)号：US10811226B2

公开(公告)日：2020-10-20

申请号：US15867559

申请日：2018-01-10

Applicant: Applied Materials, Inc.

Inventor： James D. Carducci ,  Kenneth S. Collins ,  Richard Fovell ,  Jason A. Kenney ,  Kartik Ramaswamy ,  Shahid Rauf

IPC: C23C16/00 ,  H01L21/326 ,  H01J37/32 ,  H05H1/46 ,  C23C16/505

Abstract: A plasma reactor has an overhead inductively coupled plasma source with two coil antennas and symmetric and radial RF feeds and cylindrical RF shielding around the symmetric and radial RF feeds. The radial RF feeds are symmetrically fed to the plasma source.

公开(公告)号：US20180211811A1

公开(公告)日：2018-07-26

申请号：US15934880

申请日：2018-03-23

Applicant: Applied Materials, Inc.

Inventor： Jason A. Kenney ,  James D. Carducci ,  Kenneth S. Collins ,  Richard Fovell ,  Kartik Ramaswamy ,  Shahid Rauf

IPC: H01J37/04 ,  H05H1/46 ,  H01J37/32

CPC classification number: H01J37/04 ,  H01J37/321 ,  H01J37/3211 ,  H05H1/46 ,  H05H2001/4667

Abstract: A plasma reactor includes inner, middle and outer current distributors to carry RF power to be supplied to a plasma in the processing region, and a plurality of RF power feeds connected between a plurality of RF power terminals and the inner, middle and outer current distributors. The current distributors are successive concentric axially symmetric hollow bodies. The plurality of current feeds include a middle RF power feed that includes an axial upper portion connected to one of the plurality of RF power terminals, a plurality of arms extending radially outwardly from the axial upper portion, and a plurality of axially extending RF connection rods extending from outer ends of the plurality of arms to the middle current distributor.

公开(公告)号：US09870897B2

公开(公告)日：2018-01-16

申请号：US14319089

申请日：2014-06-30

Applicant: APPLIED MATERIALS, INC.

Inventor： James D. Carducci ,  Kenneth S. Collins ,  Richard Fovell ,  Jason A. Kenney ,  Kartik Ramaswamy ,  Shahid Rauf

IPC: C23C16/00 ,  H01L21/306 ,  H01J37/32 ,  H05H1/46 ,  C23C16/505

CPC classification number: H01J37/3211 ,  C23C16/505 ,  H01J37/32119 ,  H01J37/32183 ,  H05H1/46 ,  H05H2001/4667

Abstract: A plasma reactor has an overhead inductively coupled plasma source with two coil antennas and symmetric and radial RF feeds and cylindrical RF shielding around the symmetric and radial RF feeds. The radial RF feeds are symmetrically fed to the plasma source.

公开(公告)号：US09745663B2

公开(公告)日：2017-08-29

申请号：US13666224

申请日：2012-11-01

Applicant: APPLIED MATERIALS, INC.

Inventor： Andrew Nguyen ,  Kenneth S. Collins ,  Kartik Ramaswamy ,  Shahid Rauf ,  James D. Carducci ,  Douglas A. Buchberger, Jr. ,  Ankur Agarwal ,  Jason A. Kenney ,  Leonid Dorf ,  Ajit Balakrishna ,  Richard Fovell

IPC: H01L21/00 ,  C23C16/00 ,  C23F1/08 ,  C23C14/28 ,  H05H1/46 ,  B01J12/00 ,  H01J37/32

CPC classification number: C23F1/08 ,  B01J12/002 ,  C23C14/28 ,  H01J37/321 ,  H01J37/3211 ,  H01J37/32733 ,  H01J37/32834 ,  H05H1/46

Abstract: A plasma reactor has an overhead multiple coil inductive plasma source with symmetric RF feeds and a symmetrical chamber exhaust with plural struts through the exhaust region providing access to a confined workpiece support. A grid may be included for masking spatial effects of the struts from the processing region.

公开(公告)号：US09082590B2

公开(公告)日：2015-07-14

申请号：US13966614

申请日：2013-08-14

Applicant: APPLIED MATERIALS, INC.

Inventor： James D. Carducci ,  Kenneth S. Collins ,  Richard Fovell ,  Jason A. Kenney ,  Kartik Ramaswamy ,  Shahid Rauf

IPC: H01J7/24 ,  H05B31/26 ,  H01J37/32 ,  H05H1/46 ,  C23C16/505

CPC classification number: H01J37/3211 ,  C23C16/505 ,  H01J37/32119 ,  H01J37/32183 ,  H05H1/46 ,  H05H2001/4667

Abstract: A plasma reactor has an overhead multiple coil inductive plasma source with symmetric and radial RF feeds and cylindrical RF shielding around the symmetric and radial RF feeds. The radial RF feeds are symmetrically fed to the plasma source.

Abstract translation: 等离子体反应器具有架空多线圈感应等离子体源，其具有对称和径向RF馈送以及围绕对称和径向RF馈送的圆柱形RF屏蔽。 径向RF馈送对称地馈送到等离子体源。